A concept for reliable and simple connection of a heat-resistant end piece (17) to a hose body (18) is described, and particularly a multiple lumen hose body (18). The connection technique is simple and reliable and leads to high quality probes having a long lifetime.

The present invention provides a plasma torch which comprises: a first pipe having a first flow channel through which a liquid can flow, a first exit through which the liquid is sprayed being provided on an one end side; a second pipe body that surrounds the first pipe body, and has a second flow channel through which a gas can flow, a second exit through which the gas is sprayed being provided on the one end side; and an electrode extending into the second flow channel. The second exit is provided further to the one end side than the first exit, some of the inner peripheral surface of the second pipe decreases in diameter towards the second exit, and the diameter of the inner peripheral surface closer to the second exit than the first exit is equal to or larger than the opening diameter of the first exit.

A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.

A solution cathode glow discharge plasma-atomic emission spectrum apparatus and method capable of performing direct gas sample introduction and used for detecting a heavy metal element. The solution cathode glow discharge plasma-atomic emission spectrum apparatus comprises a high-voltage power source, a ballast resistor, a hollow metal anode and a solution cathode. The hollow metal anode is connected to a positive electrode of the high-voltage power source by means of the ballast resistor, and the solution cathode is connected to a negative electrode of the high-voltage power source by means of a graphite electrode. The plasma apparatus is further configured in such a manner that a discharge region is formed between the hollow metal anode (10) and the solution cathode, and the hollow metal anode further serves as a sample introduction pipeline, so that gas to be detected enters the discharge region and is excited.

A mixture comprising liquid water, a gas and at least one organic compound are injected into a non-thermal gas-liquid plasma discharge reactor to generate a flowing liquid film region with a gas stream flowing alongside. A plasma discharge is propagated along the flowing liquid film region. Water is dissociated and reactive species such as hydroxyl radicals, hydrogen peroxide and nitrogen oxides are formed. The organic compound reacts with the reactive species such as hydroxyl radicals and hydrogen peroxide present in the flowing liquid film region and in the flowing gas stream to produce organic compound dissociation products. At least some organic compound dissociation products and nitrogen oxides are transferred to a bioreactor for further degradation of organic compounds. The nitrogen oxides are used as nutrients for bacteria in the bioreactor. Feedback control of the plasma reactor is based on conditions detected and determined in the biological reactor.

The invention solves the problem of separation of a mixture of gases with varied molecular weights. According to the invention, the separation of a gas mixture consists in that a mixture of gases with varied molecular weights in fed into the inside of the device through slots in the inlet conduit, said slots disposed near capillary tubes having negative potential, whereas the outlet channels for the heavier molecular weight gases and those for the lower molecular weight gases are separated with a shutter with holes, said shutter being cyclically closed and opened for a period of time from 0.02 to 1.5 second. A centrifuge for the separation of gases has a cylindrical chamber, a capillary-and-blade electrode with negative potential located in the axis of the chamber and embedded on a conduit that feeds the gas mixture to the separator, an annular electrode being on the positive potential of the power source and grounded, located on the centrifuge perimeter, and is provided with two magnets, permanent or electromagnets. The electrode has capillary tubes connected to tubes and to the negative terminal of the power source. At the outlet of the electrode with the heavier gas holes is a first sliding shutter with holes and at the inlet of the light gas discharge pipeline is a baffle with holes and a second sliding shutter with holes, the first and the second shutter and being connected via a sliding mechanism to a controller.

A device for generating a plasma jet is disclosed. A nozzle of the device comprises an inner, middle and outer channel surrounding each other and electrically insulated from each other. The device is configured for flowing through the inner, middle and outer channel respectively a first ignitable gas, a monomer precursor and a second ignitable gas towards their respective exit openings. A high voltage electrode is arranged in the inner channel for generating a plasma from the first ignitable gas. The nozzle further comprises a nozzle cap enclosing a mixing volume after the exit openings of the inner, middle and outer channel. The nozzle cap is provided with an exit opening after the mixing volume, which exit opening is smaller than the exit opening of the outer channel.

A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.

A solution cathode glow discharge plasma-atomic emission spectrum apparatus and method capable of performing direct gas sample introduction and used for detecting a heavy metal element. The solution cathode glow discharge plasma-atomic emission spectrum apparatus comprises a high-voltage power source, a ballast resistor, a hollow metal anode and a solution cathode. The hollow metal anode is connected to a positive electrode of the high-voltage power source by means of the ballast resistor, and the solution cathode is connected to a negative electrode of the high-voltage power source by means of a graphite electrode. The plasma apparatus is further configured in such a manner that a discharge region is formed between the hollow metal anode (10) and the solution cathode, and the hollow metal anode further serves as a sample introduction pipeline, so that gas to be detected enters the discharge region and is excited.

A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.