Method for Avoiding the Microbial Attack of a Cleaning Apparatus for a Metering Unit, and Cleaning Apparatus
20220184257 · 2022-06-16
Inventors
- Ingo Hörsting (Drensteinfurt, DE)
- Dietmar Erber (Münster, DE)
- Rainer Storb (Nottuln, DE)
- Sven Fels (Münster, DE)
Cpc classification
B01F33/841
PERFORMING OPERATIONS; TRANSPORTING
B01F35/146
PERFORMING OPERATIONS; TRANSPORTING
B01F35/121
PERFORMING OPERATIONS; TRANSPORTING
B01F2101/30
PERFORMING OPERATIONS; TRANSPORTING
International classification
B01F33/841
PERFORMING OPERATIONS; TRANSPORTING
B08B1/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
What is presented and described is a method for avoiding the microbial attack of a cleaning apparatus (X2), in particular a cleaning apparatus (X2) for a metering system, wherein the cleaning apparatus (X2) has at least one mechanical cleaning element (X29) with at least one cleaning surface (X31), wherein the method is characterized in that the at least one cleaning surface (X31) of the at least one mechanical cleaning element (X29) is exposed, at least temporarily, to an oxidizing agent. The present invention further relates to a method for cleaning a metering system, in particular for a dispersion, especially a paint-metering system, to a cleaning apparatus, and to a metering system.
Claims
1. A method for avoiding the microbial attack of a cleaning apparatus (X2), in particular a cleaning apparatus (X2) for a metering system, wherein the cleaning apparatus (X2) has at least one mechanical cleaning element (X29) with at least one cleaning surface (X31), characterized in that the at least one cleaning surface (X31) of the at least one mechanical cleaning element (X29) is at least temporarily exposed to an oxidizing agent.
2. The method according to claim 1, characterized in that the oxidizing agent is sprayed or blown onto the at least one mechanical cleaning surface (X31).
3. The method according to claim 1 or 2, characterized in that the spraying or blowing of the oxidizing agent onto the at least one cleaning surface (X31) occurs substantially along its longitudinal extension, preferably over the entire surface.
4. The method according to any of claims 1 to 3, characterized in that the oxidizing agent is an oxidizing fluid, especially a gaseous oxidizing fluid.
5. The method according to claim 4, characterized in that the oxidizing fluid contains ozone.
6. The method according to any of claims 1 to 5, characterized in that the at least one cleaning surface (X31) of the at least one mechanical cleaning element (X29) is cleaned, at least temporarily, in a cleaning bath (X34) during operation of the cleaning apparatus (X2), wherein the cleaning bath (X34) is optionally also exposed to the oxidizing agent at least temporarily.
7. The method according to claim 6, characterized in that the spraying or blowing of the oxidizing agent onto the at least one cleaning surface (X31) of the at least one mechanical cleaning element (X29) takes place outside of the cleaning bath (X34).
8. The method according to any of claims 1 to 7, characterized in that the at least one mechanical cleaning element (X2) has a circumferential cleaning surface (X31).
9. The method according to any of claims 1 to 8, characterized in that the at least one mechanical cleaning element (X29) is cylindrical or roller-shaped.
10. The method according to any of claims 1 to 9, characterized in that the at least one mechanical cleaning element (X29) has at least one brush.
11. The method according to claim 10, characterized in that the at least one mechanical cleaning element (X29) is formed as a rotating cylindrical brush.
12. The method according to claim 10 or 11, characterized in that the oxidizing agent is sprayed or blown into the brush substantially parallel to the bristles.
13. The method according to any of claims 1 to 12, characterized in that the oxidizing agent is supplied via at least one supply line (X24, X26), wherein the at least one supply line (X24, X26) is arranged substantially along the longitudinal extension of the at least one cleaning surface (X31) of the at least one mechanical cleaning element (X29), wherein the at least one supply line (X24, X26) has one, preferably a plurality, of outlet openings (X28) aligned with the at least one cleaning surface (X31) for spraying or blowing the oxidizing agent thereon.
14. A method for cleaning a metering system, in particular for a dispersion, especially a paint-metering system, wherein the metering system has at least one metering unit (X1) with a pump head (X6), wherein the pump head (X6) is cleaned by means of a cleaning apparatus (X2) with at least one mechanical cleaning element (X29) having at least one cleaning surface (X31), characterized in that a microbial attack of the cleaning apparatus (X2) is avoided with a method according to any of claims 1 to 13.
15. A cleaning apparatus (X2) for a metering system, in particular for a dispersion, especially for a paint-metering system, comprising at least one mechanical cleaning element (X29) with at least one cleaning surface (X31) and a supply unit (X24, X26) for an oxidizing agent for at least temporarily applying an oxidizing agent to the at least one cleaning surface (X31), wherein the cleaning apparatus (X2) is configured for cleaning the metering system according to claim 14.
16. The cleaning apparatus according to claim 15, characterized in that the cleaning apparatus (X2) comprises a cleaning bath (X34) for at least temporarily cleaning the at least one cleaning surface (X31) of the at least one mechanical cleaning element (X29) during operation of the cleaning apparatus (X2).
17. A metering system for a dispersion, in particular a paint-metering system, comprising a cleaning apparatus (X2) according to claim 15 or 16.
Description
[0032] The present invention is explained in the following by means of a drawing representing an exemplary embodiment of the invention. The following is shown:
[0033]
[0034]
[0035]
[0036]
[0037]
[0038]
[0039]
[0040] The metering system of
[0041] The metering unit X1, which is adjacent to the metering unit X1 positioned above the bucket 9 in the clockwise direction X5, is positioned above a cleaning apparatus X2 in such a way that the cleaning apparatus X2, which is described in detail in
[0042] As also shown schematically in
[0043] When the metering system is in operation, the control computer 12 calculates the proportions of the primary paints stored in the containers 1, after the customer has entered a desired color tone and the desired volume, and controls the drive of the plate X4 in such a way that the metering units X1 of the container 1 with the required basic colors are positioned over the bucket 9, and the calculated amount is dispensed into the bucket 9 so as to obtain the desired color tone in the bucket 9. This is monitored by means of the scales 10 connected to the control computer via the line L2. The drive of the plate X4 is controlled in such a way that it always rotates clockwise X5. As a result, the pump head X6 of each metering unit X1 involved in the paint mixing process is cleaned by the cleaning apparatus X2 immediately after use and thus cleared of dispersion residue. The appropriate label for the paint mixture is printed via the label printer 13.
[0044]
[0045] According to
[0046] The fastening rail X22 together with the supply line X24 for the ozone-containing gas flow is shown again in two perspective views in
[0047] The particular advantage of the cleaning apparatus and the cleaning method is that there is no risk of microbial attack with bacteria and fungi in either the cleaning bath X34 or in the brush X29, as this is effectively prevented by the ozone being blown in as an oxidizing agent. Accordingly, the method according to the invention for avoiding the microbial attack of the cleaning apparatus X2 has proven to be extremely effective. In addition, the risk of a contamination of other pump heads X6 is minimized by the cleaning apparatus X2, even if it cleans a microbially contaminated pump head X6—and thus corresponding contaminants collect on the cylindrical brush surface X31 and in the cleaning bath X34—and then further pump heads X6 are cleaned.