H01S3/034

Synthetic diamond optical elements

An optical element comprising a window formed of synthetic diamond material and an optical surface pattern formed directly in a surface of the synthetic diamond material. The window of synthetic diamond material is in the form of a wedged diamond window with non-parallel major surfaces defining a wedge angle in a range (1) arcminute to 10° and the optical surface pattern is formed directly in one or both of the non-parallel major surfaces. There is also described a laser system comprising the optical element and a laser having a coherence length, wherein the coherence length of the laser is greater than twice a thickness of the wedged diamond window at its thickest point.

METROLOGY FOR IMPROVING DUV LASER ALIGNMENT
20230009554 · 2023-01-12 ·

A light source apparatus includes a gas discharge stage, a sensing apparatus, an optical arrangement, an adjustment apparatus, and a control apparatus. The gas discharge stage includes an optical amplifier including a chamber configured to hold a gas discharge medium outputting a light beam, and a set of optical elements configured to form an optical resonator around the optical amplifier. The optical arrangement is configured to image light from a plurality of distinct object planes within the gas discharge stage onto the sensing apparatus. The adjustment apparatus is in physical communication with one or more optical components within the gas discharge stage and is configured to modify at least one geometric aspect of the optical components. The control apparatus is communication with the sensing apparatus and the adjustment apparatus and is configured to provide a signal to the adjustment apparatus based on an output from the sensing apparatus.

METROLOGY FOR IMPROVING DUV LASER ALIGNMENT
20230009554 · 2023-01-12 ·

A light source apparatus includes a gas discharge stage, a sensing apparatus, an optical arrangement, an adjustment apparatus, and a control apparatus. The gas discharge stage includes an optical amplifier including a chamber configured to hold a gas discharge medium outputting a light beam, and a set of optical elements configured to form an optical resonator around the optical amplifier. The optical arrangement is configured to image light from a plurality of distinct object planes within the gas discharge stage onto the sensing apparatus. The adjustment apparatus is in physical communication with one or more optical components within the gas discharge stage and is configured to modify at least one geometric aspect of the optical components. The control apparatus is communication with the sensing apparatus and the adjustment apparatus and is configured to provide a signal to the adjustment apparatus based on an output from the sensing apparatus.

DIRECTED GAS PURGE TO REDUCE DUSTING OF EXCIMER DISCHARGE CHAMBER WINDOWS
20230006409 · 2023-01-05 ·

A light source apparatus includes a chamber and a metal fluoride trap coupled to the chamber and configured to provide clean gas to a set of window housing apparatuses coupled to the chamber. Each window housing apparatus is configured to reduce metal fluoride dusting on an optical window and includes a window housing supporting an optical window, an aperture apparatus coupled to the window housing, and an insert disposed between the aperture apparatus and the optical window. The aperture apparatus includes a plurality of cells configured to trap metal fluoride dust flowing upstream from the chamber through the aperture apparatus toward the optical window. The insert is configured to control a first flow rate of the clean gas along the optical window and a second flow

Laser light source and a laser crystallization apparatus including the same

A laser light source is provided including an airtight container. A first resonance mirror and a second resonance mirror are disposed outside the airtight container. The first resonance mirror includes a lens unit and a reflection coating layer. The lens unit includes a first surface and a second surface, and the first surface is inclined with respect to the second surface.

UNDERCUT ELECTRODES FOR A GAS DISCHARGE LASER CHAMBER
20230016894 · 2023-01-19 ·

Provided is a light source apparatus and an electrode design for use in a discharge chamber of the light source apparatus. The discharge chamber is configured to hold a gas discharge medium configured to output a light beam. The light source apparatus include a pair of opposed electrodes configured to excite a gas medium to form a discharge plasma. At least one electrode of the pair of opposing electrodes may include recessed portions or hollowed-out portions at each end of the electrode, or at other suitable locations. The disclosed electrode structures improve uniformity of the erosion profile of the electrodes, significantly extending the lifespan of the discharge chamber by redistributing the discharge particle flux through the electrode with an optimized design of the electrode geometry, as the local discharge particle flux is reduced at the recessed portions.

SYSTEMS AND METHODS FOR CONTROLLING A CENTER WAVELENGTH
20230223734 · 2023-07-13 ·

The present disclosure is directed to systems and methods for controlling a center wavelength. In one example, a method includes estimating a center wavelength error. The method also includes determining a first actuation amount for a first actuator controlling movement a first prism based on the estimated center wavelength error. The method also includes actuating the first actuator based on the actuation amount. The method also includes determining whether the first prism is off-center. The method also includes, in response to determining that the first prism is off-center, determining a second actuation amount for the first actuator and determining a third actuation amount for a second actuator for controlling movement of a second prism. The method also includes actuating the first actuator and the second actuator based on the second and third actuation amounts, respectively. The method finds application in multi-focal imaging operations.

WIDELY TUNABLE COMPACT TERAHERTZ GAS LASERS

Disclosed is a laser system including a first laser and a second laser. The first laser includes a laser cavity, and a gas phase molecular gain medium disposed in the laser cavity, the gain medium having an absorption band. The second laser is a solid state laser configured to be continuously tunable, with respect to an emission wavelength of the second laser, over the absorption band of the gain medium, and the second laser is tuned to pump rotational vibrational transitions in the gain medium to achieve a rotational population inversion.

Laser chamber apparatus, gas laser apparatus, and method for manufacturing electronic device
11588291 · 2023-02-21 · ·

A laser chamber apparatus may include a pipe, an inner electrode extending along a longitudinal direction of the pipe and disposed in a through hole in the pipe, an outer electrode including a contact plate extending along the longitudinal direction of the pipe and being in contact with an outer circumferential surface of the pipe and a ladder section formed of bar members each having one end connected to the contact plate and juxtaposed along a longitudinal direction of the contact plate, and a leaf spring extending along the longitudinal direction of the pipe and configured to press the outer electrode against the pipe. The leaf spring may include leaf spring pieces separated by slits, and the leaf spring pieces may each include a bent section bent along the edge and are configured to press the bar members in a position shifted from the bent sections toward the edge.

Thin film brewster coupling device
11476630 · 2022-10-18 ·

A thin film Brewster coupling device configured for low loss transmission of an imposed polarized parallel to plane of incidence 8.5 micron to 11.5 micron wavelength laser beam and simultaneous high reflectivity of a polarized perpendicular to plane of incidence 2 micron to 4 micron wavelength laser beam. The device comprising an optical media substrate and at least one dielectric stack optically coupled to the optical media substrate where the dielectric stack comprises a dielectric layer and an overlayer, the dielectric layer and the overlayer each comprising a thickness of nominally a quarter wavelength of the 2 micron to 4 micron wavelength laser beam, and oriented at near the Brewster Angle to the incident 8.5 micron to 11.5 micron wavelength laser beam. The substrate and dielectric mediums of necessary characteristics to result in low LIDT, high strength, chemical inertness and high thermal conductivity.