A laser polycrystallization apparatus including: a light source for emitting a laser beam; a diffraction grating for receiving the laser beam from the light source, changing a path and a magnitude of the received laser beam, and outputting the changed laser beam; a light split portion for splitting the laser beam received from the diffraction grating; and a light superposition portion for superposing the split laser beams received from the light split portion and irradiating the superposed split laser beams to a substrate. An angle between the laser beam irradiated to an incidence surface of the diffraction grating from the light source and a line substantially perpendicular to an emission surface of the diffraction grating is an acute angle.

An electrostatic dissipation device 10 can comprise an elongated enclosure 11 with a longitudinal axis 12. An x-ray source 13 can be oriented to emit x-rays 16 inside of and along the longitudinal axis 12. A fluid-flow device 14 can be oriented to cause fluid to flow across the x-ray source 13 then inside of and along the longitudinal axis 12, the fluid being ionized by the x-rays 16, forming ionized fluid, then out of the elongated enclosure through outlet opening(s) 15. The arrangement of the x-ray source 13 and the fluid-flow device 14 can allow (1) fluid from the fluid-flow device 14 to cool the x-ray source 13, and (2) ion generation along the length of the elongated enclosure 11.