This application provides an integrated circuit, including a first MOS transistor. A first effective gate and a second effective gate are disposed in the first MOS transistor, and a first redundant gate is disposed between the first effective gate and the second effective gate. The first effective gate, the second effective gate, and the first redundant gate cover a plurality of fins arranged in parallel. The first effective gate and the second effective gate are connected to a gate terminal of the first MOS transistor. Fins on both sides of the first effective gate and fins on both sides of the second effective gate are respectively connected to a source terminal and a drain terminal of the first MOS transistor. The first redundant gate is connected to a redundant potential or suspended.

A semiconductor integrated circuit device includes a control unit configured to control a switching element or an output transistor of a power supply device, a monitor terminal for monitoring an output voltage of the power supply device, a test unit configured to output a test signal to the monitor terminal before activation of the power supply device, and a determination unit configured to determine whether or not the monitor terminal is open, on the basis of a voltage of the monitor terminal when the test unit outputs the test signal to the monitor terminal.

A phase shifter includes a signal input, a signal output, an ESD protection circuit, first and second signal paths between the signal input and the signal output. The ESD protection circuit includes first and second two port devices, each two port device being switchable between a high impedance state and a low impedance state. The first signal path includes the first two port device of the ESD protection circuit and a first delay line configured to provide a first phase shift to a signal transmitted from the signal input to the signal output via the first signal path. The second signal path includes the second two port device of the ESD protection circuit and a second delay line configured to provide a second phase shift, different from the first phase shift, to the signal transmitted from the signal input to the signal output via the second signal path.

One embodiment provides a technique of adjusting a gate voltage to be applied to at least one MOS capacitor and an amount of electric charges to be stored in the MOS capacitor so as to determine a sensitivity of a change in the amount of electric charges stored in the MOS capacitor, and exposing the MOS capacitor to an electric filed for a predetermined amount of time and then reading an electron inflow or outflow result due to the electric field so as to interpret the intensity and the direction of the electric field, thereby measuring the intensity and the direction of the electric field.

A semiconductor device includes a source region, a drain region, and a gate insulating film formed on a substrate, a gate electrode formed on the gate insulating film, a first insulating film pattern formed to extend from the source region to a part of a top surface of the gate electrode, and a spacer formed on a side surface of the gate electrode in a direction of the drain region.

Various embodiments of the present disclosure are directed towards a semiconductor device. The semiconductor device comprises a source region and a drain region in a substrate and laterally spaced. A gate stack is over the substrate and between the source region and the drain region. The drain region includes two or more first doped regions having a first doping type in the substrate. The drain region further includes one or more second doped regions in the substrate. The first doped regions have a greater concentration of first doping type dopants than the second doped regions, and each of the second doped regions is disposed laterally between two neighboring first doped regions.

Aspects of this disclosure relate to detecting and recording information associated with electrical overstress (EOS) events, such as electrostatic discharge (ESD) events. For example, in one embodiment, an apparatus includes an electrical overstress protection device, a detection circuit configured to detect an occurrence of the EOS event, and a memory configured to store information indicative of the EOS event.

A power device can be structured with a power switch having multiple arrangements such that the power switch can operate as a power switch with the capability to measure properties of the power switch. An example power device can comprise a main arrangement of transistor cells and a sensor arrangement of sensor transistor cells. The main arrangement can be structured to operate as a power switch, with the transistor cells of the main arrangement having control nodes connected in parallel to receive a common control signal. The sensor arrangement of sensor transistor cells can be structured to measure one or more parameters of the main arrangement, with the sensor transistor cells having sensor control nodes connected in parallel to receive a common sensor control signal. The sensor transistor cells can have a common transistor terminal shared with a common transistor terminal of the transistor cells of the main arrangement.

A Schmitt trigger circuit includes a first and second set of transistors, a first and second feedback transistor, and a first and second circuit. The first set of transistors is connected between a first voltage supply and an output node. The first voltage supply has a first voltage. The second set of transistors is connected between the output node and a second voltage supply. The second voltage supply has a second voltage. The first feedback transistor is connected to the output node, a first node and a second node. The second feedback transistor is connected to the output node, a third node and a fourth node. The first circuit is coupled to and configured to supply the second supply voltage to the second node. The second circuit is coupled to and configured to supply the first supply voltage to the fourth node.

A memory device is disclosed. The disclosed memory device may include a first wafer, and a second wafer stacked on and bonded to the first wafer. The first wafer may include a cell structure including a memory cell array; and a first logic structure disposed under the cell structure, and including a column control circuit. The second wafer may include a second logic structure including a row control circuit.