A 3-dimensional array of NOR memory strings being organized by planes of NOR memory strings, in which (i) the storage transistors in the NOR memory strings situated in a first group of planes are configured to be programmed, erased, program-inhibited or read in parallel, and (ii) the storage transistors in NOR memory strings situated within a second group of planes are configured for storing resource management data relating to data stored in the storage transistors of the NOR memory strings situated within the first group of planes, wherein the storage transistors in NOR memory strings in the second group of planes are configured into sets.

A method for fabricating memory device includes the steps of: providing a substrate; forming a tunnel oxide layer on the substrate; forming a first gate layer on the tunnel oxide layer; forming a negative capacitance (NC) insulating layer on the first gate layer; and forming a second gate layer on the NC insulating layer. Preferably, the second gate layer further includes a work function metal layer on the NC insulating layer and a low resistance metal layer on the work function metal layer.

A switch circuit package module includes a semiconductor switch unit and a capacitor unit. The semiconductor switch unit includes a first semiconductor switch element and a second semiconductor switch element. The first semiconductor switch element includes sub micro-switch elements, each sub micro-switch element configured with a drain electrode and a source electrode. The second semiconductor switch element includes sub micro-switch elements, each sub micro-switch element configured with a drain electrode and a source electrode. The capacitor unit includes a plurality of capacitors. The semiconductor switch unit includes a plurality of common electrodes, each common electrode connects the source electrode of one sub micro-switch element in the first semiconductor switch element with the drain of one sub micro-switch element in the second semiconductor switch element and is disposed adjacent to at least one drain electrode from the first semiconductor switch element or one source electrode from the second semiconductor switch element.

A switch circuit package module includes a semiconductor switch unit and a capacitor unit. The semiconductor switch unit includes a first semiconductor switch element and a second semiconductor switch element. The first semiconductor switch element includes sub micro-switch elements, each sub micro-switch element configured with a drain electrode and a source electrode. The second semiconductor switch element includes sub micro-switch elements, each sub micro-switch element configured with a drain electrode and a source electrode. The capacitor unit includes a plurality of capacitors. The semiconductor switch unit includes a plurality of common electrodes, each common electrode connects the source electrode of one sub micro-switch element in the first semiconductor switch element with the drain of one sub micro-switch element in the second semiconductor switch element and is disposed adjacent to at least one drain electrode from the first semiconductor switch element or one source electrode from the second semiconductor switch element.

The disclosure provides for electrochemical supercapacitors with high energy densities, based on paired groups of carbon nanotube mounted to conductive substrates. In one variation, the electrochemical supercapacitors are double layer capacitors, or electrochemical double layer capacitors, containing opposing groups of carbon nanotubes on opposing substrates. In another variation, the capacitor is an interdigitated capacitor of alternating electrode containing carbon nanotubes, mounted on a common substrate. Processes and devices are also described.

A semiconductor structure and a method of fabricating thereof are provided. The method includes following steps. A substrate with an upper surface and a lower surface is received. A first recess extending from the upper surface to the lower surface is formed and the first recess has a first depth. A second recess extending from the upper surface to the lower surface is formed and the second recess has a second depth less than the first depth. A first conducting layer is formed in the first recess and the second recess. A first insulating layer is formed over the first conducting layer. A second conducting layer is formed over the first insulating layer and isolated from the first conducting layer with the first insulating layer. The substrate is thinned from the lower surface to expose the second conducting layer in the first recess.

A semiconductor apparatus (10) includes: a layered structure (100) that includes double junction structures that have a first junction (151, 153) where a wide-bandgap layer (102, 104) and a narrow-bandgap layer (101, 103, 105) are layered on each other and a second junction (152, 154) where a narrow-bandgap layer (101, 103, 105) and a wide-bandgap layer (102, 104) are layered on each other, and electrode semiconductor layers (110, 120) are joined to each layer of the layered structure. Each double junction structure includes a pair of a first region (131, 133) that has negative fixed charge and a second region (132, 134) that has positive fixed charge. The first region is closer to the first junction than to a center of the wide-bandgap layer. The second region is closer to the second junction than to the center of the wide-bandgap layer. A 2DEG or a 2DHG is formed at each junction. The semiconductor apparatus functions as an electric energy storage device such as a capacitor.

A method for fabricating a semiconductor device includes forming a plurality of semiconductor structures over a substrate, forming an interlayer dielectric layer over the semiconductor structures, etching the interlayer dielectric layer, and defining open parts between the semiconductor structures to expose a surface of the substrate, forming sacrificial spacers on sidewalls of the open parts, forming conductive layer patterns in the open parts, and causing the conductive layer patterns and the sacrificial spacers to reach each other, and defining air gaps on the sidewalls of the open parts.

Multi-gate NOR flash thin-film transistor (TFT) string arrays are organized as three dimensional stacks of active strips. Each active strip includes a shared source sublayer and a shared drain sublayer that is connected to substrate circuits. Data storage in the active strip is provided by charge-storage elements between the active strip and a multiplicity of control gates provided by adjacent local word-lines. The parasitic capacitance of each active strip is used to eliminate hard-wire ground connection to the shared source making it a semi-floating, or virtual source. Pre-charge voltages temporarily supplied from the substrate through a single port per active strip provide the appropriate voltages on the source and drain required during read, program, program-inhibit and erase operations. TFTs on multiple active strips can be pre-charged separately and then read, programmed or erased together in a massively parallel operation.

Semiconductor devices are described that include a capacitor integrated therein. In an implementation, the semiconductor devices include a substrate. The substrate includes multiple capacitor regions, such as a first capacitor region and a second capacitor region that are adjacent to one another. Each capacitor region includes trenches that are formed within the substrate. A metal-insulator-metal capacitor is formed within the trenches and at least partially over the substrate. The trenches disposed within the first capacitor region are at least substantially perpendicular to the trenches disposed within the second capacitor region.