The invention relates to a control device for an X-ray tube (2), comprising a housing (29) that is designed as a shield, in which an anode current regulating unit (1) is arranged and which is connected to a cathode power supply unit (18), a plurality of cathode voltage switches (20, 21, 22, 23, 24) which are to be connected to in each case a cathode (4), and a programmable assembly (25), in which the control of the cathodes (4) is determined. The cathode power supply unit (18), the cathode voltage switches (20, 21, 22, 23, 24) and the programmable assembly (18) are also arranged in the housing (29).

An x-ray micro-beam radiation production system is provided having: a source of accelerated electrons, an electron focusing component configured to focus the electrons provided by the source, and a target which produces x-rays when electrons impinge thereon from the source. The electron focusing component is configured to focus the electrons provided by the source such that they impinge at a focal spot having a width δ formed on a surface of the target. The focusing component is configured to move the electron beam relative to the target such that the focal spot moves across the target surface in the width direction, and/or the target is movable relative to the focusing component such that the focal spot moves across the target surface in the width direction, the surface velocity of the focal spot across the target surface in the width direction being greater than v.sub.t where:formula (I), k, ρ and c denoting respectively the heat conductivity, the density and the heat capacity of the target material, and d denoting the electron penetration depth in the target material. $v_t=\frac{\pi k}{4\rho c}.Math.\frac{\delta }{d^2},$

Methods for maintaining a specified beam profile of an x-ray beam extracted from an x-ray target over a large range of extraction angles relative to the target. A beam of electrons is generated and directed toward a target at an angle of incidence with respect to the target, with the beam of electrons forming a focal spot corresponding to the cross-section of the electron beam. At least one of a size, shape, and orientation of the electron beam cross-section is dynamically varied as the extraction angle is varied, and the extracted x-ray beam is collimated. Dynamically varying the size, shape or orientation of the electron beam cross-section may be performed using focusing and stigmator coils.

Provided are a scanning-type X-ray source and an imaging system therefor. The scanning-type X-ray source comprises a vacuum cavity (1), wherein a cathode (2) and a plurality of anode target structures (3) are arranged in the vacuum cavity (1); a gate electrode (4) is arranged in a position, close to the cathode (2), in the vacuum cavity (1); a focusing electrode (5) is arranged in a position, close to the gate electrode (4), in the vacuum cavity (1); and a deflection coil (6) is arranged in a position, close to the gate electrode (4), at the outer periphery of the vacuum cavity (1). The scanning-type X-ray source generates electron beams by using cathode (2), controls the powering-on/off of the electron beams by the gate electrode (4), and the deflection coil (6) controls the direction of motion of the electron beams, so as to complete the switching between multiple focuses.

Embodiments provide a stationary X-ray source for a multisource X-ray imaging system for tomographic imaging. The stationary X-ray source includes an array of thermionic cathodes and, in most embodiments a rotating anode. The anode rotates about a rotation axis, however the anode is stationary in the horizontal or vertical dimensions (e.g. about axes perpendicular to the rotation axis). The elimination of mechanical motion improves the image quality by elimination of mechanical vibration and source motion; simplifies system design that reduces system size and cost; increases angular coverage with no increase in scan time; and results in short scan times to, in medical some medical imaging applications, reduce patient-motion-induced blurring.

The present disclosure provides a cathode emission device. The cathode emission device may comprise a cathode assembly, including: a first filament, a second filament, and a grid electrode. The grid electrode may be operably connected to the first filament and surrounding the first filament and the second filament. The cathode assembly may be configured to be operably connected to a high-voltage generator and switchable between a first connection configuration and a second connection configuration.

An X-ray source for emitting an X-ray beam is proposed. The X-ray source comprises an anode and an emitter arrangement comprising a cathode for emitting an electron beam towards the anode and an electron optics for focusing the electron beam at a focal spot on the anode. The X-ray source further comprises a controller configured to determine a switching action of the emitter arrangement and to actuate the emitter arrangement to perform the switching action, the switching action being associated with a change of at least one of a position of the focal spot on the anode, a size of the focal spot, and a shape of the focal spot. The controller is further configured to predict before the switching action is performed, based on the determined switching action, the size and the shape of the focal spot expected after the switching action. Further, the controller is configured to actuate the electron optics to compensate for a change of the size and the shape of the focal spot induced by the switching action.

In some embodiments, a cathode assembly may include a cathode head that has a first electron emitter and a second electron emitter. The first electron emitter may have a first connection location and a second connection location. The second electron emitter may have a third connection location and a fourth connection location. The third connection location may be electrically coupled with the second connection location of the first electron emitter. The cathode assembly may include a receptacle having a first connector and a second connector. The first connector may be electrically coupled with the first connection location of the first electron emitter. The second connector may be electrically coupled with the second connection location of the first electron emitter and the third connection location of the second electron emitter. The third connector may be electrically coupled with the fourth connection location of the second electron emitter.

Systems and methods for determining an offset of a position of a focal point of an X-ray tube is provided. The methods may include obtaining at least one parameter associated with an X-ray tube during a scan of a subject. The methods may further include determining a target offset of a position of a focal point based on the at least one parameter and a target relationship between a plurality of reference parameters associated with the X-ray tube and a plurality of reference offsets of reference positions of the focal point. The methods may further include causing, based on the target offset, a correction on the position of the focal point of the X-ray tube.

An open microfocus X-ray source and a control method thereof are provided. The open microfocus X-ray source includes: an open X-ray tube, a high voltage power supply (HVPS) system, a vacuum system and a control system. The open X-ray tube includes a cathode system, a deflection system and a focusing system. The HVPS system is configured to provide an emission current I.sub.0, an accelerating high voltage U.sub.0 and a grid voltage U.sub.G for an electron beam. The vacuum system is configured to perform vacuumization. The control system is configured to control, according to a spot size of an electron beam for bombarding an anode target, the HVPS system to adjust the emission current I.sub.0, the accelerating high voltage U.sub.0, a deflection coil current I.sub.XY of the deflection system, and a focusing coil current I.sub.F of the focusing system, such that the spot size meets a preset requirement.