H01L27/013

CONTACT STRUCTURES IN RC-NETWORK COMPONENTS

RC-network components that include a substrate and capacitor having a thin-film top electrode portion at a surface on one side of the substrate. The low ohmic semiconductor substrate is doped to contribute 5% or less to the resistance of the RC-network component. The resistance provided in series with the capacitor is controlled by providing a contact plate, spaced from the thin-film top electrode portion by an insulating layer, and a set of one or more bridging contacts passing through openings in the insulating layer. The bridging contacts electrically interconnect the thin-film top electrode portion and the contact plate. Different resistance values can be set by appropriate selection of the number of bridging contacts. The openings are elongated thereby reducing temperature concentration at their periphery. Correspondingly, the bridging contacts have an elongated cross-sectional shape.

ELECTRONIC DEVICE WITH DIFFERENTIAL TRANSMISSION LINES EQUIPPED WITH CAPACITORS SEPARATED BY A CAVITY, AND CORRESPONDING MANUFACTURING METHOD
20230012912 · 2023-01-19 ·

An electronic device is provided that includes a board equipped with a pair of differential transmission lines that each have an opening extending between two line terminals. Moreover, the device includes a capacitor module that includes a support and two capacitors that each have two capacitor terminals, respectively, connected to the two line terminals of one line of the pair of transmission lines. In addition, the support includes a separating region between the two capacitors that has at least one cavity disposed between the two capacitors.

PACKAGE COMPRISING A SUBSTRATE AND A MULTI-CAPACITOR INTEGRATED PASSIVE DEVICE
20230005901 · 2023-01-05 ·

A package that includes a substrate, an integrated device coupled to the substrate, and an integrated passive device comprising at least two capacitors. The integrated passive device is coupled to the substrate. The integrated passive device includes a passive device substrate comprising a first trench and a second trench, an oxide layer located over the first trench and the second trench, a first electrically conductive layer located over the oxide layer the first trench, a dielectric layer located over the first electrically conductive layer, and a second electrically conductive layer located over the dielectric layer.

PASSIVE COMPONENT Q FACTOR ENHANCEMENT WITH ELEVATED RESISTANCE REGION OF SUBSTRATE

An integrated circuit (IC) includes a semiconductor substrate and an interconnect region. The semiconductor substrate has a first surface and a second surface opposite the first surface. The semiconductor substrate has a first region with a passive component. The semiconductor substrate has a second region outside the first region. The resistance of the second region is smaller than the resistance of the first region. The interconnection region is on the second surface of the semiconductor substrate.

Semiconductor device with multiple polarity groups

A semiconductor device includes passive electrical components in a substrate; and an interconnect structure over the passive electrical components, conductive features of the interconnect structure being electrically coupled to the passive electrical components. The conductive features of the interconnect structure includes a first conductive line over the substrate; a conductive bump over the first conductive line, where in a plan view, the conductive bumps has a first elongated shape and is entirely disposed within boundaries of the first conductive line; and a first via between the first conductive line and the conductive bump, the first via electrically connected to the first conductive line and the conductive bump, where in the plan view, the first via has a second elongated shape and is entirely disposed within boundaries of the conductive bump.

SEMICONDUCTOR DEVICE WITH MULTIPLE POLARITY GROUPS

A semiconductor device includes passive electrical components in a substrate; and an interconnect structure over the passive electrical components, conductive features of the interconnect structure being electrically coupled to the passive electrical components. The conductive features of the interconnect structure includes a first conductive line over the substrate; a conductive bump over the first conductive line, where in a plan view, the conductive bumps has a first elongated shape and is entirely disposed within boundaries of the first conductive line; and a first via between the first conductive line and the conductive bump, the first via electrically connected to the first conductive line and the conductive bump, where in the plan view, the first via has a second elongated shape and is entirely disposed within boundaries of the conductive bump.

SEMICONDUCTOR DEVICE

According to an embodiment, a semiconductor device includes a layer stack including a conductive substrate containing semiconductor material and including a first main surface provided with one or more recesses and a second main surface opposite to the first main surface, a conductive layer covering at least part of the first main surface and side walls and bottom surfaces of the one or more recesses, and a dielectric layer interposed between the conductive substrate and the conductive layer, the conductive layer and a portion of the conductive substrate adjacent to the dielectric layer being an upper electrode and a lower electrode of a capacitor, respectively, an insulating layer provided on the capacitor or on the second main surface, and an inductor provided on the insulating layer at a position of the capacitor.

Semiconductor apparatus

A semiconductor apparatus that includes a semiconductor substrate having a first main surface and a second main surface, a first electrode opposing the first main surface of the semiconductor substrate, a dielectric layer between the semiconductor substrate and the first electrode, a second electrode opposing the second main surface of the semiconductor substrate, and a resistance control layer between the semiconductor substrate and the second electrode. The resistance control layer includes a first region having a first electrical resistivity and electrically connecting the semiconductor substrate and the second electrode, and a second region having a second electrical resistivity higher than the first electrical resistivity of the first region and adjacent to the first region.

QUALITY FACTOR OF A PARASITIC CAPACITANCE
20220209750 · 2022-06-30 ·

An integrated circuit includes a substrate, a reference contact coupled to the substrate, a capacitor over the substrate, and a substrate element. The capacitor includes a first conductive element having an associated parasitic capacitance and a second conductive element electrically isolated from the first conductive element. The substrate element is coupled to the first conductive element by the parasitic capacitance and coupled to the reference contact. The substrate element includes a conductive doped region in the substrate and aligned with the first conductive element and the reference contact.

PASSIVE COMPONENT

A passive component includes a substrate having insulating properties and having a surface having a recess, a bottom electrode filling at least a portion of the recess, a dielectric film provided on a surface of the bottom electrode, and a top electrode opposite to the bottom electrode with the dielectric film interposed therebetween. In a height direction perpendicular to the surface of the substrate, a dimension of the bottom electrode is larger than a dimension of the dielectric film.