The present invention provides a bulb (100, 110, 120, 130, 140, 140′) an excitation chamber (200, 210, 220, 230, 230′) a ferrite core (300, 310, 310′), a spool (400, 410); an assembly or subassembly of such components, and a lamp (100, 1100, 1200, 1300, 1400, 1500, 1600, 1600′, 1600″, 1700, 1800) for producing electromagnetic radiation, such as in the light spectrum, UV or IR.

The present invention provides a bulb (100, 110, 120, 130, 140, 140′) an excitation chamber (200, 210, 220, 230, 230′) a ferrite core (300, 310, 310′), a spool (400, 410); an assembly or subassembly of such components, and a lamp (100, 1100, 1200, 1300, 1400, 1500, 1600, 1600′, 1600″, 1700, 1800) for producing electromagnetic radiation, such as in the light spectrum, UV or IR.

The present invention provides a bulb (100, 110, 120, 130, 140, 140′) an excitation chamber (200, 210, 220, 230, 230′) a ferrite core (300, 310, 310′), a spool (400, 410); an assembly or subassembly of such components, and a lamp (100, 1100, 1200, 1300, 1400, 1500, 1600, 1600′, 1600″, 1700, 1800) for producing electromagnetic radiation, such as in the light spectrum, UV or IR.

The present invention provides a bulb (100, 110, 120, 130, 140, 140′) an excitation chamber (200, 210, 220, 230, 230′) a ferrite core (300, 310, 310′), a spool (400, 410); an assembly or subassembly of such components, and a lamp (100, 1100, 1200, 1300, 1400, 1500, 1600, 1600′, 1600″, 1700, 1800) for producing electromagnetic radiation, such as in the light spectrum, UV or IR.

There is provided a photoreactor for the remediation of gaseous emissions and/or contaminated water using ultraviolet (UV) or vacuum ultraviolet (VUV). There is also provided an emission source for generating UV and/or VUV, the source comprising: a microwave generator; a chamber arranged to receive microwaves generated by the microwave generator, the chamber comprising: a gas comprising species for forming excimers; a resonator arranged to receive the microwaves in the chamber and generate a plasma; a first electrode spaced apart from the resonator; and a voltage source configured to generate an electric field between the resonator and the first electrode, wherein, on application of the electric field, the electric field drives electrons and/or ions from the plasma to generate excimers and produce vacuum ultraviolet or ultraviolet emission. There are also provided methods of generating UV and/or VUV, and methods of remediating fluids.

There is provided a photoreactor for the remediation of gaseous emissions and/or contaminated water using ultraviolet (UV) or vacuum ultraviolet (VUV). There is also provided an emission source for generating UV and/or VUV, the source comprising: a microwave generator; a chamber arranged to receive microwaves generated by the microwave generator, the chamber comprising: a gas comprising species for forming excimers; a resonator arranged to receive the microwaves in the chamber and generate a plasma; a first electrode spaced apart from the resonator; and a voltage source configured to generate an electric field between the resonator and the first electrode, wherein, on application of the electric field, the electric field drives electrons and/or ions from the plasma to generate excimers and produce vacuum ultraviolet or ultraviolet emission. There are also provided methods of generating UV and/or VUV, and methods of remediating fluids.

The present invention provides a bulb (100, 110, 120, 130, 140, 140′) an excitation chamber (200, 210, 220, 230, 230′) a ferrite core (300, 310, 310′), a spool (400, 410); an assembly or subassembly of such components, and a lamp (100, 1100, 1200, 1300, 1400, 1500, 1600, 1600′, 1600″, 1700, 1800) for producing electromagnetic radiation, such as in the light spectrum, UV or IR.

The present invention provides a bulb (100, 110, 120, 130, 140, 140′) an excitation chamber (200, 210, 220, 230, 230′) a ferrite core (300, 310, 310′), a spool (400, 410); an assembly or subassembly of such components, and a lamp (100, 1100, 1200, 1300, 1400, 1500, 1600, 1600′, 1600″, 1700, 1800) for producing electromagnetic radiation, such as in the light spectrum, UV or IR.

A broadband ultraviolet illumination source for a characterization system is disclosed. The broadband ultraviolet illumination source includes an enclosure having one or more walls, the enclosure configured to contain a gas, and a plasma discharge device based on a graphene-dielectric-semiconductor (GOS) planar-type structure. The GOS structure includes a silicon substrate having a top surface, a dielectric layer disposed on the top surface of the silicon substrate, and at least one layer of graphene disposed on a top surface of the dielectric layer. A metal contact may be formed on the top surface of the graphene layer. The GOS structure has several advantages for use in an illumination source, such as low operating voltage (below 50 V), planar surface electron emission, and compatibility with standard semiconductor processes. The broadband ultraviolet illumination source further includes electrodes placed inside the enclosure or magnets placed outside the enclosure to increase the current density.

A broadband ultraviolet illumination source for a characterization system is disclosed. The broadband ultraviolet illumination source includes an enclosure having one or more walls, the enclosure configured to contain a gas, and a plasma discharge device based on a graphene-dielectric-semiconductor (GOS) planar-type structure. The GOS structure includes a silicon substrate having a top surface, a dielectric layer disposed on the top surface of the silicon substrate, and at least one layer of graphene disposed on a top surface of the dielectric layer. A metal contact may be formed on the top surface of the graphene layer. The GOS structure has several advantages for use in an illumination source, such as low operating voltage (below 50 V), planar surface electron emission, and compatibility with standard semiconductor processes. The broadband ultraviolet illumination source further includes electrodes placed inside the enclosure or magnets placed outside the enclosure to increase the current density.