A rapidly regulable high-voltage supply for the electrical focusing of an electron beam using a high-voltage final stage is provided. The high-voltage final stage includes a plurality of amplification elements that are interconnected in a series configuration with a first high-voltage connection, and a potential dividing chain including a series of potential dividing elements. The potential dividing chain is interconnected with the first high-voltage connection and has a signal interconnection with the plurality of amplification elements, so that when a voltage is applied across the potential dividing chain, a difference in voltages between a signal input to any amplification element of the plurality of amplification elements and a signal input to a next amplification element of the plurality of amplification elements has a same sign.

A rapidly regulable high-voltage supply for the electrical focusing of an electron beam using a high-voltage final stage is provided. The high-voltage final stage includes a plurality of amplification elements that are interconnected in a series configuration with a first high-voltage connection, and a potential dividing chain including a series of potential dividing elements. The potential dividing chain is interconnected with the first high-voltage connection and has a signal interconnection with the plurality of amplification elements, so that when a voltage is applied across the potential dividing chain, a difference in voltages between a signal input to any amplification element of the plurality of amplification elements and a signal input to a next amplification element of the plurality of amplification elements has a same sign.

An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.

An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.