Method and system for measurement of ultra-high laser intensity

Abstract

A method and a system for measurement of high laser field intensity, the method comprising tight focusing a non-Gaussian azimuthally polarized laser mode beam to a focusing spot, measuring a spectral line shape of a selected ionization state induced by a longitudinal oscillating magnetic field created by the tight focusing in the focusing spot; and determining the laser intensity from the spectral line shape. The system comprises a laser source of a peak power in a range between 100 terawatt and 10 petawatt; a converter unit; a tight focusing optics; and spectral measurement means; wherein the converter unit polarizes a main laser beam from the laser source into a non-Gaussian azimuthally polarized laser mode beam; the tight focusing optics focuses the azimuthally polarized laser mode beam to a focusing spot, yielding a longitudinal oscillating magnetic field of an intensity proportional to the laser intensity, the spectral measurement means measuring a line shape of a selected ionization state induced by the longitudinal oscillating magnetic field in focusing spot.

Claims

1. A method for measurement of high laser field intensity, comprising tight focusing a non-Gaussian azimuthally polarized laser mode beam to a focusing spot, measuring a spectral line shape of a selected ionization state induced by a longitudinal oscillating magnetic field created by said tight focusing in the focusing spot; and determining the laser intensity from the spectral line shape.

2. The method of claim 1, comprising selecting a high peak power laser source; polarizing a main laser beam into an azimuthally polarized TE.sub.01 mode; focusing the azimuthally polarized TE.sub.01 mode in the focusing spot having a size in a range between about 400 nm and about 2 μm with an intensity comprised in a range between about 10.sup.22 W/cm.sup.2 and 10.sup.23 W/cm.sup.2.

3. The method of claim 1, comprising selecting a laser source laser source of a peak power in a range between 100 terawatt and 10 petawatt; selecting a high numerical aperture optics; polarizing a main laser beam into an azimuthally polarized TE.sub.01 mode; focusing the azimuthally polarized TE.sub.01 mode in the focusing spot with an intensity comprised in a range between 10.sup.22 W/cm.sup.2 and 10.sup.23 W/cm.sup.2.

4. The method of claim 1, wherein the laser intensity is in a range between 10.sup.21W/cm.sup.2 and 10.sup.23 W/cm.sup.2 and the longitudinal oscillating magnetic field has an intensity in a range between 10kT and 500kT.

5. The method of claim 1, comprising focusing an auxiliary beam derived from a main laser beam on a thin foil target located at the focal plane of the non-Gaussian azimuthally polarized laser mode beam.

6. The method of claim 1, comprising focusing an auxiliary beam derived from a main laser beam on a foil target of a thickness in a range between about 10 mm and about 50 mm located at the focal plane of the non-Gaussian azimuthally polarized laser mode beam.

7. The method of claim 1, comprising focusing an auxiliary beam derived from a main laser beam on a thin foil target located at the focal plane of the non-Gaussian azimuthally polarized laser mode beam, thereby yielding a plasma localized in a thickness in a range between 300 nm and 1 μm from either side of the focal plane of the non-Gaussian azimuthally polarized laser mode beam and of a density less than the critical density n.sub.c.

8. The method of claim 1, comprising focusing an auxiliary beam derived from a main laser beam on a thin foil target located at the focal plane of the non-Gaussian azimuthally polarized laser mode beam, thereby yielding a plasma localized in a thickness in a range between 300 nm and 1 μm from either side of the focal plane of the non-Gaussian azimuthally polarized laser mode beam and of a density in a range between n.sub.c/10 and n.sub.c, where n.sub.c, is the critical density.

9. A system for measurement of high laser field intensity, comprising: a laser source of a peak power in a range between 100 terawatt and 10 petawatt; a converter unit; a tight focusing optics; and spectral measurement means; wherein said converter unit polarizes a main laser beam from the laser source into a non-Gaussian azimuthally polarized laser mode beam; said tight focusing optics focuses the azimuthally polarized laser mode beam to a focusing spot, yielding a longitudinal oscillating magnetic field of an intensity proportional to the laser intensity, said spectral measurement means measuring a line shape of a selected ionization state induced by the longitudinal oscillating magnetic field in focusing spot.

10. The system of claim 9, wherein the azimuthally polarized laser mode beam is a laser pulse of energy in a range between 1J and 1 kJ.

11. The system of claim 9, wherein the tight focusing optics is a high numerical aperture reflective optics.

12. The system of claim 9, wherein the tight focusing optics has a numerical aperture in a range between 0.7 and 1.

13. The system of claim 9, wherein the tight focusing optics is a combination of a parabolic mirror and an ellipsoid plasma mirror of a numerical aperture in a range between 0.7 and 1.

14. The system of claim 9, wherein the focal point of the tight focusing optics has an intensity comprised in a range between 10.sup.22 W/cm.sup.2 and 10.sup.23 W/cm.sup.2.

15. The system of claim 9, wherein the laser intensity is in a range between 10.sup.21 W/cm.sup.2 and 10.sup.23 W/cm.sup.2.

16. The system of claim 9, wherein the longitudinal oscillating magnetic field has an intensity in a range between 10kT and 500kT.

17. The system of claim 9, further comprising auxiliary focusing optics and a thin foil target located at the focal plane of the azimuthally polarized laser mode beam, said auxiliary focusing optics focusing an auxiliary beam derived from the main laser beam, of a pulse in a range between 10fs and 30fs, synchronized with the main laser beam, to the thin foil target.

18. The system of claim 9, further comprising an auxiliary focusing optics and a foil target located at the focal plane of the azimuthally polarized laser mode beam, said auxiliary focusing optics focusing an auxiliary beam derived from the main laser beam, of a pulse in a range between 10fs and 30fs, synchronized with the main laser beam, to the foil target; wherein the auxiliary focusing optics is an off-axis parabola.

19. The system of claim 9, further comprising an auxiliary focusing optics and a foil target located at the focal plane of the azimuthally polarized TE.sub.01 mode, said auxiliary focusing optics focusing an auxiliary beam derived from the main laser beam, of a pulse in a range between 10fs and 30fs, synchronized with the main laser beam, to the foil target; wherein the foil target has a thickness in a range between 10 mm and 50 mm.

20. A method for measuring ultra-high laser intensity, comprising generating a longitudinal oscillating magnetic field of an intensity proportional to the laser intensity in a focusing point of highest intensity by tight focusing a non-Gaussian azimuthally polarized laser mode beam, measuring a line shape of a selected ionization state induced by the longitudinal oscillating magnetic field in the focusing spot, and determining the laser intensity from the spectral line shape.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) In the appended drawings:

(2) FIG. 1 is a schematic view of a system according to an embodiment of an aspect of the present disclosure;

(3) FIG. 2 is a schematic view of interaction of a 5TE.sub.01 beam with a gas target at the focusing focal point;

(4) FIG. 3 is a schematic view of interaction of an auxilliary beam with a thin foil target positioned in the focal plane of the TE.sub.01 beam, before arrival of the TE.sub.01 beam;

(5) FIG. 4 is a schematic view of a heat-generated gas target due to the interaction between the auxilliary beam with the thin foil target; and

(6) FIG. 5 is a schematic view of interaction of the TE.sub.01 beam with the gas target of FIG. 4.

DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

(7) The present invention is illustrated in further details by the following non-limiting examples.

(8) In a nutshell, the method comprises tight focusing a non-Gaussian TE.sub.01 mode (azimuthally polarized) and measuring the spectral line shape of a selected ionization state in the highest intensity spot. The method comprises simultaneous localization of a physical process in the highest intensity area, thereby yielding high specificity of measurables, such as photons or particles, generated by the physical process inside a very small spot where the highest intensity is achieved.

(9) FIG. 1 illustrates a system according to an embodiment of an aspect of the present disclosure. The illustrated system comprises a high peak power laser source 1 and a tight focusing optics 7, an optical compressor 2, mirrors 4, and a polarization converter unit 5 such as a beam shaper. The laser source 1 has a peak power in a range between about 100 terawatt and about 10 petawatt (PW). The tight focusing optics 7 is a high numerical aperture (HNA) reflective optics such as an on-axis parabola having a numerical aperture close to 1, in a range between about 0.7 and 1, or a combination of a parabolic mirror and an ellipsoid plasma mirror for example. A high energy laser pulse, in a range between about 1 J and about 1 kJ is thus tight-focused to a spot having a size in the range of the laser wavelength, in a range between about 400 nm and about 2 μm.

(10) The main laser beam 3 is first polarized into an azimuthally polarized TE.sub.01 mode 6 by the beam shaper 5. The azimuthally polarized TE.sub.01 mode 6 is then focused by the tight focusing optics 7 in the spot of highest energy, and thus intensity, with an intensity comprised in a range between about 10.sup.22 W/cm.sup.2 and about 10.sup.23 W/cm.sup.2, thereby creating in the focal plane 8 a very intense longitudinal oscillating magnetic field 12, proportional to the laser intensity which is in a range between about 10.sup.21 W/cm.sup.2 and about 10.sup.23 W/cm.sup.2. Thus, the longitudinal oscillating magnetic field 12 is very intense, in a range between about 10 kT and about 500 kT, depending on parameters such as the laser wavelength, the laser energy and the pulse duration (see FIG. 2).

(11) In turn, this strong oscillating magnetic field 12 produces a strong Zeeman effect in the region of highest intensity 8 [2,3]. The method comprises measuring the line shape induced by the oscillating magnetic field in the gas target in this region, using a high-resolution spectrometer for example (not shown in FIG. 1), and determining the laser intensity from the measurement of the different polarization components inside the line shape, the separation between these components being directly related to the longitudinal magnetic field strength and thus to the laser intensity.

(12) Even in presence of a large ionization volume due to spatial intensity distribution and with rise-time longer than the full width at half maximum (FWHM) of the pulse, the longitudinal magnetic field and its related measurable Zeeman effect are localized and exist only at the point and the time of the highest intensity. Other magnetic fields, such as static magnetic fields, may be generated during laser-matter interaction in various part of the plasma: for example, a toroidal magnetic field may be created by cross density and temperature gradient; and/or an axial magnetic field may be generated by dynamo effects [4]. However, the magnitude of such magnetic fields remains very low compared to the magnetic field of the longitudinal field created by tight focusing the TE.sub.01 mode as described hereinabove, and their field effects have lower magnitude. Thus, the measurement of the line shape induced by the oscillating magnetic field created by tight focusing the TE.sub.01 mode is a signature of the area of highest volume and a very high sensibility to the laser intensity variation since the spectrum changes as a function of the laser intensity.

(13) In an embodiment according to the present disclosure, the method further comprises precise localization of the ionization volume, by selecting and combining a PW laser with HNA focusing optics and a TE.sub.01 laser beam to produce a strong longitudinal magnetic field. The measurement of the Zeeman effect in the focal spat of the HNA optics is then used to obtain the laser intensity. Indeed, even if the Zeeman effect is localized to the highest field region, the propagation of the laser beam before reaching the focal plane may be affected by a large ionization volume inducing some undesirable non-linear effects and beam distortion in the highest field region. Thus in addition to the localization of the Zeeman effect, the method comprises localization of the ionization volume, thereby improving the signature of the beam intensity in the focal plane, i. e. in the highest intensity region.

(14) As shown in FIG. 1, a short-pulse auxiliary beam 9, of a pulse in a range between about 10 fs and about 30 fs, perfectly synchronized with the main laser beam 3, is derived from the main laser beam 3 before polarization shaping of the main laser beam 3. The auxiliary beam 9 is focused with an intensity in a range between about 10.sup.14 W/cm.sup.2 and 10.sup.15 W/cm.sup.2 on a thin foil target 13 precisely located at the focal plane 8 of the TE.sub.01 beam 6, by auxiliary focusing optics 10. The auxiliary focusing optics 10 may be an off-axis parabola for example. The thin foil target 13 has a thickness in a range between about 10 mm and about 50 mm; it may be a solid density 30 nm-thick CH foil for example. Other materials, with higher atomic number, may be considered for the thin foil target 13.

(15) As a result, a warm dense plasma having a temperature in a range between about 30 eV and about 60 eV is generated exactly in the focal plane 8 of the TE.sub.01 beam 6. This plasma then decompresses into a very localized, low density plasma. Decompression of the plasma occurs slowly, at a rate in a range between about 10.sup.6 cm/s and about 10.sup.7 cm/s (i.e. in a range between about 10 nm/picosecond and about 100 nm/picosecond) giving way, after a delay in a range between about 5 ps and about 20 ps, to a plasma, localized in a thickness in a range between about 300 nm and about 1 μm from either side of the plane 8 of the TE.sub.01 beam. This localized resulting plasma is a low density plasma. i. e. less than the critical density n.sub.c (FIG. 4), in a range from n.sub.c/10 to n.sub.c. The TE.sub.01 beam 6 can thus propagate without distortion and induce the Zeeman effect. In FIGS. 2 and 5, the arrow indicates the axis and position of the magnetic field. FIG. 3 shows interaction of the auxilliary beam 9 with the thin foil target 13 positioned in the focal plane 8 of the TE.sub.01 beam, after the plasma decompression delay before arrival of the TE.sub.01 beam, and FIG. 4 is a schematic view of the heat-generated gas target 14 resulting from this interaction.

(16) In preliminary experiments in the 10.sup.19-10.sup.22 W/cm.sup.2 intensity range, TM.sub.01 (radial polarization) and TE.sub.01 (azimuthal polarization) modes produced with a 200 TW system (2 J, 30 fs pulse, 8 cm diameter beam) were successfully used with high numerical aperture (HNA) (0.7-1) on-axis parabola and gas targets. During the laser-target interaction, the atomic physics, typically ionization dynamics and equilibrium, of the very hot dense plasmas produced in regimes where very high electric and magnetic oscillating fields are key parameters, were characterized with high resolution X-ray spectroscopy, including time-resolved X-ray absorption spectroscopy. Spectral line shapes emitted by plasmas at intensities below 10.sup.19 W/cm.sup.2 were analyzed.

(17) As people in the art will appreciate, laser intensity measurements at high intensity are thus obtained with high specificity. The present method and system may be used with very intense laser pulse having spatial and temporal effects, such as radial intensity distribution in the focal plane due to the spatial pulse shape and long rise time due to the limits of the chirped pulse amplification (CPA) recompression method at the fundamental frequency, or of other amplification, frequency conversion and compression methods such as optical parametric chirped pulse amplification (OPCPA) and post-pulse compression methods.

(18) The scope of the claims should not be limited by the embodiments set forth in the examples, but should be given the broadest interpretation consistent with the description as a whole.

REFERENCES

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