Acoustic resonator devices and methods are disclosed. An acoustic resonator device includes a piezoelectric plate having opposed front and back surfaces. A first electrode and a second electrode are formed on the front surface of the piezoelectric plate, the first and second electrodes and the piezoelectric plate configured such that a radio frequency signal applied between the first and second electrodes excites a shear primary acoustic mode in the piezoelectric plate. The first electrode and the second electrode have trapezoidal cross-sectional shapes. A sidewall angle of at least one side surface of the first electrode and a sidewall angle of at least one side surface of the second electrode are greater than or equal to 70 degrees and less than or equal to 110 degrees.

An RF integrated circuit device can includes a substrate and a High Electron Mobility Transistor (HEMT) device on the substrate including a ScAlN layer configured to provide a buffer layer of the HEMT device to confine formation of a 2DEG channel region of the HEMT device. An RF piezoelectric resonator device can be on the substrate including the ScAlN layer sandwiched between a top electrode and a bottom electrode of the RF piezoelectric resonator device to provide a piezoelectric resonator for the RF piezoelectric resonator device.

Aspects of this disclosure relate to bulk acoustic wave resonators. A bulk acoustic wave resonator includes a patterned mass loading layer that affects a resonant frequency of the bulk acoustic wave resonator. The patterned mass loading layer can have a duty factor in a range from 0.2 to 0.8 in a main acoustically active region of the bulk acoustic wave resonator. Related filters, acoustic wave dies, radio frequency modules, wireless communications devices, and methods are disclosed.

A laterally excited bulk acoustic wave device is disclosed. The laterally excited bulk acoustic wave device can include a first solid acoustic mirror, a second solid acoustic mirror, a piezoelectric layer that is positioned between the first solid acoustic mirror and the second solid acoustic mirror, an interdigital transducer electrode on the piezoelectric layer, and a support substrate arranged to dissipate heat associated with the bulk acoustic wave. The interdigital transducer electrode is arranged to laterally excite a bulk acoustic wave. The first solid acoustic mirror and the second solid acoustic mirror are arranged to confine acoustic energy of the bulk acoustic wave. The first solid acoustic mirror is positioned on the support substrate.

Bulk acoustic wave (BAW) resonators and particularly top electrodes with step arrangements for BAW resonators are disclosed. Top electrodes on piezoelectric layers are disclosed that include a border (BO) region with a dual-step arrangement where an inner step and an outer step are formed with increasing heights toward peripheral edges of the top electrode. Dielectric spacer layers may be provided between the outer steps and the piezoelectric layer. Passivation layers are disclosed that extend over the top electrode either to peripheral edges of the piezoelectric layer or that are inset from peripheral edges of the piezoelectric layer. Piezoelectric layers may be arranged with reduced thickness portions in areas that are uncovered by top electrodes. BAW resonators as disclosed herein are provided with high quality factors and suppression of spurious modes while also providing weakened BO modes that are shifted farther away from passbands of such BAW resonators.

The present disclosure relates to a method for fabricating a laterally excited shear mode acoustic resonator. The method includes: providing a piezoelectric layer including monocrystalline lithium niobate and/or monocrystalline lithium tantalate; forming an acoustic mirror on a first surface of the piezoelectric layer; the acoustic mirror including at least one first acoustic reflection layer and at least one second acoustic reflection layer, the first acoustic reflection layers and the second acoustic reflection layers being alternately superimposed, and acoustic impedance of each of the first acoustic reflection layers being less than that of each of the second acoustic reflection layers; bonding a bearing wafer on a first surface of the acoustic mirror; and forming an electrode unit and a lateral reflector on a second surface of the piezoelectric layer.

A MEMS (microelectromechanical system) resonator includes a first layer of single-crystalline silicon, a second layer of single-crystalline silicon, and a piezoelectric layer in between said first layer of single-crystalline silicon and the second layer of single-crystalline silicon. A manufacturing method of the MEMS resonator includes at least one of the interfaces between the single-crystalline silicon layers and the piezoelectric layer be made by wafer bonding.

Disclosed are a resonator and a manufacturing method thereof, a filter, and an electronic device. The resonator includes a substrate, a Bragg reflection layer, and a piezoelectric layer that are sequentially stacked. A first electrode is disposed on a surface that is of the piezoelectric layer and that faces the Bragg reflection layer, a second electrode is disposed on a surface that is of the piezoelectric layer and that is away from the Bragg reflection layer, a border ring is disposed on a surface that is of the second electrode and that is away from the piezoelectric layer, and the resonator has a first resonance region and a second resonance region corresponding to the border ring.

A process for fabricating a micro-electro-mechanical system, includes the following steps: production of a stack on the surface of a temporary substrate so as to produce a first assembly, comprising: at least depositing a piezoelectric material or a ferroelectric material to produce a layer of piezoelectric material or of ferroelectric material; producing a first bonding layer; production of a second assembly comprising at least producing a second bonding layer on the surface of a host substrate; production of at least one acoustic isolation structure in at least one of the two assemblies; production of at least one electrode level containing one or more electrodes in at least one of the two assemblies; bonding the two assemblies via the two bonding layers, before or after the production of the at least one electrode level in at least one of the two assemblies; removing the temporary substrate.

An acoustic wave device includes a piezoelectric layer, first and second upper electrodes, first and second lower electrodes, and first and second acoustic reflection films. In plan view, first and second resonator portions are respectively defined by portions where the first upper electrode and the first lower electrode overlap and where the second upper electrode and the second lower electrode overlap. The first and second acoustic reflection films respectively include first and second metal layers. First and second overlapping portions are respectively defined by portions where only the first upper electrode overlaps with the first metal layer and where only the second upper electrode overlaps with the second metal layer. An area of the first resonator portion is smaller than an area of the second resonator portion and an area of the first overlapping portion is larger than an area of the second overlapping portion.