There is provided a laminated substrate having a piezoelectric film, including: a substrate; and a piezoelectric film provided on the substrate interposing a base film, wherein the piezoelectric film has an alkali niobium oxide based perovskite structure represented by a composition formula of (K.sub.1-xNa.sub.x)NbO.sub.3 (0<x<1) and preferentially oriented in (001) plane direction, and a sound speed of the piezoelectric film is 5100 m/s or more.

There is provided a laminated substrate having a piezoelectric film, including: a substrate; and a piezoelectric film provided on the substrate interposing a base film, wherein the piezoelectric film has an alkali niobium oxide based perovskite structure represented by a composition formula of (K.sub.1-xNa.sub.x)NbO.sub.3 (0<x<1) and preferentially oriented in (001) plane direction, and a sound speed of the piezoelectric film is 5100 m/s or more.

A bulk acoustic wave (BAW) resonator comprises: a seed layer disposed over a substrate; a first electrode disposed over the seed layer; and a second electrode disposed over a piezoelectric layer. The seed layer has a thickness in the range of approximately 30 Å to approximately 150 Å.

In certain aspects, a method for reducing coupling coefficient variation includes receiving one or more measured coupling coefficients of one or more acoustic resonators, determining a coupling coefficient change based on the one or more measured coupling coefficients, and determining a change in a dimension of a lateral feature based on the determined coupling coefficient change.

An acoustic wave filter includes a substrate having voids formed therein; a first resonator disposed on one or more of the voids, and a second resonator disposed on other of the voids. A first trimming layer is provided in the first resonator, and a second trimming layer is provided in the second resonator. The second trimming layer is formed of a material having an etching rate for a given etchant different from that of the first trimming layer.

A crystal vibrator that includes a crystal substrate having a front surface and a rear surface, including a vibration portion in a region including a center of the crystal substrate, and a first peripheral portion that surrounds a periphery of the vibration portion and that has a smaller thickness than the vibration portion. Drive electrodes are formed on both surfaces of the vibration portion of the crystal substrate. In at least one of the front surface and the rear surface of the crystal substrate, a step is provided between the vibration portion and the first peripheral portion, and a first peripheral edge portion of the vibration portion and a second peripheral edge portion of the first peripheral portion are in a curved surface shape.

The invention relates to a method for controlling stress in a substrate during laser deposition. The method includes the steps of: providing a laser deposition device including a chamber with a target holder with a target, a substrate holder with a substrate facing the target and a window, the laser deposition device further including a laser beam directed through the window of the chamber onto a spot at the target for generating a plasma plume of target material and depositing the target material onto a surface portion of the substrate in order to form a thin film of target material, wherein the target spot is movable relative to the substrate in order to deposit target material onto a plurality of surface portions of the substrate; defining a plurality of discrete surface portions on the substrate; aligning the target spot one after the other with each of the plurality of discrete surface portions and generating a plasma plume to deposit target material on each of the plurality of discrete surface portions; and adjusting at least one of the parameters of the deposition process depending on the discrete surface portion with which the target spot is aligned, which parameters include temperature, pressure, laser beam pulse duration, laser beam power, distance of target to substrate.

A vibrator includes: a vibration element that includes a pair of first excitation electrodes formed at the first vibration portion, a pair of second excitation electrodes formed at the second vibration portion, and a pair of third excitation electrodes formed at the third vibration portion, in which one second excitation electrode of the pair of second excitation electrodes is formed at a first inclined surface that is inclined with respect to two main surfaces, and one third excitation electrode of the pair of third excitation electrodes is formed at a second inclined surface that is inclined with respect to the two main surfaces and the first inclined surface; and a package that houses the vibration element. The vibration element includes a fixing portion to be fixed to the package. The fixing portion is provided between the first vibration portion and the second and third vibration portions.

A method of manufacturing a composite substrate that includes bonding a silicon (Si) wafer having an interstitial oxygen concentration of 2 to 10 ppma to a piezoelectric material substrate as a support substrate, and thinning the piezoelectric material substrate after the bonding. The piezoelectric material substrate is particularly preferably a lithium tantalate wafer (LT) substrate or a lithium niobate (LN) substrate.

A micromechanical system (MEMS) acoustic wave resonator is formed on a base substrate. A piezoelectric member is mounted on the base substrate. The piezoelectric member has a first electrode covering a first surface of the piezoelectric member and a second electrode covering a second surface of the piezoelectric member opposite the first electrode, the second electrode being bounded by a perimeter edge. A first guard ring is positioned on the second electrode spaced apart from the perimeter edge of the second electrode.