One or more examples relate, generally, to an apparatus. The apparatus includes a charged particle source and a charged particle pointer. The charged particle pointer urges charged particles emitted by the charged particle source in a predetermined direction. The charged particle pointer comprises a repeller, and an isolator positioned along a path extending from the repeller in the predetermined direction.

A charged particle beam device includes a lens barrel having a charged particle source, a sample chamber in which a sample to be irradiated with a charged particle beam is provided, and a heat emission type electron source disposed in the sample chamber and maintained at a lower potential than that of an inner wall of the sample chamber, in which the inside of the sample chamber is cleaned by electrons (e−) emitted from the heat emission type electron source after a heating current is generated by applying a voltage from an electron source power supply. The heat emission type electron source is maintained at a lower potential than that of the inner wall of the sample chamber by applying a negative voltage to the heat emission type electron source using a bias power supply. A magnitude of the negative voltage applied to the heat emission type electron source is preferably about 30 to 1000 V, particularly preferably about 60 to 120 V.

An objective of the present invention is to provide a charged particle beam device capable of estimating a lifetime of a filament of a charged particle beam source with a cheap and simple circuit configuration. The charged particle beam device according to the present invention includes a boosting circuit that boosts a voltage to be supplied to a filament and estimates a remaining duration of the filament using a measured value of a current flowing on a low-voltage side of the boosting circuit (see FIG. 3).

An objective of the present invention is to provide a charged particle beam device capable of estimating a lifetime of a filament of a charged particle beam source with a cheap and simple circuit configuration. The charged particle beam device according to the present invention includes a boosting circuit that boosts a voltage to be supplied to a filament and estimates a remaining duration of the filament using a measured value of a current flowing on a low-voltage side of the boosting circuit (see FIG. 3).

A charged particle beam device includes a lens barrel having a charged particle source, a sample chamber in which a sample to be irradiated with a charged particle beam is provided, and a heat emission type electron source disposed in the sample chamber and maintained at a lower potential than that of an inner wall of the sample chamber, in which the inside of the sample chamber is cleaned by electrons (e) emitted from the heat emission type electron source after a heating current is generated by applying a voltage from an electron source power supply. The heat emission type electron source is maintained at a lower potential than that of the inner wall of the sample chamber by applying a negative voltage to the heat emission type electron source using a bias power supply. A magnitude of the negative voltage applied to the heat emission type electron source is preferably about 30 to 1000 V, particularly preferably about 60 to 120 V.

An electron microscope equipped with automatic beam alignment is provided. The electron microscope can include a vacuum chamber having a receiving space to allow a measurement target specimen to be positioned inside the vacuum chamber. The electron microscope can also include an electron gun coupled to a top of the vacuum chamber with an insulating panel between the electron gun and the vacuum chamber and including a filament module configured to receive power from a power supply and emit an electron beam toward the measurement target specimen. The filament module can be connected to the power supply via a flexible wire inserted into a through hole of the insulating panel such that an assembly error is prevented from occurring when the filament module is coupled to the through hole and the electron beam emitted from the filament module is automatically aligned with a reference optical axis.

According to one embodiment, an X-ray system includes an X-ray tube including a filament in which a filament current according to a tube current flows, a filament current monitoring unit monitoring the filament current, a tube current monitoring unit monitoring the tube current, and an inspection unit determining whether the tube current falls within a predetermined set range in X-ray emission.

The invention provides an ion source structure of an ion implanter, which comprises an arc chamber, a filament in the arc chamber, and a cathode in the arc chamber, wherein the cathode has an upper surface and a lower surface, and at least one of the upper surface and the lower surface is non-planar.

The invention provides an ion source structure of an ion implanter, which comprises an arc chamber, a filament in the arc chamber, and a cathode in the arc chamber, wherein the cathode has an upper surface and a lower surface, and at least one of the upper surface and the lower surface is non-planar.

Sterilization apparatus for sterilizing packaging containers, the sterilization apparatus comprising a first carousel for supporting a plurality of sterilization devices, the sterilization devices being adapted to sterilize an interior of the packaging containers by electron beam irradiation, and a transport system for transporting the packaging containers, the transport system comprising a second carousel coaxial with the first carousel, wherein the first carousel comprises a first rotatable shaft and the second carousel comprises a separate second rotatable shaft coaxial with the first rotatable shaft.