A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

A dielectric electrode assembly, and a method of manufacture thereof, including: a dielectric tube having a cylindrical cross-section and a relative dielectric constant, ε.sub.2, the dielectric tube filled with a gas having a relative dielectric constant, ε.sub.1; a structural dielectric having a relative dielectric constant, ε.sub.3 surrounding the dielectric tube; metal electrodes on opposite sides of the structural dielectric, the metal electrodes having a flat cross-sectional geometry; and the structural dielectric made from a material selected such that the relative dielectric constants of the structural dielectric, the dielectric tube, and the gas are interrelated and a uniform electric field is generated within the dielectric tube when power is applied to the metal electrodes.

A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

A multi-pass coaxial molecular gas laser is described in both symmetrical and asymmetrical configuration. An anode vessel receives lasing gas and the gas flows through one or more plasma channels to a cathode vessel which receives the gas and redirects it in the closed system. A second anode vessel may alternatively be provided to double length of the plasma channel and increase surface area exposure of the optical beam to the energized gas. Non-laminar gas flow may be created using spiral nozzles at the entrance of the optical resonator.

A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

Systems and techniques for multilayer electrode assemblies are generally described. In some examples, a multilayer electrode assembly may comprise a first dielectric material. In some examples, the first dielectric material may be shaped so as to form a channel defined by an interior surface. In various examples the multilayer electrode assemblies may comprise a first metal layer disposed adjacent to a first portion of the exterior surface of the first dielectric material. In various further examples, the multilayer electrode assemblies may comprise a second metal layer disposed adjacent to a second portion of the exterior surface of the first dielectric material. In some examples, the first metal layer may be disposed in a first spaced relationship with the second metal layer. In various examples, a substantially uniform electric field may be generated in the channel of the first dielectric material when a voltage is applied to the multilayer electrode assembly.

A dielectric electrode assembly, and a method of manufacture thereof, including: a dielectric tube having a cylindrical cross-section and a relative dielectric constant, .sub.2, the dielectric tube filled with a gas having a relative dielectric constant, .sub.1; a structural dielectric having a relative dielectric constant, .sub.3 surrounding the dielectric tube; metal electrodes on opposite sides of the structural dielectric, the metal electrodes having a flat cross-sectional geometry; and the structural dielectric made from a material selected such that the relative dielectric constants of the structural dielectric, the dielectric tube, and the gas are interrelated and a uniform electric field is generated within the dielectric tube when power is applied to the metal electrodes.

Systems and techniques for multilayer electrode assemblies are generally described. In some examples, a multilayer electrode assembly may comprise a first dielectric material. In some examples, the first dielectric material may be shaped so as to form a channel defined by an interior surface. In various examples the multilayer electrode assemblies may comprise a first metal layer disposed adjacent to a first portion of the exterior surface of the first dielectric material. In various further examples, the multilayer electrode assemblies may comprise a second metal layer disposed adjacent to a second portion of the exterior surface of the first dielectric material. In some examples, the first metal layer may be disposed in a first spaced relationship with the second metal layer. In various examples, a substantially uniform electric field may be generated in the channel of the first dielectric material when a voltage is applied to the multilayer electrode assembly.

A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.