A crystal unit includes a crystal element, excitation electrodes, and a container. The crystal element vibrates in a thickness-shear mode. The excitation electrodes are disposed on front and back surfaces of the crystal element. The crystal element is mounted to the container. The excitation electrodes are disposed on the crystal element. When a thickness of the crystal element is expressed as T, and a total thickness of the excitation electrodes disposed on the front and back surfaces of the crystal element is expressed as t, a ratio t/T is from 0.026 to 0.030.

An acoustic wave filter includes a substrate having voids formed therein; a first resonator disposed on one or more of the voids, and a second resonator disposed on other of the voids. A first trimming layer is provided in the first resonator, and a second trimming layer is provided in the second resonator. The second trimming layer is formed of a material having an etching rate for a given etchant different from that of the first trimming layer.

When a thick frequency adjustment metal film of a tuning fork-type vibration piece is irradiated with a beam on a wafer for frequency coarse adjustment, projections are possibly formed on a roughened end of the frequency adjustment metal film. Such projections are pressurized and pushed down not to chip off under any impact, so that the risk of frequency fluctuations is suppressed.

When a thick frequency adjustment metal film of a tuning fork-type vibration piece is irradiated with a beam on a wafer for frequency coarse adjustment, projections are possibly formed on a roughened end of the frequency adjustment metal film. Such projections are pressurized and pushed down not to chip off under any impact, so that the risk of frequency fluctuations is suppressed.

When a thick frequency adjustment metal film of a tuning fork-type vibration piece is irradiated with a beam on a wafer for frequency coarse adjustment, projections are possibly formed on a roughened end of the frequency adjustment metal film. Such projections are pressurized and pushed down not to chip off under any impact, so that the risk of frequency fluctuations is suppressed.

A method for manufacturing a Bulk Acoustic Wave (BAW) resonator module is provided. The method includes providing a substrate, defining a platform region on the surface of the substrate, disposing a BAW resonator device on the surface of the substrate within the platform region, and etching an isolation trench circumscribing at least 50% of a circumference of the platform region.

When a thick frequency adjustment metal film of a tuning fork-type vibration piece is irradiated with a beam on a wafer for frequency coarse adjustment, projections are possibly formed on a roughened end of the frequency adjustment metal film. Such projections are pressurized and pushed down not to chip off under any impact, so that the risk of frequency fluctuations is suppressed.

A frequency adjustment method is provided in which a residual substance is unlikely to be generated, the frequency can be adjusted with high precision, and a decrease in strength is made small. A frequency adjustment method for a piezoelectric vibrator includes preparing the piezoelectric vibrator having a base portion, a vibration arm that includes a connection portion connected to the base portion as well as vibration arm main bodies extending from the connection portion and that is made of a single crystal, a lower electrode formed on the vibration arm, a piezoelectric thin film formed on the lower electrode, and an upper electrode formed on the piezoelectric thin film; and forming an alteration portion by irradiating the connection portion with a laser beam.

An acoustic wave filter includes a substrate having voids formed therein; a first resonator disposed on one or more of the voids, and a second resonator disposed on other of the voids. A first trimming layer is provided in the first resonator, and a second trimming layer is provided in the second resonator. The second trimming layer is formed of a material having an etching rate for a given etchant different from that of the first trimming layer.

A method for fabricating a film bulk acoustic resonator (FBAR) filter device is provided. The method includes: forming a first electrode of each one of a first resonator and a second resonator on a first surface of a piezoelectric layer, forming a first passivation layer of each one of the first resonator and the second resonator on a corresponding one of the first electrodes, forming a second electrode of each one of the first resonator and the second resonator on a second surface of the piezoelectric layer, conducting a radio frequency (RF) performance test on the FBAR filter device, adjusting a thickness of the second electrode of the first resonator based on a result of the RF performance test, and forming a second passivation layer of each one of the first resonator and the second resonator on a corresponding one of the second electrodes.