H01S3/109

Controlling pressure in a cavity of a light source
11581692 · 2023-02-14 · ·

Methods and systems for controlling pressure in a cavity of a light source are provided. One system includes a barometric pressure sensor configured for measuring pressure in a cavity of a light source. The system also includes one or more gas flow elements configured for controlling an amount of one or more gases in the cavity. In addition, the system includes a control subsystem configured for comparing the measured pressure to a predetermined range of values for the pressure and, when the measured pressure is outside of the predetermined range, altering a parameter of at least one of the one or more gas flow elements based on results of the comparing.

Controlling pressure in a cavity of a light source
11581692 · 2023-02-14 · ·

Methods and systems for controlling pressure in a cavity of a light source are provided. One system includes a barometric pressure sensor configured for measuring pressure in a cavity of a light source. The system also includes one or more gas flow elements configured for controlling an amount of one or more gases in the cavity. In addition, the system includes a control subsystem configured for comparing the measured pressure to a predetermined range of values for the pressure and, when the measured pressure is outside of the predetermined range, altering a parameter of at least one of the one or more gas flow elements based on results of the comparing.

CHIRPED BRAGG GRATING ELEMENTS

Apparatus and methods for altering one or more spectral, spatial, or temporal characteristics of a light-emitting device are disclosed. Generally, such apparatus may include a volume Bragg grating (VBG) element that receives input light generated by a light-emitting device, conditions one or more characteristics of the input light, and causes the light-emitting device to generate light having the one or more characteristics of the conditioned light.

DIRECTIONAL UVC SYSTEMS AND METHODS

A portable sanitization system may comprise: a portable device; a light source disposed in the portable device, the light source configured to emit a light having a wavelength between 414 and 474 nm; a light converter comprising a nonlinear crystal configured for frequency doubling; and a light guide extending from the light source to the light converter, the light converter disposed proximal a tip of the light guide.

DIRECTIONAL UVC SYSTEMS AND METHODS

A portable sanitization system may comprise: a portable device; a light source disposed in the portable device, the light source configured to emit a light having a wavelength between 414 and 474 nm; a light converter comprising a nonlinear crystal configured for frequency doubling; and a light guide extending from the light source to the light converter, the light converter disposed proximal a tip of the light guide.

SINGLE-LASER LIGHT SOURCE SYSTEM FOR COLD ATOM INTERFEROMETERS

A single-laser light source system for cold atom interferometers, comprising: a reference light module including a narrow-bandwidth laser and a frequency stabilization module and an optical frequency shift module including a first electro-optic modulator and a first narrow-bandwidth optical-fiber filter. The first electro-optic modulator is connected to the first narrow-bandwidth optical-fiber filter by an optical fiber, and the first electro-optic modulator is connected to the laser by an optical fiber. The first electro-optic modulator receives an initial light from the laser, modulates the initial light by a modulation signal with a preset frequency, and generates sidebands with the preset frequency. The first narrow-bandwidth optical-fiber filter filters the optical signal at the output of the first electro-optic modulator to obtain a frequency-shifted light as the +1-order sideband. The frequency-shifted light is used for modulation to obtain a measurement and control light of the cold atom interferometer.

SINGLE-LASER LIGHT SOURCE SYSTEM FOR COLD ATOM INTERFEROMETERS

A single-laser light source system for cold atom interferometers, comprising: a reference light module including a narrow-bandwidth laser and a frequency stabilization module and an optical frequency shift module including a first electro-optic modulator and a first narrow-bandwidth optical-fiber filter. The first electro-optic modulator is connected to the first narrow-bandwidth optical-fiber filter by an optical fiber, and the first electro-optic modulator is connected to the laser by an optical fiber. The first electro-optic modulator receives an initial light from the laser, modulates the initial light by a modulation signal with a preset frequency, and generates sidebands with the preset frequency. The first narrow-bandwidth optical-fiber filter filters the optical signal at the output of the first electro-optic modulator to obtain a frequency-shifted light as the +1-order sideband. The frequency-shifted light is used for modulation to obtain a measurement and control light of the cold atom interferometer.

GLASS PROCESSING METHOD
20230219171 · 2023-07-13 · ·

A glass processing method according to a viewpoint of the present disclosure includes generating a pulse laser beam by using a laser oscillator, and irradiating alkali-free glass to be processed with the pulse laser beam. The wavelength of the pulse laser beam ranges from 248 nm to 266 nm, and the pulse laser beam has an energy ratio greater than or equal to 91% but smaller than or equal to 99% in the region from 5 ns after a pulse rises to 400 ns.

GLASS PROCESSING METHOD
20230219171 · 2023-07-13 · ·

A glass processing method according to a viewpoint of the present disclosure includes generating a pulse laser beam by using a laser oscillator, and irradiating alkali-free glass to be processed with the pulse laser beam. The wavelength of the pulse laser beam ranges from 248 nm to 266 nm, and the pulse laser beam has an energy ratio greater than or equal to 91% but smaller than or equal to 99% in the region from 5 ns after a pulse rises to 400 ns.

DIODE-PUMPED SOLID-STATE LASER APPARATUS FOR LASER ANNEALING
20250233381 · 2025-07-17 · ·

Laser annealing apparatus includes a plurality of frequency-tripled solid-state lasers, each delivering an output beam of radiation at a wavelength between 340 nm and 360 nm. Each output beam has a beam-quality factor (M.sup.2) greater of than 50 in one transverse axis and greater than 20 in another transverse axis. The output beams are combined and formed into a line-beam that is projected on a substrate being annealed. Each output beam contributes to the length of the line-beam.