Patent classifications
Y
Y10
Y10S
257/00
Y10S257/907
Y10S257/907
Method of forming semiconductor device including protrusion type isolation layer
A semiconductor device may include a semiconductor layer having a convex portion and a concave portion surrounding the convex portion. The semiconductor device may further include a protrusion type isolation layer filling the concave portion and extending upward so that an uppermost surface of the isolation layer is a at level higher that an uppermost surface of the convex portion.