Patent classifications
H01J29/385
Photocathode including silicon substrate with boron layer
A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the second boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel electron-bombarded charge-coupled device (EBCCD) sensors and inspection systems.
Biology-based enhanced vision using light amplification and adaptable to thin films
Methods and apparatus relating to light amplification technology that has the ability to transform and amplify light to be seen in the visible spectrum by the user (FIG. 2). The biologically-based light amplification system including a reaction center, a proton gradient area, and a light amplification area, and may be configured such that light entering the system through the reaction center produces a proton gradient, which in turn acts upon reactants in the proton gradient area, and then causes a product to enter the light amplification area and thereby drive a bioluminescent or phosphorescent reaction to amplify the light The methods and apparatus use solely biological processes without any external power supply.
PHOTOCATHODE INCLUDING SILICON SUBSTRATE WITH BORON LAYER
A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the second boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel electron-bombarded charge-coupled device (EBCCD) sensors and inspection systems.
Photocathode including silicon substrate with boron layer
A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the second boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel electron-bombarded charge-coupled device (EBCCD) sensors and inspection systems.
BIOLOGY-BASED ENHANCED VISION USING LIGHT AMPLIFICATION AND ADAPTABLE TO THIN FILMS
Methods and apparatus relating to light amplification technology that has the ability to transform and amplify light to be seen in the visible spectrum by the user (FIG. 2). The biologically-based light amplification system including a reaction center, a proton gradient area, and a light amplification area, and may be configured such that light entering the system through the reaction center produces a proton gradient, which in turn acts upon reactants in the proton gradient area, and then causes a product to enter the light amplification area and thereby drive a bioluminescent or phosphorescent reaction to amplify the light The methods and apparatus use solely biological processes without any external power supply.
Photocathode including silicon substrate with boron layer
A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects, and a low work-function material layer is then formed over the boron layer to enhance the emission of photoelectrons. The low work-function material includes an alkali metal (e.g., cesium) or an alkali metal oxide. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel sensors and inspection systems.
Photocathode Including Silicon Substrate With Boron Layer
A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the second boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel electron-bombarded charge-coupled device (EBCCD) sensors and inspection systems.