A method includes forming a first dielectric layer over the substrate and covering first, second, third, fourth, fifth and sixth protrusion regions; forming first, second, and third gate conductors over the first, fourth, and fifth protrusion regions, respectively; performing a first implantation process to form a second source region and a second drain region in the fourth protrusion region; performing a second implantation process to form a first source region and a first drain region in the first protrusion region, and to form a third source region and a third drain region in the fifth protrusion region; forming a metal layer over the third protrusion region; patterning the metal layer to form an inner circular electrode and an outer ring electrode encircling the inner circular electrode; forming a word line; and forming a bit line.

A fabrication method of three-dimensional programmable memory includes: 1) forming a base structure; 2) trenching the base structure; 3) setting the preset memory structure layer by layer onto the inner wall of strip trench; 4) filling the core medium in the cavity of the strip trench to form core medium layer; 5) setting the isolation trenches and isolation trench holes to isolate the left-right fingers and memory units, respectively, where the isolation trenches encroach at least one memory medium layer at the strip trench, and form a curve by connecting with the strip trenches from end to end. The isolation holes are set at the strip trenches to divide the strip into at least three independent memory bodies and encroach the medium layers of the base structure near the long sides of the strip trenches; and 6) filling the isolation trenches and holes with insulating medium.

A method of preparing a programmable diode, including: forming a tungsten plug by a standard CMOS process; taking the tungsten plug as a lower electrode and depositing a functional layer material such as a ferroelectric film on the tungsten plug; depositing an upper electrode on the functional layer material; and patterning the upper electrode and a functional layer to complete a preparation of the programmable diode. The present disclosure further discloses a ferroelectric memory of a programmable diode prepared by the method of preparing a programmable diode. The method of preparing a programmable diode does not require growing a lower electrode and reduces a complexity of the process. The ferroelectric memory includes a transistor and a programmable diode. This design stores information according to different polarities of the diode, thus a device area may be further reduced and a storage density may be improved.

A method includes forming a first dielectric layer over the substrate and covering first, second, third, fourth, fifth and sixth protrusion regions; forming first, second, and third gate conductors over the first, fourth, and fifth protrusion regions, respectively; performing a first implantation process to form a second source region and a second drain region in the fourth protrusion region; performing a second implantation process to form a first source region and a first drain region in the first protrusion region, and to form a third source region and a third drain region in the fifth protrusion region; forming a metal layer over the third protrusion region; patterning the metal layer to form an inner circular electrode and an outer ring electrode encircling the inner circular electrode; forming a word line; and forming a bit line.

Provided are a semiconductor device and a method of fabricating the same.

The semiconductor device includes a semiconductor substrate, a first and a second diffusion region formed under a surface of the semiconductor substrate, a gate and a sidewall spacer stacked on the semiconductor substrate, wherein the first diffusion region is at least one active region not being intersected by the gate and the sidewall spacer, wherein the second diffusion region includes a part of an active region intersecting the gate and the sidewall space, wherein there is no gate insulating layer between the gate and the semiconductor substrate.

The present disclosure provides a high-density three-dimensional multilayer memory and a preparation method. The preparation method of the memory comprises the following steps: firstly forming a basic structure body; secondly, slotting the basic structure body; thirdly, forming a preset number of memory cell holes in the a segmentation groove, an insulating medium being arranged between every two adjacent memory cell holes, a vertical electrode being arranged in the memory cell hole, and a memory medium layer being arranged between the vertical electrode and an interdigital structure; and in the third step, before the memory medium is arranged, the preparation method comprises the following steps: performing doping diffusion on the first conducting medium located on the inner wall of the segmentation groove, so that the first conducting medium close to the inner wall of the segmentation groove forms a buffer area made of a low-doped semiconductor material.

A design of a non-transistor memory core with corresponding shift register control logic may be all comprised of tunnel diodes and capacitors, and a method for fabricating such memories and control logic may use a stencil and non-lithographic self-aligning semiconductor processing steps to minimize cost. Designs and fabrication processes for I/O pads connected to the memory core and control logic are also presented.

A memory cell is formed by a PIN diode having three contacts. A breakdown voltage is applied to break down a gate oxide arranged between a region of the PIN diode and a substrate region. The breakdown or non-breakdown state of the gate oxide is determined by applying a read voltage between the anode and the cathode of the diode and determining the value of the corresponding current flowing in the diode.

Disclosed is a stateful logic-in-memory using silicon diodes. More particularly, the stateful logic-in-memory according to an embodiment of the present invention includes a plurality of silicon diodes, each of the silicon diodes includes an anode region, a first channel region, a second channel region and a cathode region and is included as a memory cell.

A semiconductor device including a substrate; a substrate; a memory array disposed on the substrate, the memory array including one or more memory planes, and a plurality of source region contact (SRC) nodes that are disposed on a backside surface of corresponding one of the one or more memory planes and above the substrate; a plurality of high-voltage (HV) diodes that are disposed in the substrate and that are connected to corresponding SRC nodes, the HV diodes including a first type dopant material; and a plurality of highly doped regions that are disposed in the substrate and that include a second type dopant material, each of the plurality of highly doped regions including a plurality of local maximum doping regions that are vertically aligned under a frontside surface of the substrate.