A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 110.sup.5/K, and an area of at least 4 cm.sup.2.

System includes a target assembly having a production chamber. The target assembly includes an electrode and a conductive base exposed to the production chamber. The target assembly has fluidic ports that provide access to the production chamber. The system also includes a fluidic-control system having a storage vessel and fluidic lines that connect to the fluidic ports. The storage vessel and the production chamber are in flow communication through at least one of the fluidic lines. The system also includes a power source that is configured to be electrically connected to the electrode and the conductive base. The production chamber, the electrode, and the conductive base form an electrolytic cell when an electrolytic solution is disposed in the production chamber. The power source is configured to apply voltage to the electrode and the conductive base to deposit a solid target along conductive base.

An object of the present invention is to provide a graphite sheet for a beam sensor, which is excellent in yield when subjected to laser working. The present invention is a graphite sheet for a beam sensor characterized in that the graphite sheet has no eyeball-shaped convex portions on a surface of its a-b plane.

A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 m to 150 m, an area of at least 4 cm.sup.2, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25 C. of at least 300 W/mK, and has a film thickness of 10 m to 150 m, an area of at least 4 cm.sup.2, and an atomic concentration of carbon of at least 97%.

A charge stripping film for an ion beam includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25 C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of 100 nm to 10 m, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of at least 110.sup.5/K, and an area of at least 4 cm.sup.2.