H01L2224/43001

Semiconductor package including stacked semiconductor chips and method for fabricating the same
11133287 · 2021-09-28 · ·

A semiconductor package may include: a chip stack including first to N.sup.th semiconductor chips having first to N.sup.th chip pads formed in active surfaces thereof, respectively, and sequentially stacked in a vertical direction such that the first to N.sup.th chip pads are exposed, wherein N is a natural number equal to or more than 2; first to N.sup.th vertical wires having first ends connected to the first to N.sup.th chip pads, respectively, and extended in the vertical direction; a coating layer surrounding portions of the first to k.sup.th vertical wires, extended from the first ends, among the first to N.sup.th vertical wires, and connection portions between the first ends of the first to k.sup.th vertical wires and the first to k.sup.th chip pads; and a molding layer covering the chip stack, surrounding the vertical wires, and covering the coating layer.

SEMICONDUCTOR PACKAGE INCLUDING STACKED SEMICONDUCTOR CHIPS
20210057379 · 2021-02-25 · ·

A semiconductor package may include: a chip stack including first to N.sup.th semiconductor chips having first to N.sup.th chip pads formed in active surfaces thereof, respectively, and sequentially stacked in a vertical direction such that the first to N.sup.th chip pads are exposed, wherein N is a natural number equal to or more than 2; first to N.sup.th vertical wires having first ends connected to the first to N.sup.th chip pads, respectively, and extended in the vertical direction; a coating layer surrounding portions of the first to k.sup.th vertical wires, extended from the first ends, among the first to N.sup.th vertical wires, and connection portions between the first ends of the first to k.sup.th vertical wires and the first to k.sup.th chip pads; and a molding layer covering the chip stack, surrounding the vertical wires, and covering the coating layer.

Bonding method
10600754 · 2020-03-24 · ·

There is provided a bonding method capable of accurately positioning a bonding stage. According to an aspect of the present invention, a bonding method using a bonding apparatus including a rotation drive mechanism for rotating a bonding stage 1 about a -axis includes the steps of: (e) locking the bonding stage with respect to the -axis, and bonding a wire or bump onto a certain area of a substrate held on the bonding stage; (f) unlocking the bonding stage with respect to the -axis, and rotating the bonding stage about the -axis with the rotation drive mechanism; and (g) locking the bonding stage with respect to the -axis, and bonding a wire or bump onto a remaining region of the substrate.

Connection pads for low cross-talk vertical wirebonds
10580756 · 2020-03-03 · ·

Wirebond bondpads on semiconductor packages that result in reduced cross-talk and/or interference between vertical wires are disclosed. The vertical wirebonds may be disposed in the semiconductor package with stacked dies, where the wires are substantially normal to the bondpads to which the vertical wirebonds are attached on the dies. The wirebond bondpads may include signal pads that carry input/output (I/O) to/from the die package, as well as ground bondpads. The bondpads may have widths that are greater than the space between adjacent bondpads. Bondpads may be fabricated to be larger than the size requirements for reliable wirebond formation on the bondpads. For a fixed pitch bondpad configuration, the size of the signal bondpads adjacent to the ground bondpads may be greater than half of the pitch. By increasing the size of the signal bondpads adjacent to a ground line relative to the space therebetween, improved cross-talk performance may be achieved.

BONDING METHOD
20190164928 · 2019-05-30 ·

There is provided a bonding method capable of accurately positioning a bonding stage. According to an aspect of the present invention, a bonding method using a bonding apparatus including a rotation drive mechanism for rotating a bonding stage 1 about a -axis includes the steps of: (e) locking the bonding stage with respect to the -axis, and bonding a wire or bump onto a certain area of a substrate held on the bonding stage; (f) unlocking the bonding stage with respect to the -axis, and rotating the bonding stage about the -axis with the rotation drive mechanism; and (g) locking the bonding stage with respect to the -axis, and bonding a wire or bump onto a remaining region of the substrate.

Electronic device by laser-induced forming and transfer of shaped metallic interconnects

An electronic device made from the method of providing a donor substrate comprising an array of metallic interconnects, using a laser system to prepare the metallic interconnects, forming shaped metallic interconnects, laser bending the shaped metallic interconnects; and transferring the shaped metallic interconnects onto a receiving substrate or device.

CONNECTION PADS FOR LOW CROSS-TALK VERTICAL WIREBONDS
20180323173 · 2018-11-08 · ·

Wirebond bondpads on semiconductor packages that result in reduced cross-talk and/or interference between vertical wires are disclosed. The vertical wirebonds may be disposed in the semiconductor package with stacked dies, where the wires are substantially normal to the bondpads to which the vertical wirebonds are attached on the dies. The wirebond pads may include signal pads that carry input/output (I/O) to/from the die package, as well as ground bondpads. The vertical wirebond bondpads may have widths that are greater than the space between adjacent bondpads. Bondpads may be fabricated to be larger than the size requirements for reliable wirebond formation on the bondpads. For a fixed pitch bondpad configuration, the size of the signal bondpads adjacent to the ground bondpads may be greater than half of the pitch. By increasing the size (e.g., width) of the signal bondpads adjacent to a ground line relative to the space therebetween, improved cross-talk performance may be achieved.

Electronic Device By Laser-Induced Forming and Transfer of Shaped Metallic Interconnects

An electronic device made from the method of providing a donor substrate comprising an array of metallic interconnects, using a laser system to prepare the metallic interconnects, forming shaped metallic interconnects, laser bending the shaped metallic interconnects; and transferring the shaped metallic interconnects onto a receiving substrate or device.

Laser-induced forming and transfer of shaped metallic interconnects

A method of forming and transferring shaped metallic interconnects, comprising providing a donor substrate comprising an array of metallic interconnects, using a laser system to prepare the metallic interconnects, forming shaped metallic interconnects, and transferring the shaped metallic interconnect to an electrical device. An electronic device made from the method of providing a donor ribbon, wherein the donor ribbon comprises an array of metal structures and a release layer on a donor substrate, providing a stencil to the metal structures on the donor substrate, applying a laser pulse through the donor substrate to the metal structures, and directing the metal structures to an electronic device.

WIRING SYSTEM

A method for attaching a prefabricated miniature coaxial wire to a first electrical connection point, the prefabricated miniature coaxial wire having an electrically conductive core disposed within an electrical insulation layer disposed within an electrically conductive shield layer, includes attaching an exposed portion of the electrically conductive core at a distal end of the prefabricated miniature coaxial wire to the first electrical connection point, thereby establishing electrical conductivity between the electrically conductive core and the first electrical connection point, depositing a layer of electrically insulating material onto the exposed portion of the electrically conductive core such that the exposed portion of the electrically conductive core and the first electrical connection point is encased in the layer of electrically insulating material, and connecting the electrically conductive shield layer to a second electrical connection point using a connector formed from an electrically conductive material.