An array substrate includes gate lines extending in a first direction and being portions of a gate metal film, source lines extending in a second direction and being portions of a source metal film, and first and second TFTs arranged alternately in the first direction. The first TFTs include first semiconductor portions that are portions of a first semiconductor film, first gate electrodes that are portions of the gate metal film, and first source electrodes and first drain electrodes that are portions of the source metal film. The second TFTs include second semiconductor portions that are portions of a second semiconductor film above the first semiconductor film via an insulating film, second gate electrodes that are portions of the gate metal film, and second source electrodes and second drain electrodes that are portions of the source metal film. The first and second semiconductor portions are alternately arranged.

An array substrate includes a substrate, a semiconductor layer over the substrate, a gate over a side of the semiconductor layer away from the substrate, and a source and a drain on sides of the gate. The semiconductor layer includes a channel region, a first doping region, and a first ohmic contact region, which are sequentially connected. A shielding layer is between the substrate and the semiconductor layer. The shielding layer is connected to a fixed potential, and the shielding layer at least partially overlaps with the first doping region in a direction perpendicular to a plane of the substrate.

A display device with a high aperture ratio is provided. A step caused by a contact hole (50) for electrically connecting a wiring (33) and a pixel electrode (41) to each other is eliminated by being filled with an organic insulating layer (52), and a top surface of the pixel electrode is made flat to form an alignment film (45a) so that an alignment defect of a liquid crystal layer (40) is reduced. In addition, a light-transmitting material is used for the wiring (33) exposed to a bottom portion of the contact hole (50). Accordingly, an effective display region of a liquid crystal device can be increased. That is, the display device can have a high aperture ratio.

Provided are a display panel and a display device. The display panel includes a base substrate; a first transistor including a first active layer including silicon, a first gate, a first source and a first drain; a second transistor including a second active layer including an oxide semiconductor, a second gate located on a side of the second active layer facing away from the base substrate, a second source and a second drain; a first insulating layer including an inorganic material; and a planarization layer including an organic material. The first insulating layer includes a first insulating sublayer and a second insulating sublayer. The second insulating sublayer is located on a side of the first insulating sublayer facing away from the base substrate, and a compactness of the second insulating sublayer is greater than a compactness of the first insulating sublayer.

An array substrate includes a thin film transistor including a drain electrode, a first insulation film included in an upper layer than the drain electrode and including a contact hole overlapping the drain electrode, a pixel electrode included in an upper layer than the first insulation film and overlaps the drain electrode at least inside the contact hole and is connected to the drain electrode, a second insulation film included in an upper layer than the pixel electrode and overlaps the pixel electrode inside the contact hole and extends outside the contact hole, a conductive portion included in an upper layer than the second insulation film and overlaps the pixel electrode at least inside the contact hole, and an insulation portion included in an upper layer than the pixel electrode and in a lower layer than the conductive portion and overlaps the pixel electrode inside the contact hole.

A display substrate, a method for manufacturing a display substrate and a display device are provided, and the display substrate includes: a base having a first surface, a second surface and a side surface, the base includes a display area and an epitaxial area; a driving functional layer in the display area and first binding electrodes in the epitaxial area on the first surface, the first binding electrodes are coupled with the driving functional layer; second binding electrodes located on the second surface and coupled with the first binding electrodes through side wirings; a portion of each side wiring is located on the side surface; a blocking wall on the first surface and in the epitaxial area, an orthographic projection of the blocking wall on the base at least passes through spacing regions between every two adjacent first binding electrodes along an arrangement direction of the first binding electrodes.

A flexible electroluminescent display apparatus can include a flexible substrate including an active area and a bending area extending from the active area; a thin film transistor disposed on the active area and including a semiconductor layer, a gate electrode, a source electrode and a drain electrode; an planarization layer disposed on the thin film transistor; a light emitting element disposed on the planarization layer in the active area and connected to the thin film transistor through a connection electrode; and a first wiring line and a second wiring line disposed in the bending area, in which the first wiring line, the source electrode and the drain electrode are configured as a same layer, and the second wiring line and the connection electrode are configured as a same layer, and the first wiring line and the second wiring line are directly connected to each other.

The present disclosure provides a displaying backplane and a displaying device, and relates to the technical field of displaying. The displaying backplane includes: a substrate base plate; a first active layer and a second active layer that are provided on the substrate base plate, wherein the material of the first active layer and the second active layer is an oxide semiconductor, the first active layer has a first channel region and first no-channel regions, and the second active layer has a second channel region and second no-channel regions; a first grid insulating layer covering the first active layer and the second active layer; and a first grid and a second grid that are provided on the first grid insulating layer; wherein the oxygen-vacancy concentration of the first channel region is greater than the oxygen-vacancy concentrations of the first no-channel regions, the second no-channel regions and the second channel region.

Provided are a display panel and a display device. The display panel includes a base substrate; a first transistor, a second transistor and a third transistor, where the first transistor, the second transistor and the third transistor are formed on the base substrate, the first transistor includes a first active layer, a first gate, a first source, and a first drain, the first active layer contains silicon, the second transistor includes a second active layer, a second gate, a second source, and a second drain, and the second active layer contains an oxide semiconductor; and a first insulating layer and a second insulating layer, where the first insulating layer is disposed on one side of the second active layer facing away from the base substrate and between the second gate and the second active layer.

An array substrate, a manufacturing method thereof, and a liquid crystal display panel are provided. The array substrate includes a substrate, a transparent oxide electrode, an interface protection layer, and a first insulating layer. The transparent oxide electrode is disposed on a side of the substrate. The interface protection layer is disposed on a side of the transparent oxide electrode away from the substrate. The first insulating layer is disposed on the interface protection layer.