An acoustic wave device includes an acoustic wave substrate including a first main surface and a second main surface, IDT electrodes provided on the first main surface, and sealing resin covering at least the second main surface of the acoustic wave substrate. A hollow is provided in a region where the IDT electrodes on the first main surface of the acoustic wave substrate is located. The sealing resin has through-holes each extending from a top surface 13B of the sealing resin to the second main surface of the acoustic wave substrate. The acoustic wave substrate is made of silicon or includes a layer made of silicon.

Methods for forming a film bulk acoustic resonator (FBAR) are provided. In the method, formation of several mutually overlapped and hence connected sacrificial material layers above and under a resonator sheet facilitates the removal of the sacrificial material layers. Cavities left after the removal overlap at a polygonal area with non-parallel sides. This reduces the likelihood of boundary reflections of transverse parasitic waves causing standing wave resonance in the FBAR, thereby enhancing its performance in parasitic wave crosstalk. Further, according to the disclosure, the FBAR is enabled to be integrated with CMOS circuitry and hence exhibits higher reliability.

A laterally excited bulk wave resonator includes a supporting plate; a piezoelectric base having a back side attached to the supporting plate, in which a cavity is defined on a side of the supporting plate facing toward the piezoelectric base; a lower interdigital transducer provided at a back side of the piezoelectric base and located in the cavity; and an upper interdigital transducer provided at a front side of the piezoelectric base corresponding to the lower interdigital transducer. A first interdigital electrode of the lower interdigital transducer has a same polarity as a second interdigital electrode of the upper interdigital transducer at a position corresponding to the first interdigital electrode.

An electronic component includes a mounting substrate, and first and second devices each including a functional element. The first device is spaced apart from and faces the mounting substrate. The second device is located on the mounting substrate and faces the first device. A functional element of the first device is located on a first surface facing the second device, in the first device. A functional element of the second device is located on a second surface facing the first device, in the second device.

A solidly mounted resonator having an electromagnetic shielding structure and a method for manufacturing the same. The solidly mounted resonator includes: a substrate; an acoustic-wave reflecting layer formed on the substrate; a resonance function layer formed on the acoustic-wave reflecting layer; and a metal shielding wall formed on the substrate, wherein the metal shielding wall surrounds an effective region in the acoustic-wave reflecting layer and the resonance function layer. The electromagnetic shielding structure is formed simultaneously with the resonator, and it is not necessary to provide an additional electromagnetic shielding device. An influence of an external or internal electromagnetic interference source on the resonator is avoided while ensuring a small dimension and a high performance of the resonator.

A bulk acoustic wave resonator includes: a first electrode; a piezoelectric layer disposed on at least a portion of the first electrode; and a second electrode disposed on the piezoelectric layer. The piezoelectric layer contains a dopant, and a value of [a thickness (nm) of the piezoelectric layer×a concentration (at %) of the dopant]/100 is less than or equal to 80.

A method of printing comprises providing a component source wafer comprising components, a transfer device, and a patterned substrate. The patterned substrate comprises substrate posts that extend from a surface of the patterned substrate. Components are picked up from the component source wafer by adhering the components to the transfer device. One or more of the picked-up components are printed to the patterned substrate by disposing each of the one or more picked-up components onto one of the substrate posts, thereby providing one or more printed components in a printed structure.

In an example, a system includes a BAW resonator. The system also includes a first heater configured to heat the BAW resonator, where the first heater is controlled by a first control loop. The system includes a circuit coupled to the BAW resonator. The system also includes a second heater configured to heat the circuit, where the second heater is controlled by a second control loop.

A bulk acoustic wave resonator is provided. The bulk acoustic wave resonator incudes a carrier substrate, having a main surface extending along a first direction; a piezoelectric layer, located on a side of the carrier substrate in a second direction perpendicular to the main surface of the carrier substrate; a first electrode and a second electrode; a cavity boundary structure, having a body part extending along the first direction and a protruding part protruding from the body part toward the piezoelectric layer; a resonant cavity, defined by the cavity boundary structure and the piezoelectric layer; and a periphery dielectric layer, located on a side of the protruding part of the cavity boundary structure away from the resonant cavity, a material of the periphery dielectric layer is different from a material of at least a portion of the protruding part adjacent to the periphery dielectric layer.

A semiconductor device is provided. The semiconductor device incudes: a first sub-semiconductor structure including a dielectric layer; and a second sub-semiconductor structure, at least including a carrier substrate, and being bonded to the first sub-semiconductor structure. The first sub-semiconductor structure or the second sub-semiconductor structure includes a charge accumulation preventing layer, and the charge accumulation preventing layer is disposed between the carrier substrate and the dielectric layer, and is configured to avoid an undesired conductive channel from being generated due to charge accumulation on a surface of the carrier substrate.