Patent classifications
H01S3/10069
MONITORING DEVICE, MONITORING METHOD, OPTICAL AMPLIFIER, AND OPTICAL TRANSMISSION SYSTEM
Provided are a monitoring device, a monitoring method, an optical amplifier, and an optical transmission system that are adapted for an increase in the number of cores in a multi-core optical fiber transmission path, and that are suitable for crosstalk monitoring. The monitoring device monitors a multi-core optical fiber transmission path comprising a plurality of use core and at least one or more non-use cores. The monitoring device comprises: an applying means for applying dithering to signal light propagating in the use cores; a monitoring means for monitoring the power of the non-use cores; and a separating means for separating a monitoring result from the monitoring means into power components from the plurality of use cores.
SYSTEMS AND METHODS FOR CONTROLLING A CENTER WAVELENGTH
The present disclosure is directed to systems and methods for controlling a center wavelength. In one example, a method includes estimating a center wavelength error. The method also includes determining a first actuation amount for a first actuator controlling movement a first prism based on the estimated center wavelength error. The method also includes actuating the first actuator based on the actuation amount. The method also includes determining whether the first prism is off-center. The method also includes, in response to determining that the first prism is off-center, determining a second actuation amount for the first actuator and determining a third actuation amount for a second actuator for controlling movement of a second prism. The method also includes actuating the first actuator and the second actuator based on the second and third actuation amounts, respectively. The method finds application in multi-focal imaging operations.
Laser device and electronic device manufacturing method
A laser device may include a laser resonator; a chamber arranged on an optical path of the laser resonator; a pair of electrodes arranged in the chamber; a power source applying a voltage to the electrodes; a storage unit storing a voltage value; and a control unit configured to set an application voltage value of the voltage applied to the electrodes as setting the application voltage value for outputting a pulse whose pulse number is equal to or larger than 1 and smaller than i based on the voltage command value and the voltage value stored in the storage unit, and setting the application voltage for outputting a pulse whose pulse number is equal to or larger than i and smaller than j based on the voltage command value and an offset value corresponding to the voltage command value, where i>1 and j>i.
A RADIATION SYSTEM FOR CONTROLLING BURSTS OF PULSES OF RADIATION
A radiation system for controlling bursts of pulses of radiation comprises: an optical element; a controller; an actuator; and a sensor. The optical element is configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, the characteristic of the pulses of radiation being dependent on a configuration of the optical element. The controller is operable to generate a control signal. The actuator is configured to receive the control signal from the controller and to control a configuration of the optical element in dependence on the control signal. The sensor is operable to determine the characteristic of pulses having interacted with the optical element. The control signal for a given pulse in a given burst is dependent on the determined characteristic of a corresponding pulse from a previous burst.
EXPOSURE METHOD, EXPOSURE SYSTEM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES
An exposure method includes reading data representing a relationship between a first parameter relating to an energy ratio between energy of first pulsed laser light having a first wavelength and energy of second pulsed laser light having a second wavelength longer than the first wavelength and a second parameter relating to a sidewall angle of a resist film that is the angle of a sidewall produced when the resist film is exposed to the first pulsed laser light and the second pulsed laser light, and determining a target value of the first parameter based on the data and a target value of the second parameter; and exposing the resist film to the first pulsed laser light and the second pulsed laser light by controlling a narrowed-line gas laser apparatus to output the first pulsed laser light and the second pulsed laser light based on the target value of the first parameter.
CONTROLLING A SPECTRAL PROPERTY OF AN OUTPUT LIGHT BEAM PRODUCED BY AN OPTICAL SOURCE
A system includes: an optical source including a plurality of optical oscillators; a spectral analysis apparatus; and a controller. Each optical oscillator is configured to produce a light beam. The controller is configured to: determine, based on data from the spectral analysis apparatus, whether the spectral property of the light beam of one of the optical oscillators is different than the spectral property of the light beam of at least another of the plurality of optical oscillators. If the spectral property of the light beam of the first one of the optical oscillators is different than the spectral property of the light beam of another of the optical oscillators, the controller is configured to adjust the spectral property of the light beam of the first one of the optical oscillators or of the light beam of at least one other of the optical oscillators.
LINE NARROWING DEVICE, ELECTRONIC DEVICE MANUFACTURING METHOD
A line narrowing device includes first and second prisms disposed at positions different in a wavelength dispersion direction of any of the first and second prisms, a third prism disposed on the optical path of an optical beam and through which the beam width of the optical beam is enlarged and first and second parts of the optical beam are incident on the first and second prisms, respectively, a grating disposed across the optical path of the first part having passed through the first prism and the optical path of the second part having passed through the second prism, a first actuator configured to adjust the incident angle of the first part on the grating, a second actuator configured to adjust the incident angle of the second part on the grating, and a third actuator configured to adjust an energy ratio of the first and second parts.
LINE NARROWED GAS LASER APPARATUS, CONTROL METHOD THEREFOR, ELECTRONIC DEVICE MANUFACTURING METHOD
A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.
LINE NARROWING DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; a second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.
SENSOR DEGRADATION EVALUATION METHOD
A sensor degradation evaluation method according to an aspect of the present disclosure includes an evaluation step of evaluating degradation of at least one of a sensor for coarse measurement that receives interference fringes produced by a spectrometer for coarse measurement and a sensor for fine measurement that receives interference fringes produced by a spectrometer for fine measurement, and the evaluation step includes causing a plurality of kinds of laser light having wavelengths different from one another to be sequentially incident on the spectrometer for coarse measurement and the spectrometer for fine measurement and acquiring a coarse-measurement wavelength and a fine-measurement wavelength on a wavelength basis from a plurality of the received interference fringes, acquiring a degradation parameter on a wavelength basis from the coarse-measurement wavelength and the fine-measurement wavelength on a wavelength basis, and comparing the degradation parameter on a wavelength basis with a threshold.