An apparatus for analyzing and/or processing a sample with a particle beam, comprising: a providing unit for providing the particle beam; a shielding element for shielding an electric field (E) generated by charges (Q) accumulated on the sample, wherein the shielding element has a through opening for the particle beam to pass through towards the sample; a detecting unit configured to detect an actual position of the shielding element; and an adjusting unit for adjusting the shielding element from the actual position into a target position.

The present disclosure is related to a Schottky thermal field (TFE) source for emitting an electron beam. Electron optics can adjust a shape of the electron beam before the electron beam impacts a scintillator screen. Thereafter, the scintillator screen generates an emission image in the form of light. An emission image can be adjusted and captured by a camera sensor in a camera at a desired magnification to create a final image of the Schottky TFE source's tip. The final image can be displayed and analyzed to for defects.

The invention is to simplify operations performed when imaging an electron diffraction pattern by using a transmission electron microscope. As a solution to the problem, a transmission electron microscope includes a detector to which an electron diffraction pattern is projected, a mask for zero-order wave configured to be inserted into and pulled out from between a sample and the detector, and a current detector configured to be inserted into and pulled out from a detection region of the zero-order waves in a state where the mask is inserted. An amount of current of electron beams emitted to the mask is measured in real time, and the measurement result is automatically reflected in settings of imaging conditions of an imaging camera provided in the transmission electron microscope.

A method of manufacturing a phosphor panel includes: forming a phosphor layer having a plurality of phosphor particles on an exit window; forming an organic film on the phosphor layer; forming a metal reflection film on the organic film; forming an oxide film on the metal reflection film; removing the organic film by firing; and forming an oxide film integrally covering a surface of the metal reflection film and surfaces of the phosphor particles by atomic layer deposition.

The present disclosure is related to a Schottky thermal field (TFE) source for emitting an electron beam. Electron optics can adjust a shape of the electron beam before the electron beam impacts a scintillator screen. Thereafter, the scintillator screen generates an emission image in the form of light. An emission image can be adjusted and captured by a camera sensor in a camera at a desired magnification to create a final image of the Schottky TFE source's tip. The final image can be displayed and analyzed to for defects.

An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.

A multi-beam scanning electron microscope (charged particle beam device) 100 includes an electron gun (charged particle irradiation source) 101 configured to irradiate a sample 104 with an electron beam (charged particle beam) 103, a detector 106 having a detection region corresponding to the charged particle beam 103 and configured to output an electrical signal 107 corresponding to a reaching position when secondary particles 105 generated from the sample 104 by irradiating the sample 104 with the charged particle beam 103 reach the detection region, and a signal processing block 115 configured to perform measurement of a charge amount of the sample 104 by the charged particle beam 103 and generation of an inspection image of the sample 104 in parallel based on the electrical signal 107 output from the detector 106.

An object of the invention is to provide a device for observing the same field of view with a charged particle beam device and a camera without increasing a size of a housing. A charged particle beam device according to an aspect of the invention includes: a lens barrel that irradiates a sample with a charged particle beam; an imaging unit that images an optical image of the sample; a sample table on which the sample is placed; and a stage that is movable and on which the sample table is placed, wherein when a distance between a physical central axis of the sample table and a physical optical axis of the imaging unit is defined as a first distance, and a distance between a virtual central axis of the sample table and a physical central axis of the imaging unit, or between the physical central axis of the sample table and a virtual central axis of the imaging unit, or between the virtual central axis of the sample table and the virtual central axis of the imaging unit is defined as a second distance, the second distance is shorter than the first distance.

A method of manufacturing a phosphor panel includes: forming a phosphor layer having a plurality of phosphor particles on an exit window; forming an organic film on the phosphor layer; forming a metal reflection film on the organic film; forming an oxide film on the metal reflection film; removing the organic film by firing; and forming an oxide film integrally covering a surface of the metal reflection film and surfaces of the phosphor particles by atomic layer deposition.

An object of the invention is to provide a charged particle beam device capable of increasing the contrast of an observation image of a sample as much as possible in accordance with light absorption characteristics that change for each optical parameter. The charged particle beam device according to the invention changes an optical parameter such as a polarization plane of light emitted to the sample, and generates the observation image having a contrast corresponding to the changed optical parameter. An optical parameter that maximizes a light absorption coefficient of the sample is specified according to a feature amount of a shape pattern of the sample (refer to FIG. 5).