The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

The invention relates to an electron source comprising a conductive substrate, a conductor disposed facing the substrate, the electron source emitting an electron beam when the conductor is positively biased with respect to the substrate, and an electrically insulating crystal arranged on the substrate, facing the conductor, the substrate defining with the crystal a void including at least one peak located at a distance from the crystal, the crystal having, in a plane parallel to the substrate, dimensions of less than 100 nm and a thickness of less than 50 nm.

A Schottky thermal field emitter (TFE) source integrated with a beam splitter by a standoff, which supports the beam splitter above the Schottky TFE extractor faceplate by a distance of 0.05 mm to 2 mm. The beam splitter includes a microhole array integrated with the standoff and being disposed opposite the extractor faceplate, the microhole array having a plurality of microholes that split the electron beam generated by the Schottky TFE into a plurality of beamlets. The support and extractor may be fabricated from the same material or from different materials. The support may be formed from a high temperature resistive material, which causes a potential difference between the extractor and the microhole array. This potential difference creates positively charged electrostatic lenses at the microholes, which increases current in the individual beamlets. Voltage on the microarray plate may be varied to achieve a high beamlet current.

The present disclosure provides a charged particle beam device capable of simultaneously achieving protection of a charged particle source against electrical discharging inside a charged particle gun and highly accurate control of the charged particle gun, for both DC and AC components. A charged particle gun according to the present disclosure is configured such that an extraction voltage and an acceleration voltage are superposed and supplied to a charged particle beam source, a wiring between the charged particle beam source and a voltage circuit is covered with first and second enclosures, the first enclosure is configured to be connected to an extraction electrode, and the second enclosure is configured to be connected to an acceleration electrode and to a reference voltage of the voltage circuit.

A thermal field emitter, an apparatus, and a method for generating multiple beams for an e-beam tool are provided. The thermal field emitter includes an electron emitting portion configured to emit an electron beam and a nano-aperture array (NAA) having a plurality of openings. The NAA is positioned in a path of the electron beam. The NAA is configured to form multiple beams. The multiple beams include electrons from the electron beam that pass through the plurality of openings.

This charged particle gun has a bolt to which a charged particle source is attached, a nut that is screwed together with the bolt and thereby holds the charged particle source, and a nut seat surface in contact with the nut. The nut includes an inclination adjustment section whereby it is possible to adjust the angle of inclination of the charged particle source with respect to the nut seat surface, and a lock section that inhibits the nut and the bolt from becoming loose when screwed together. The inner surface of the nut has a screw thread section and a non-screw thread section with a larger inner diameter than the screw thread section. The inclination adjustment section has: a first slit formed so as to pass through an area from one part of the outer surface of the nut to one part of the non-screw thread section; an inclination adjustment screw; a first part positioned between the first slit and a second surface; a second part positioned between the first slit and a first surface; and a first screw hole that is screwed together with the inclination adjustment screw and formed so as to pass through an area from the first surface to the first slit in the second part.

A cathode mechanism of an electron emission source includes a crystal that includes an upper part being columnar, truncated conical, or their combined shape, and having a first surface to emit thermoelectrons, and a lower part, integrated with the upper part, having a second surface substantially parallel to the first surface, and a diameter larger than the maximum diameter of the upper part, a holding part that is a column having, in order from the holding part upper side, different inner diameters of a first diameter and a second diameter larger than the first one, and that holds the crystal in the state where the crystal first surface is projecting from the upper surface, and the crystal second surface contacts the holding part inside the column, and a retaining part that retains the crystal, at the back of the crystal lower part, not to be separated from the holding part.

A cathode mechanism of an electron emission source includes a crystal that includes an upper part being columnar, truncated conical, or their combined shape, and having a first surface to emit thermoelectrons, and a lower part, integrated with the upper part, having a second surface substantially parallel to the first surface, and a diameter larger than the maximum diameter of the upper part, a holding part that is a column having, in order from the holding part upper side, different inner diameters of a first diameter and a second diameter larger than the first one, and that holds the crystal in the state where the crystal first surface is projecting from the upper surface, and the crystal second surface contacts the holding part inside the column, and a retaining part that retains the crystal, at the back of the crystal lower part, not to be separated from the holding part.

Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.

Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.