A dielectric-grating waveguide free-electron laser device generating coherent or laser-like radiation is provided. An electron beam propagates next to a dielectric waveguide with a built-in grating structure to generate highly confined coherent or laser-like radiation in the waveguide through the Bragg resonance, the backward-wave resonance, or the Fabry-Perot resonance provided by the grating-waveguide structure. The dielectric-grating waveguide can be made of linear optical materials or nonlinear optical materials or combination of linear and nonlinear optical materials to enable versatile functionalities, such as laser generation, laser-wavelength conversion, and laser signal processing. Owing to the build-up of the laser modes inside the dielectric waveguide, coherent or laser-like Smith-Purcell radiation is also generated above the grating via coupling and bunching of the electrons with the surface mode fields.

A light source for high power coherent light can include multiparticle relativistic bunches of electrons generating high intensity propagating fields. Coherent emission between electrons may also be utilized. The source may be independent of any medium or media to remove all constraints on the wavelength of the light emitted. And at least a portion of a single alternating magnetic field for accelerating the electron bunches can be included. The color or wavelength of the produced light can be determined solely by the parameters of the electron bunches and the alternating field. The source can be used for imaging, such as medical imaging or for security, including concealed weapons, and for quality control.

A display device includes a laser irradiation device and a control device. The laser irradiation device is configured to irradiate an irradiation point located at a display position in air, with a laser beam having a wavelength equal to or larger than 380 nm and equal to or smaller than 780 nm and produce plasma at the display position. The control device is configured to control intensity of the laser beam emitted from the at least one laser irradiation device so that a relationship between intensity of plasma light emitted from the plasma at the display position and intensity of scattered light produced from the laser beam and scattered by the plasma becomes a predetermined relationship to display a color pixel.

A display device includes a laser irradiation device and a control device. The laser irradiation device is configured to irradiate an irradiation point located at a display position in air, with a laser beam having a wavelength equal to or larger than 380 nm and equal to or smaller than 780 nm and produce plasma at the display position. The control device is configured to control intensity of the laser beam emitted from the at least one laser irradiation device so that a relationship between intensity of plasma light emitted from the plasma at the display position and intensity of scattered light produced from the laser beam and scattered by the plasma becomes a predetermined relationship to display a color pixel.

Provided is a method of generating a squeezed quantum illumination light source, including generating a dual mode squeezed light source including a signal mode and an idler mode, obtaining a degree of additional squeezing for the dual mode squeezed light source based on object information, determining a squeezing angle and a degree of operation that satisfy the degree of additional squeezing for each of the signal mode and the idler mode, and squeezing the dual mode squeezed light source based on the squeezing angle and the degree of operation, and provided is a quantum radar device using the squeezed quantum illumination light source.

Provided is a method of generating a squeezed quantum illumination light source, including generating a dual mode squeezed light source including a signal mode and an idler mode, obtaining a degree of additional squeezing for the dual mode squeezed light source based on object information, determining a squeezing angle and a degree of operation that satisfy the degree of additional squeezing for each of the signal mode and the idler mode, and squeezing the dual mode squeezed light source based on the squeezing angle and the degree of operation, and provided is a quantum radar device using the squeezed quantum illumination light source.

A method of performing a computation using a quantum computer includes generating a first laser pulse and a second laser pulse to cause entanglement interaction between a first trapped ion and a second trapped ion of a plurality of trapped ions that are aligned in a first direction, each of the plurality of trapped ions having two frequency- separated states defining a qubit, and applying the generated first laser pulse to the first trapped ion and the generated second laser pulse to the second trapped ion. Generating the first laser pulse and the second laser pulse includes stabilizing the entanglement interaction between the first and second trapped ions against fluctuations in frequencies of collective motional modes of the plurality of trapped ions in a second direction that is perpendicular to the first direction.

A method of performing a computation using a quantum computer includes generating a first laser pulse and a second laser pulse to cause entanglement interaction between a first trapped ion and a second trapped ion of a plurality of trapped ions that are aligned in a first direction, each of the plurality of trapped ions having two frequency- separated states defining a qubit, and applying the generated first laser pulse to the first trapped ion and the generated second laser pulse to the second trapped ion. Generating the first laser pulse and the second laser pulse includes stabilizing the entanglement interaction between the first and second trapped ions against fluctuations in frequencies of collective motional modes of the plurality of trapped ions in a second direction that is perpendicular to the first direction.

An illumination system for an EUV projection lithographic projection exposure apparatus comprises an EUV light source, which generates an output beam of EUV illumination light with a predetermined polarization state. An illumination optical unit guides the output beam along an optical axis, as a result of which an illumination field in a reticle plane is illuminated by the output beam. The light source comprises an electron beam supply device, an EUV generating device and a polarization setting device. The EUV generating device is supplied with an electron beam by the electron beam supply device. The polarization setting device exerts an adjustable deflecting effect on the electron beam for setting the polarization of the output beam. This results in an illumination system, which operates on the basis of an electron beam-based EUV light source and provides an output beam, which is improved for a resolution-optimized illumination.

At least one method, apparatus and system for providing capturing synchrotron radiation for a metrology tool, are disclosed. A beam using a first light emitting device is provided. The first light emitting device comprises a first electron path bend. A first synchrotron radiation is provided from the first electron path bend to a first metrology tool configured to perform a metrology inspection using the first synchrotron radiation.