A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.

A device and a method for fabricating a ceramic reinforced composite coating based on plasma remelting and injection. The device includes a plasma cladding assembly, a powder feeding assembly, a metal-based substrate, and a thermal infrared imager. The plasma cladding assembly comprises a plasma gun and a plasma generator. A plasma arc generated is used to heat the substrate and form a molten pool on the substrate. The powder feeding assembly comprises a powder feeder configured to feed ceramic particles to the molten pool through a powder feeding copper tube. The thermal infrared imager is configured to acquire an infrared image of the molten pool and acquire an optimal injection position of the ceramic particles according to the infrared image. The optimal injection position is a midpoint between a trailing edge of the plasma arc emitted on the substrate and a trailing edge of the molten pool.

Aspects of the present disclosure involve a gliding-arc type plasma reactor for use in nitrogen-based fertilizer production. The plasma reactor may include a pair of electrodes oriented in a plane within an enclosure. A pair of sheaths may attach to a corresponding electrode, with each included a strike point surface oriented to face the other sheath. The electrodes may further include an inner channel through which a cooling fluid may be pumped for heat control. A gas injection system may also be included to inject a gas into the chamber for interacting with the plasma arc and may or may not include an adjustable nozzle. The nozzle may direct air flow, including the gas, at a location at which the plasma arc may occur. The device provides for a long lifetime of components within the device and easy replacement and maintenance of the components of high-wear items.

The present inventive concept relates to a device for treating an exhaust gas, and more particularly, to a plasma device capable of, even when connected to a vacuum pump, extending a lifetime of an electrode of a plasma torch. In the plasma device according to the present inventive concept, since an orifice is installed in a connection unit for connection with a vacuum pump to prevent a decrease in pressure of the vacuum pump, a pressure of a plasma reaction unit including the plasma torch of the plasma device can be maintained similar to normal pressure, thereby reducing the wear of a tungsten electrode in the plasma torch to extend a lifetime of the electrode.

An exhaust pipe apparatus according to an embodiment includes a dielectric pipe; a radio-frequency electrode; and a plasma generation circuit. The exhaust pipe apparatus functions as a part of an exhaust pipe disposed between a process chamber and a vacuum pump that exhausts gas inside the process chamber. The radio-frequency electrode includes a thin metal plate disposed on an outer periphery side of the dielectric pipe, a buffer member disposed on an outer periphery side of the thin metal plate, and a conductive hollow structure disposed on an outer periphery side of the buffer member and a radio-frequency voltage is applied to the radio-frequency electrode. The plasma generation circuit generates plasma inside the dielectric pipe.

A high-frequency wave applicator for producing a plasma, including an inner conductor, and an outer conductor forming a coaxial structure, and a propagation medium of a high-frequency wave in a main propagation direction (x), including a passage dielectric of the wave having a sealing solid body disposed between the inner conductor and the outer conductor. Advantageously, the inner conductor has a first outer dimension d.sub.1 in a transverse direction (y), perpendicular to the main propagation direction (x), and the outer conductor has an inner dimension d.sub.2 in the transverse direction (y), such that 0.2<(d.sub.2−d.sub.1)/d.sub.2<0.55 allows improvement of the dissipation of the energy flows on the surface of the applicator.

A surface conditioning device for railway track rails and/or railway vehicle wheels includes a DC power supply, a supply of gas, a plasma delivery head connected to receive DC power from the power supply and gas from the gas supply, and an igniter for igniting the gas in the plasma delivery head. In use, plasma is generated within the delivery head by ignition of the gas in the delivery head. Plasma with gas is blown from the delivery head onto a railway track rail and/or railway vehicle wheel, thereby conditioning the rail and/or wheel.

Provided is a target transport system which is advantageous in simplifying and downsizing a configuration in production of radio-isotopes using an accelerator and in which components are hardly affected to be damaged by radiation. The target transport system includes: a transport pipeline through which a target body is transported; a target holding part that holds the target body and allows the target body to be irradiated with particle beams; and a pump, the transport pipeline, and a target entry port that transport the target body to the target holding part by a cooling water. The pump, the transport pipeline, and the target entry port cause the cooling water to flow in the transport direction, and the target body is recovered from the transport pipeline by the cooling water.

The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetization. The magnetization of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetization of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.