Patent classifications
H01S3/036
Controlling pressure in a cavity of a light source
Methods and systems for controlling pressure in a cavity of a light source are provided. One system includes a barometric pressure sensor configured for measuring pressure in a cavity of a light source. The system also includes one or more gas flow elements configured for controlling an amount of one or more gases in the cavity. In addition, the system includes a control subsystem configured for comparing the measured pressure to a predetermined range of values for the pressure and, when the measured pressure is outside of the predetermined range, altering a parameter of at least one of the one or more gas flow elements based on results of the comparing.
Controlling pressure in a cavity of a light source
Methods and systems for controlling pressure in a cavity of a light source are provided. One system includes a barometric pressure sensor configured for measuring pressure in a cavity of a light source. The system also includes one or more gas flow elements configured for controlling an amount of one or more gases in the cavity. In addition, the system includes a control subsystem configured for comparing the measured pressure to a predetermined range of values for the pressure and, when the measured pressure is outside of the predetermined range, altering a parameter of at least one of the one or more gas flow elements based on results of the comparing.
PACKED-BED FILTER FOR METAL FLUORIDE DUST TRAPPING IN LASER DISCHARGE CHAMBERS
A light source apparatus (200) includes a gas discharge stage (210) and a metal fluoride trap (300). The gas discharge stage includes an optical amplifier (206) and a set of optical elements (250, 260). The optical amplifier includes a chamber (211) configured to hold a gas discharge medium (213), the gas discharge medium outputting a light beam. The set of optical elements is configured to form an optical resonator around the optical amplifier. The metal fluoride trap is configured to trap metal fluoride dust generated from the gas discharge stage. The metal fluoride trap includes an electrostatic precipitator (320) and a packed-bed filter (400, 402, 404) disposed around the electrostatic precipitator. The packed-bed filter includes a plurality of beads configured (406, 408) to absorb metal fluoride dust (208).
DIRECTED GAS PURGE TO REDUCE DUSTING OF EXCIMER DISCHARGE CHAMBER WINDOWS
A light source apparatus includes a chamber and a metal fluoride trap coupled to the chamber and configured to provide clean gas to a set of window housing apparatuses coupled to the chamber. Each window housing apparatus is configured to reduce metal fluoride dusting on an optical window and includes a window housing supporting an optical window, an aperture apparatus coupled to the window housing, and an insert disposed between the aperture apparatus and the optical window. The aperture apparatus includes a plurality of cells configured to trap metal fluoride dust flowing upstream from the chamber through the aperture apparatus toward the optical window. The insert is configured to control a first flow rate of the clean gas along the optical window and a second flow
PREDICTIVE APPARATUS IN A GAS DISCHARGE LIGHT SOURCE
An apparatus includes a decision module that is configured to: receive a performance metric relating to performance conditions of an optical system emitting a light beam; estimate, based on the performance metric and a predetermined learning model, an effectiveness of a proposed change to the optical system; and output a change command to the optical system if it is estimated that the proposed change to the optical system would be effective.
UNDERCUT ELECTRODES FOR A GAS DISCHARGE LASER CHAMBER
Provided is a light source apparatus and an electrode design for use in a discharge chamber of the light source apparatus. The discharge chamber is configured to hold a gas discharge medium configured to output a light beam. The light source apparatus include a pair of opposed electrodes configured to excite a gas medium to form a discharge plasma. At least one electrode of the pair of opposing electrodes may include recessed portions or hollowed-out portions at each end of the electrode, or at other suitable locations. The disclosed electrode structures improve uniformity of the erosion profile of the electrodes, significantly extending the lifespan of the discharge chamber by redistributing the discharge particle flux through the electrode with an optimized design of the electrode geometry, as the local discharge particle flux is reduced at the recessed portions.
UNDERCUT ELECTRODES FOR A GAS DISCHARGE LASER CHAMBER
Provided is a light source apparatus and an electrode design for use in a discharge chamber of the light source apparatus. The discharge chamber is configured to hold a gas discharge medium configured to output a light beam. The light source apparatus include a pair of opposed electrodes configured to excite a gas medium to form a discharge plasma. At least one electrode of the pair of opposing electrodes may include recessed portions or hollowed-out portions at each end of the electrode, or at other suitable locations. The disclosed electrode structures improve uniformity of the erosion profile of the electrodes, significantly extending the lifespan of the discharge chamber by redistributing the discharge particle flux through the electrode with an optimized design of the electrode geometry, as the local discharge particle flux is reduced at the recessed portions.
Laser device and electronic device manufacturing method
A laser device may include a laser resonator; a chamber arranged on an optical path of the laser resonator; a pair of electrodes arranged in the chamber; a power source applying a voltage to the electrodes; a storage unit storing a voltage value; and a control unit configured to set an application voltage value of the voltage applied to the electrodes as setting the application voltage value for outputting a pulse whose pulse number is equal to or larger than 1 and smaller than i based on the voltage command value and the voltage value stored in the storage unit, and setting the application voltage for outputting a pulse whose pulse number is equal to or larger than i and smaller than j based on the voltage command value and an offset value corresponding to the voltage command value, where i>1 and j>i.
GAS PURGE SYSTEMS FOR A LASER SOURCE
A laser source includes a laser chamber configured to generate a first laser beam. The laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. The laser source also includes a gas purge system. According to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. According to some aspects, the gas purge system is configured to supply a helium gas into the optical system.
GAS PURGE SYSTEMS FOR A LASER SOURCE
A laser source includes a laser chamber configured to generate a first laser beam. The laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. The laser source also includes a gas purge system. According to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. According to some aspects, the gas purge system is configured to supply a helium gas into the optical system.