A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

The light source contains a gas-filled chamber with a plasma sustained by a focused beam of a continuous wave laser. The means for plasma ignition is a solid-state laser system which generates two pulsed laser beams: in a free running mode and in a Q-switched mode. The solid-state laser system contains single active element and its optical cavity is equipped with a Q-switch overlapping only part of a cross section of the intracavity laser beam. One pulsed laser beam provides an optical breakdown after which another pulsed laser beam ignites the plasma, the volume and density of which are sufficient for stationary sustanance of the plasma by the focused beam of the continuous wave laser. EFFECT: simplification of the design of the light source, increase of its reliability and ease of use, creating on this basis of powerful electrode-free high-brightness broadband light sources with high spatial and energy stability.

A plasma lamp is disclosed. The plasma lamp includes a gas containment structure configured to contain a gas and generate a plasma within the gas containment structure. The gas containment structure is formed from a glass material transparent to illumination from a pump laser and the broadband radiation emitted by the plasma. The gas containment structure includes a glass wall and the glass within the glass wall includes an OH concentration distribution that varies across a thickness of the glass wall.

In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

A semiconductor reaction chamber includes a chamber body, a dielectric window, a gas inlet member, a carrier, an upper radio frequency assembly, and a plurality of ultraviolet light generation devices. The dielectric window is arranged at a top of the chamber body. The gas inlet member is arranged at a center position of the dielectric window and configured to introduce a process gas into the chamber body. The carrier is arranged inside the chamber body and configured to carry a to-be-processed wafer. The upper radio frequency assembly is arranged above the chamber body and configured to ionize the process gas introduced into the chamber body to generate a plasma and first ultraviolet light. The plurality of ultraviolet light generation devices is arranged between the dielectric window and the carrier and around the gas inlet member and configured to generate second ultraviolet light radiating toward the carrier.

A transmission line for conveying a radio frequency (RF) signal between a first terminal and a second terminal. The transmission line comprises an inner conductor, a middle conductor and an outer conductor. The inner conductor comprises a length of conductive material having a first end for electrical connection with the first terminal and a second end for electrical connection with the second terminal. The middle conductor surrounds at least a part of the length of the inner conductor and is electrically connected to the electrical ground of the source. The outer conductor surrounds at least a part of the length of the middle conductor and is electrically connected to the electrical ground of the load.

A system for powering an excimer bulb includes a first inductor configured to be coupled to a first terminal of the excimer bulb. The system further includes a first transistor coupled to the first inductor and having an on state configured to allow current to flow through the first inductor and an off state. The system further includes a second transistor configured to be coupled to the first terminal of the excimer bulb and having an on state configured to allow current to flow through the excimer bulb and an off state. The system further includes a controller coupled to the first transistor and the second transistor, and to control operation of the first transistor and the second transistor to power the excimer bulb.

An illumination source includes a laser driver unit configured to emit a plasma sustaining beam. An ingress collimator receives the plasma sustaining beam and produces a collimated ingress beam. A focusing optic receives the collimated ingress beam and produce a focused sustaining beam. A sealed lamp chamber contains an ionizable media that, once ignited, forms a high intensity light emitting plasma having a waist size smaller than 150 microns. The sealed lamp chamber further includes an ingress window configured to receive the focused sustaining beam and an egress window configured to emit the high intensity light. An ignition source is configured to ignite the ionizable media, and an exit fiber is configured to receive and convey the high intensity light. The high intensity light is white light with a black body spectrum, and the exit fiber has a diameter in the range of 200-500 micrometers.