A ceramic coating system using an atmospheric pressure plasma generator is provided, which includes a vacuum chamber configured to maintain a vacuum therein, a support disposed inside the vacuum chamber and fixedly supporting a substrate, a plasma generator that generates active species through plasma discharge and includes a nozzle part wherein at least a portion of the nozzle part is disposed to face the substrate inside the vacuum chamber, and a particle providing apparatus that transfers ceramic particles to one side of the nozzle part.

A ceramic coating system using an atmospheric pressure plasma generator is provided, which includes a vacuum chamber configured to maintain a vacuum therein, a support disposed inside the vacuum chamber and fixedly supporting a substrate, a plasma generator that generates active species through plasma discharge and includes a nozzle part wherein at least a portion of the nozzle part is disposed to face the substrate inside the vacuum chamber, and a particle providing apparatus that transfers ceramic particles to one side of the nozzle part.

The present invention relates to a method for preparing a hydrogel nanomembrane comprising: a) formation of a non-cross-linked hydrogel nanofilm on a first substrate; b) cross-linking the non-cross-linked hydrogel with a cross-linking agent to obtain a cross-linked hydrogen nanomembrane; and c) transferring the cross-linked hydrogel nanomembrane to a second substrate, a respective cross-linked hydrogel nanomembrane, a TEM grid comprising the same and use thereof.

A method and apparatus for inspecting a sample is provided. The apparatus includes a sample holder for holding the sample at a sample plane, a charged particle column for generating an array of multiple charged particle beamlets and directing the array towards the sample holder, a position sensor, and a control unit. The charged particle column includes an objective lens for focusing the charged particle beamlets of the array in an array of charged particle beam spots at or near the sample plane. The objective lens includes a magnetic lens common for all charged particle beamlets. The position sensor provides a signal which is dependent on the position of the sample. The control unit controls the position of the sample holder on the basis of the signal from the position sensor, to keep the pitch and/or orientation of the spots on the sample constant.

A method and apparatus for inspecting a sample is provided. The apparatus includes a sample holder for holding the sample at a sample plane, a charged particle column for generating an array of multiple charged particle beamlets and directing the array towards the sample holder, a position sensor, and a control unit. The charged particle column includes an objective lens for focusing the charged particle beamlets of the array in an array of charged particle beam spots at or near the sample plane. The objective lens includes a magnetic lens common for all charged particle beamlets. The position sensor provides a signal which is dependent on the position of the sample. The control unit controls the position of the sample holder on the basis of the signal from the position sensor, to keep the pitch and/or orientation of the spots on the sample constant.

An assembly is provided including a manipulation device and a cooling unit. The manipulation device includes a holder for samples and a thermal mass member which is arranged in thermal contact with the holder. The manipulation device is configured to place the manipulation device in a heat exchange position wherein the in thermal mass member is in thermal contact with the cooling unit, and to move the manipulation device from the heat exchange position to a manipulation position wherein the thermal mass member is thermally separated from the cooling unit. An inspection apparatus of focused ion beam apparatus is also provided including such an assembly, and a method of using such an assembly.

An assembly is provided including a manipulation device and a cooling unit. The manipulation device includes a holder for samples and a thermal mass member which is arranged in thermal contact with the holder. The manipulation device is configured to place the manipulation device in a heat exchange position wherein the in thermal mass member is in thermal contact with the cooling unit, and to move the manipulation device from the heat exchange position to a manipulation position wherein the thermal mass member is thermally separated from the cooling unit. An inspection apparatus of focused ion beam apparatus is also provided including such an assembly, and a method of using such an assembly.

A multi-beam charged particle inspection system and a method of operating a multi-beam charged particle inspection system for wafer inspection can provide high throughput with high resolution and high reliability. The method and the multi-beam charged particle beam inspection system can be configured to extract from a plurality of sensor data a set of control signals to control the multi-beam charged particle beam inspection system and thereby maintain the imaging specifications including a movement of a wafer stage during the wafer inspection task.

A sample transfer device (100) for receiving a sample inside the sample transfer device (100) and for transferring the sample to a processing or analysing unit includes a connection opening (110) defining a transfer path (114) along which the sample is to be transferred from a loading position (120) of the sample inside the sample transfer device (100) through the connection opening (110), a shutter (130) configured to block the connection opening (110) or to unblock the connection opening (110), and a shielding member (140) configured to be arranged between the connection opening (110) and the loading position (120) to protect the sample from an incoming gas stream when the shutter (130) unblocks the connection opening (110).

A sample transfer device (100) for receiving a sample inside the sample transfer device (100) and for transferring the sample to a processing or analysing unit includes a connection opening (110) defining a transfer path (114) along which the sample is to be transferred from a loading position (120) of the sample inside the sample transfer device (100) through the connection opening (110), a shutter (130) configured to block the connection opening (110) or to unblock the connection opening (110), and a shielding member (140) configured to be arranged between the connection opening (110) and the loading position (120) to protect the sample from an incoming gas stream when the shutter (130) unblocks the connection opening (110).