A storage apparatus, and a transporting device and a transporting method for a Front Opening Unified Pod (FOUP) are provided. The storage apparatus includes: at least two carrying bins configured to carry the FOUP; and a rotating component. The at least two carrying bins are connected to the rotating component at different positions of the rotating component. The rotating component is configured to change positions of the at least two carrying bins through rotation of the rotating component.

A processing apparatus includes a wafer cassette table, a wafer carrying-out mechanism, a wafer table, a frame housing unit, a frame carrying-out mechanism, a frame table, a tape sticking unit, a tape-attached frame conveying mechanism, a tape pressure bonding unit, a frame unit carrying-out mechanism, a reinforcing part removing unit, a ring-free unit carrying-out mechanism, and a frame cassette table. The wafer carrying-out mechanism includes a Bernoulli chuck mechanism that jets gas to the back surface of the wafer and generates a negative pressure. The gas jetted by the Bernoulli chuck mechanism is inert gas. The wafer carrying-out mechanism jets the inert gas from the Bernoulli chuck mechanism to suppress oxidation of the back surface of the wafer when the wafer is carried out.

Systems and techniques for determining and correcting inter-wafer misalignments in a stack of wafers transported by a wafer handling robot. An enhanced automatic wafer centering system is provided that may be used to determine a smallest circle associated with the stack of wafers, which may then be used to determine whether or not the stack of wafer meets various process requirements and/or if a centering correction can be made to better align the wafers with a receiving station coordinate frame.

According to one aspect of the present disclosure, a transfer device has a first holding part configured to contact an edge part of a substrate when holding the substrate, and a second holding part formed with an elastic member and configured to contact only a back surface of the substrate when holding the substrate.

A film formation method includes: preparing a substrate including, on its surface, a first region in which a first material is exposed and a second region in which a second material different from the first material is exposed; selectively forming a self-assembled monolayer in the first region, among the first region and the second region; and forming a desired target film in the second region, among the first region and the second region, by using the self-assembled monolayer formed in the first region, wherein the selectively forming the self-assembled monolayer includes: selectively forming the self-assembled monolayer in the first region by using a first processing liquid including a first raw material of the self-assembled monolayer; and modifying the self-assembled monolayer, by using a second processing liquid including a second raw material of the self-assembled monolayer at a concentration different from a concentration of the first processing liquid.

Provided is a FOUP transfer device for transferring FOUPs between load ports and which is capable of reducing remodeling work on a pre-installed conveyance device as much as possible. FOUP transfer devices 1-1, 1-2 are installed in the vicinity of the load ports of the conveyance device, comprising one or more load ports 18-1, 18-2, and transfer FOUPs 3 between the load ports 18-1, 18-2. The FOUP transfer devices 1-1, 1-2 have first optical I/O communication devices 31-3, 31-4 and are configured such that second optical I/O communication devices 31-1, 31-2 provided for the load ports 18-1, 18-2 are connected thereto, and so as to carry out, in place of the load ports 18-1, 18-2, the optical I/O communication carried out between the load ports 18-1, 18-2 and an OHT cart 11.

A transfer apparatus includes a lower plate including a lower link arm and a lower support, the lower support being fixed to an upper surface of the lower plate, an upper plate on the lower plate and configured to support a wafer stacking box on an upper surface of the upper plate, the upper plate including an upper link arm, and an upper support that is fixed to the upper surface of the upper plate, and a fixing member that is connected to the upper link arm, the fixing member configured to selectively contact the wafer stacking box. The upper plate is aligned with the lower plate in a first horizontal direction, and is configured to perform linear movement on the lower plate in the first horizontal direction.

Disclosed is a substrate treating apparatus for performing a cleaning treatment on substrates. The apparatus includes an indexer block with an indexer robot, a treating block including a front face cleaning unit and a back face cleaning unit as treating units, and a reversing path block including a plurality of shelves on which substrates are placed, and having a reversing function. The indexer robot includes a guide rail, a base, an articulated arm, and a hand. The guide rail is positioned so as not to overlap a mount position of a substrate in the reversing path block.

A tower lift includes a main frame extending in a vertical direction, a carriage module configured to be movable in the vertical direction along the main frame, a weight module disposed behind the carriage module and configured to be movable in the vertical direction along the main frame, a driving module disposed on the main frame and configured to move the carriage module and the weight module in the vertical direction using at least one timing belt, an auto tensioner disposed on a lower portion of the main frame and connected with the carriage module and the weight module by a balance belt, and an upper alignment unit for aligning a horizontal position of the at least one timing belt.

An embodiment comprises: a guide moving in the vertical direction or the horizontal direction; a transfer arm provided on the guide and loading spaced apart wafers; a laser emission unit disposed on the guide and emitting first laser beams at the spaced apart wafers loaded on the transfer arm; and a laser detection unit disposed below the transfer arm and collecting, from among the first laser beams, second laser beams having passed through gaps between the spaced apart wafers.