H01S3/1103

LASER AMPLIFICATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

A laser amplification device includes a laser oscillator that includes a first laser active medium including a mixed gas containing carbon dioxide gas and emits pulsed laser light with the full width at half maximum of between 15 ns to 200 ns, and a laser amplifier that includes a second laser active medium including a mixed gas containing carbon dioxide gas through which the pulsed laser light emitted from the laser oscillator passes to be shortened to pulsed laser light with the full width at half maximum of between 5 ns and 30 ns to be output.

LASER SOURCE FOR AN OPHTHALMIC SURGICAL SYSTEM
20230066391 · 2023-03-02 ·

A laser source for an ophthalmic surgical system includes a femtosecond seeder, an amplifier, a femtosecond pulse portion, a nanosecond pulse portion, and one or more switches. The femtosecond seeder generates femtosecond pulses. The amplifier amplifies laser pulses, which include the femtosecond pulses and nanosecond pulses. The amplifier amplifies the laser pulses by amplifying the femtosecond pulses and generating and amplifying the nanosecond pulses. The femtosecond pulse portion alters and outputs the femtosecond pulses, and the nanosecond pulse portion alters and outputs the nanosecond pulses. The switches receive the laser pulses from the amplifier, and direct the laser pulses to the femtosecond pulse portion or the nanosecond pulse portion. In other embodiments, the laser source includes a femtosecond seeder and a nanosecond seeder that generates the nanosecond pulses.

Picosecond laser apparatus and methods for treating target tissues with same

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with the capability of switching between a modelocked pulse operating mode and an amplification operating mode. The operating modes are carried out through the application of a time-dependent bias voltage, having waveforms as described herein, to an electro-optical device positioned along the optical axis of the resonator.

SPECTRALLY PURE SHORT PULSE LASER
20170365974 · 2017-12-21 ·

A short-pulse, narrowband, line-selectable and tunable solid-state laser is described. The device requires a pump source, an active solid-state laser medium, an enclosing cavity, mirrors to contain the light, a method of removing the pulse from the cavity, a wavelength selection system, and a laser linewidth narrowing system. One implementation of this is an Er:YAG laser, side pumped by semiconductor lasers in the erbium absorption band near 1475 nm, with an intracavity etalon and a switchable spectral filter. To remove the pulse from the cavity, cavity dumping issues, which assures constant pulse energy and pulse length over a range of repetition rates, in this case from 100 Hz to 20 kHz. Line selection is obtained by use of wavelength filters and fine tuning with an etalon, which also acts as the linewidth narrowing system.

Single pulse laser apparatus

Disclosed herein is a single pulse laser apparatus that includes: a resonator having a first mirror, a second mirror, a gain medium, an electro-optic modulator (EOM) configured to perform single pulse switching, and an acousto-optic modulator (AOM) configured to perform mode-locking; a photodiode configured to measure a laser beam oscillated in the resonator; a synchronizer configured to convert an electrical signal, which is generated by measuring the laser beam, into a transistor-transistor logic (TTL) signal; a delay unit configured to set a delay time for the TTL signal to synchronize the EOM and the AOM and output a trigger TTL signal according to the delay time; an AOM driver configured to input the trigger TTL signal to the AOM that performs mode-locking and drive the AOM; and an EOM driver configured to input the trigger TTL signal to the EOM that performs single pulse switching and drive the EOM.

Picosecond laser apparatus and methods for treating target tissues with same
09780518 · 2017-10-03 · ·

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with the capability of switching between a modelocked pulse operating mode and an amplification operating mode. The operating modes are carried out through the application of a time-dependent bias voltage, having waveforms as described herein, to an electro-optical device positioned along the optical axis of the resonator.

PULSED LASER WITH INTRACAVITY FREQUENCY CONVERSION AIDED BY EXTRA-CAVITY FREQUENCY CONVERSION
20220052504 · 2022-02-17 · ·

A pulsed third-harmonic laser system includes a pulsed laser, an extra-cavity nonlinear crystal, and an intracavity nonlinear crystal. The pulsed laser generates fundamental laser pulses and couples out a portion of each fundamental laser pulse out of the laser resonator to undergo second-harmonic-generation in the extra-cavity nonlinear crystal. Resulting second-harmonic laser pulses are directed back into the laser resonator and mixes with the fundamental laser pulses in the intracavity nonlinear crystal to generate third-harmonic laser pulses. The pulsed third-harmonic laser system thus maintains a non-zero output coupling efficiency regardless of the efficiency of the second-harmonic-generation stage, while the third-harmonic-generation stage benefits from the intracavity power of the fundamental laser pulses.

RADIATION SOURCE

Passage through LINACs of electron bunches in their acceleration phase is coordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps: for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is coordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.

VERTICAL EXTERNAL-CAVITY SURFACE-EMITTING LASER
20220271500 · 2022-08-25 · ·

A vertical external-cavity surface-emitting laser includes: a resonator comprising at least two mirrors; a semiconductor laser medium disposed in the resonator; and a Q switch provided in the resonator.

LASER DEVICE

A laser device includes: a first mirror and a second mirror that cause resonance of a plurality of beams having different wavelengths from one another; a diffraction grating that causes the beams that are incident from the first mirror with directions of beam central axes being different from one another to travel to the second mirror while aligning the beam central axes with one another, and causes the beams that are incident from the second mirror with the beam central axes being aligned with one another to travel to the first mirror while causing the directions of the beam central axes to be different from one another; and a housing unit housing a laser medium that is a medium through which the beams traveling between the first mirror and the diffraction grating pass, and has a discrete gain spectrum in which a peak occurs at each wavelength of the beams.