An integrated circuit includes a T-coil formed in a first metal layer, wherein the T-coil may include: a first inductor connected to a first terminal and a second terminal; and a second inductor connected to the second terminal and a third terminal, wherein the first inductor and the second inductor may include a first pattern and a second pattern, respectively, the first and second patterns extending parallel to each other in a first direction from the second terminal in the first metal layer, and wherein the first pattern and the second pattern may form a bridge capacitor of the T-coil.

There are provided an electrostatic protection circuit, an array substrate, and a display apparatus. The electrostatic protection circuit includes: at least one first transistor and at least one second transistor. Each of the first transistors has a gate and a second electrode both connected to an electrostatic protection line, and a first electrode connected to a signal line; and each of the second transistors has a gate and a second electrode both connected to the signal line, and a first electrode connected to the electrostatic protection line. One resistor is connected in series between a gate and a second electrode of at least one transistor in the electrostatic protection circuit.

An integrated circuit includes a signal pad, receiving an input signal during a normal mode, and receive an ESD signal during an ESD mode; an internal circuit, processing the input signal during the normal mode; a variable impedance circuit, comprising a first end coupled to the signal pad, a second end coupled to the internal circuit, wherein the variable impedance circuit provides a low or high impedance path between the signal pad and the internal circuit during the normal or ESD mode; and a switch circuit, comprising a first end coupled to a control end of the variable impedance circuit, a second end coupled to a reference voltage terminal, and a control end receiving a node voltage, wherein the switch circuit switches the control end of the variable impedance circuit to have a first specific voltage or be electrically floating during the normal or ESD mode.

The present disclosure relates to the technical field of semiconductors, and provides an electro-static discharge (ESD) protection structure and a chip. The ESD protection structure includes: a semiconductor substrate, a first P-type well, a first N-type well, a first N-type doped portion, a first P-type doped portion, a second N-type doped portion, a second P-type doped portion, a third doped well, a third P-type doped portion and a third N-type doped portion, wherein the first P-type well, the first N-type well and the third doped well are located in the semiconductor substrate; the first N-type doped portion and the first P-type doped portion are located in the first N-type well and spaced apart; the second N-type doped portion and the second P-type doped portion are located in the first P-type well and spaced apart.

The present disclosure provides an electrostatic protection device, and relates to the technical field of semiconductors. The electrostatic discharge protection device includes a first P-type heavily-doped region, a first N-type heavily-doped region, a second N-type heavily-doped region, a second P-type heavily-doped region, and a third N-type heavily-doped region. The first P-type heavily-doped region and the first N-type heavily-doped region are located in a P well, the second P-type heavily-doped region and the third N-type heavily-doped region are located in a first N well, one part of the second N-type heavily-doped region is located in the P well, the other part of the second N-type heavily-doped region is located in first N well, and the P well and the first N well are adjacent to each other and both located in the P-type substrate.

This disclosure relates to a semiconductor device including a device with high clamping voltage (HVC device), and an OTS device. Such a semiconductor device provides very advantageous ESD protection. The semiconductor device can be realized in two ways: an OTS device and a device with high clamping voltage can be realized as discrete, independent devices that are combined in one semiconductor package, or an OTS device can be integrated into interconnect layers of a device with high clamping voltage by integration.

A semiconductor device includes a first conductive material, a dielectric structure extending over a top surface of the first conductive material, the dielectric material having a first portion with a first thickness, and a second portion with a second thickness, and a third portion with a third thickness between the first thickness and the second thickness; and a second conductive material extending over the first portion of the dielectric structure. An oxygen-enriched portion of the second conductive material extends along a top surface and a sidewall of the second conductive material. A bottom surface and an interior portion of the second conductive material have an oxygen concentration which is larger than an oxygen concentration of a bottom surface and an interior portion of the second conductive material.

The present disclosure provides an electrostatic discharge (ESD) protection circuit and a chip. The ESD protection circuit is connected between a power supply VDD and a ground VSS, and includes a filter branch, a first inverter group, a switch transistor, a clamp transistor, a feedback transistor, and a second inverter group. The first inverter group has two terminals respectively connected to a first node and a second node. The switch transistor has a gate connected to the second node. The clamp transistor has a gate connected to a fourth node. The feedback transistor has a gate connected to the fourth node. The second inverter group has two terminals respectively connected to a third node and the fourth node.

According to one embodiment, a display device includes first semiconductor layers crossing a first scanning line in a non-display area, the first semiconductor layers being a in number, second semiconductor layers crossing a second scanning line in the non-display area, the second semiconductor layers being b in number, and an insulating film disposed between the first and second semiconductor layers and the first and second scanning lines, wherein a and b are integers greater than or equal to 2, and a is different from b, and the first and second semiconductor layers are both entirely covered with the insulating film.

An electrostatic discharge protection circuit includes a pull-down switch, a dummy pattern arranged parallel to the pull-down switch in a first direction, clamp switches arranged parallel to each other in the first direction between the dummy pattern and the pull-down switch, and a resistor configured to transfer a power supply voltage supplied through a power terminal to a gate pattern of the pull-down switch by being arranged parallel to the pull-down switch. Drains of the clamp switches are coupled in common to the power terminal, sources of the clamp switches are coupled in common to a ground terminal, and a first end of the pull-down switch and a second end of the resistor are coupled to each other through a first conductive line extending in the first direction, the pull-down switch, the resistor and the first conductive line are formed in a same layer.