Providing a resistor between a gate of a target device (e.g., a gallium nitride (GaN) high-electron-mobility transistor device) and a clamp circuit improves electrostatic discharge (ESD) protection between an input/output (IO) and the target device. For example, the resistor may result in ESD protection between the IO and a source of the target device and between the IO and a drain of the target device may be at least 2 kilovolts under the human body model. Because ESD protection is improved, chances of burn out in the target device are reduced. Additionally, larger currents may be applied in the clamp circuit without risk of ESD.

A mother substrate for a display panel and a display panel using the same are disclosed. The mother substrate comprises a plurality of display area including a plurality of light-emitting areas configured to receive light-emitting elements, a plurality of wirings, and a plurality of pads connected to the plurality of wirings; a conductive ring in a non-display area that surrounds the display area such that each of the display areas is surrounded by the conductive ring and electrically connected to the pads; a photoresist pattern covering the plurality of display areas and the non-display area; and a first metal layer covering the photoresist pattern. The conductive ring includes an electrostatic blocking area.

A display substrate and a manufacturing method thereof, and a display apparatus, in the display substrate, the substrate includes a bendable part at an edge of the non-display region away from the display region; the display substrate has a first side and a second side, the extension part is connected with the bendable part and is bent to the second side of the display substrate through the bendable part; at least a part of the first insulation layer is located in the extension part and the first insulation layer includes an opening; the electrically conductive structure is located in the extension part and includes a lower part and an upper part; the opening exposes the lower part; the upper part is on a side of the lower part away from the substrate, located in the opening and is in direct contact with the lower part.

An active via is taught which comprises at least one via and at least one transistor which acts as a switch element. The resulting active via can be used with 1D, 2.5D or 3D chips to: control circuit elements; reduce EMI between vias; increase the density of vias; improve power and thermal efficiencies of chips; simplify power, data and other routing networks on chips; enable a higher level stacking of dies or layers in a chip while maintaining modularity; etc. A control strategy system can be provided to remove the supply of power to one or more regions of the chip when the regions are not in use and to supply power to those regions when the regions are in use, or to control input and output to regions of the chip. The active vias can be fabricated with Back or Front End Of Line processes.

A semiconductor device includes a substrate. The semiconductor device further includes a doped well in the substrate, wherein the doped well comprises a first concentration of dopants of a first type in the substrate. The semiconductor device further includes a doped region in the substrate, wherein the doped region comprises a second concentration of the dopants of the first type, the doped region extends around the doped well, and the doped region is electrically insulated from the doped well. The semiconductor device further includes an active area, and wherein the active area comprises an emitter region and a collector region, wherein the emitter region is electrically connected to the doped region. The semiconductor device further includes a deep trench isolation (DTI) structure extending through the active area and between the emitter region and the collector region.

An integrated circuit includes two N wells from two different devices in close proximity to each other with each N well biased by two different terminals. The N wells are at least partially surrounded by P type regions that are biased by a terminal. The integrated circuit includes conductivity reduction features that increase the resistivity of current paths to a P type regions of one device on a side closest the other device. The integrated circuit includes two conductive tie biasing structures each located directly over an N type region of the substrate and directly over a P type region of the substrate. The two conductive tie biasing structures are not electrically connected to each other and are not electrically coupled to each other by a conductive biasing structure.

An integrated circuit includes two N wells from two different devices in close proximity to each other with each N well biased by two different terminals. The N wells are at least partially surrounded by P type regions that are biased by a terminal. The integrated circuit includes conductivity reduction features that increase the resistivity of current paths to a P type regions of one device on a side closest the other device. The integrated circuit includes two conductive tie biasing structures each located directly over an N type region of the substrate and directly over a P type region of the substrate. The two conductive tie biasing structures are not electrically connected to each other and are not electrically coupled to each other by a conductive biasing structure.

An ESD cell includes an n+ buried layer (NBL) within a p-epi layer on a substrate. An outer deep trench isolation ring (outer DT ring) includes dielectric sidewalls having a deep n-type diffusion (DEEPN diffusion) ring (DEEPN ring) contacting the dielectric sidewall extending downward to the NBL. The DEEPN ring defines an enclosed p-epi region. A plurality of inner DT structures are within the enclosed p-epi region having dielectric sidewalls and DEEPN diffusions contacting the dielectric sidewalls extending downward from the topside surface to the NBL. The inner DT structures have a sufficiently small spacing with one another so that adjacent DEEPN diffusion regions overlap to form continuous wall of n-type material extending from a first side to a second side of the outer DT ring dividing the enclosed p-epi region into a first and second p-epi region. The first and second p-epi region are connected by the NBL.

An integrated circuit includes a first semiconductor device with an N type region biased by a first terminal and a second semiconductor device with a second region. An N type guard region is located laterally between the N type region of the first semiconductor device and the second region. A P type region is isolated in the N type guard region and is biased by a second terminal. The N type guard region is either electrically coupled to the second terminal through a resistor circuit or is characterized as floating.

Embodiments of the disclosure provide an integrated circuit (IC) structure with a diode over a lateral bipolar transistor. A structure according to the disclosure may include a lateral bipolar transistor within a monocrystalline semiconductor over a substrate. An insulator layer is over a portion of the monocrystalline semiconductor. A diode is within a polycrystalline semiconductor on the insulator layer. A cathode of the diode is coupled to a first well within the monocrystalline semiconductor. The first well defines one of an emitter terminal and a collector terminal of the lateral bipolar transistor.