NO containing compositions
11344571 · 2022-05-31
Assignee
Inventors
- Morven Duncan (Fife, GB)
- Stewart Warrender (Fife, GB)
- Russell Edward Morris (Fife, GB)
- Damiano Cattaneo (Fife, GB)
Cpc classification
B01J20/226
PERFORMING OPERATIONS; TRANSPORTING
B01J20/28097
PERFORMING OPERATIONS; TRANSPORTING
A61K33/00
HUMAN NECESSITIES
A61K2800/56
HUMAN NECESSITIES
A61K47/52
HUMAN NECESSITIES
A61K31/496
HUMAN NECESSITIES
A61K31/155
HUMAN NECESSITIES
International classification
A61K33/00
HUMAN NECESSITIES
A61K9/14
HUMAN NECESSITIES
A61K31/155
HUMAN NECESSITIES
B01J20/28
PERFORMING OPERATIONS; TRANSPORTING
A61K47/52
HUMAN NECESSITIES
Abstract
Disclosed are metal organic framework materials (MOFs), comprising an extra-framework NO releasing compound within the internal pores and/or channels of the MOF, the NO-releasing compounds and their preparation and uses. The MOFs and NO-releasing compounds are capable of releasing NO on application of an external stimulus and may provide materials with multiple modes of antibacterial and/or drug action.
Claims
1. A medical article comprising a nitric oxide (NO) complexed compound or porous framework material or metal organic framework (MOF) comprising an extra framework NO complexed compound or salt thereof, wherein the NO complexed compound or salt thereof comprises a functional group of the general structure D: ##STR00013## wherein R.sub.1-R.sub.12 independently comprise a substituted or unsubstituted C1-C10 alkyl-, aryl-, aldehyde-, carboxylic acid-, ester-, thiol-, phosphonate-, phosphinyl-, sulfonate-, boron-, or amine-based moiety, H or halogen, or two or more R groups together form part of a heterocyclic ring structure comprising one or more substituted or unsubstituted rings; wherein the substituents are selected from the group consisting of OH, halogen, NH.sub.3, oxo, C.sub.1-C.sub.6 alkyl, and phenyl; wherein at least one of R.sub.3-R.sub.7 is NO; and wherein R.sub.8-R.sub.12 are each optional, but when present result in the N atom to which they are bound becoming positively charged.
2. The medical article of claim 1, wherein only R.sub.6, R.sub.7, or both R.sub.6 and R.sub.7 are NO.
3. The medical article according to claim 1, selected from the group consisting of a stent, catheter, wound dressing, bandage, self-adhesive plaster and patch.
4. The medical article according to claim 1, wherein the NO complexed compound is formed from a precursor biologically active agent.
5. The medical article of claim 4, wherein the biologically active agent is an antibiotic, a biocidal agent, a fungicidal agent, or a sporicidal agent.
6. The medical article of claim 4, wherein the biologically active agent is selected from the group consisting of ciprofloxacin, a biguanide, and a complex or salt thereof, such that the medical article comprises a NO complexed quinolone compound or porous framework material or MOF comprising an extra framework NO complexed quinolone compound.
7. The medical article of claim 4, wherein the biologically active agent is selected from the group consisting of an NO complexed biguanide compound or a complex or salt thereof, a sulfonamide or a complex or salt thereof, a porous framework material, and an MOF comprising an extra framework NO complexed biguanide compound.
8. The medical article of claim 4, comprising a further biologically active agent, as a guest species within the pores and/or channels of the porous framework material or MOF.
9. The medical article of claim 8, wherein the further biologically active agent is NO.
10. The medical article of claim 9, wherein the further biologically active agent is irreversibly or releasably adsorbed NO.
Description
DESCRIPTION OF THE DRAWINGS
(1) Non-limiting example embodiments will now be described with reference to the following figures in which:
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(18) FIG. 17A1 and
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DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
(26) Preparation and release of NO from chlorhexidine NONOate and/or N-nitroso compounds
(27) Chlorhexidine is reported on the World Health Organization's List of Essential Medicines. This pharmaceutical product is widely used in disinfectants (for external use on skin and hands) and topical use (preservative in eye drops, active substance in wound dressings and antiseptic mouthwashes). Furthermore this biomolecule can also be found in cosmetics (additive to creams, toothpaste and deodorants). This drug is primarily sold as salts (dihydrochloride, diacetate and digluconate). Recently, different chlorhexidine-metal complexes have been reported; the drug binds to specific metals (like copper and silver) providing a system for the controlled release of chlorhexidine, while maintaining the drug performance [1].
(28) Chlorhexidine contains primary and secondary amine groups. The inventors have found that these amine groups are capable of binding NO when exposed to nitric oxide gas under high pressure.
(29) In addition, the release of NO from chlorhexidine may be triggered by ultra-violet light (UV) or exposure to humidity. Indeed, NO release can be triggered by either or both of these external stimuli. As detailed below, after an initial burst caused by exposure to humidity, the NO release can be repeatedly triggered and stopped by switching the source of UV light on and off.
(30) Advantageously and unexpectedly, the chlorhexidine NONOate and/or N-nitroso compounds have been found to be stable in air, meaning no special storage conditions are necessary.
(31) Light-controlled release is possible from a number of different chlorhexidine salts. The combination of chlorhexidine and NO has a synergistic effect, which reduces the risk of potential bacterial resistance and can be useful in combatting already resistant strains of microbes.
(32) A benefit of a chlorhexidine-NONOate/N-nitroso compound is that the chlorhexidine precursor which is regenerated after NO release is a well understood and beneficially biologically active agent. Moreover, appropriate dosages, side effects and toxicity are well understood.
(33) (1) Formation of and NO Release from Chlorhexidine-NONOate and/or N-Nitroso and Complexes and M-Chlorhexidine-NONOate and/or N-Nitroso Salts
(34) Chlorhexidine, its salts and complexes (precursor compounds) may be converted to their NONOate and/or N-nitroso compound using the high temperature dehydration and NO loading technique previously reported by Morris [2], in relation to MOF and zeolite materials.
(35) The chlorhexidine-NONOate and/or N-nitroso compounds may also be prepared generally as outlined by Lowe at al. [17] in which the material is subjected to high vacuum at approximately room temperature before being exposed to NO atmosphere.
(36) These techniques have previously only be considered for use in loading MOF and other molecular sieve materials with NO, so that the NO adsorbs to framework ions or ligands. Such methods have not previously been applied to “free” NONOate and/or N-nitroso precursor compounds.
(37) Any chlorhexidine salt can be employed as a starting material, as demonstrated in relation to chlorhexidine diacetate, chlorhexidine dihydrochloride and chlorhexidine digluconate.
(38) The identity of the chlorhexidine precursor may be selected in for a preferred NO release profile. The inventors have observed that the release profile on exposure of the NONOate and/or N-nitroso compound to humidity is particularly sensitive to the particular precursor which has been selected.
(39) For example, if a large initial “burst” of NO on contact with humidity or moisture is desired, then chlorhexidine dihydrochloride salt may be appropriate, for example. Whereas, the chlorhexidine diacetate salt has a more gradual release profile on exposure to humidity/moisture.
(40) The formation of NONOates and/or N-nitroso compounds has also been demonstrated for metal-chlorhexidine complexes. M-chlorhexidine NONOate and/or N-nitroso complexes have been formed by solvothermal/hydrothermal synthesis and mechanochemical synthesis. A preferred method is generally via the low temperature process reported by Morris at al. [23]. Again, this low temperature process has only previously been used to prepare MOF materials.
(41) The metal employed can be any metal but preferably those with antimicrobial properties such as Ag, Ni, Zn and Cu. These metals themselves have biological (e.g. antibacterial) activity and provide the NONOate and/or N-nitroso salt/complex with a still further mode of action (in addition to the activity and/or release profile of the NO and the chlorhexidine anion).
(42) In addition to release of NO by exposure to humid air, moisture or UV-light, NO release may also be initiated or stimulated by heating the chlorhexidine NONOate compound.
(43) It is a particular feature of these materials that a combined release trigger can be used to afford an initial burst followed by sustained release.
Example 1—Chlorhexidine Diacetate and Dihydrochloride NO Loading
(44) A sample of 50 mg of chlorhexidine diacetate hydrate and chlorhexidine dihydrochloride were exposed to high vacuum (10.sup.−4 Torr) for 1 hour at room temperature. Using a schlenk line, 4 atmospheres of NO gas were introduced into the schlenk tube over 2 hours allowing the dehydrated chlorhexidine to adsorb the radical gas. The samples were then exposed to vacuum and flushed with argon for 30 minutes. The glass vials containing the samples were then sealed.
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(46) The nitric oxide adsorption/desorption profiles for two further chlorhexidine diacetate samples (25 mg) were collected using a bespoke gravimetric adsorption system. Each sample was exposed to high vacuum at a pressure of 1×10.sup.−4 mbar overnight until no further mass loss was observed. The samples were cooled to 298K using a water bath (temperature accuracy of 0.02K).
(47) For one sample, shown in the outer plot of
(48) The gravimetric analyses show that a maximum of ˜0.9 mmole of NO per gram are adsorbed (
(49) The shape of the adsorption curve shows a dependence between the applied pressure of NO and the quantity of NO bonding to the molecule. The pressure of NO normally used for the loading on the schlenk line is 4 times the level obtainable during the gravimetric isotherm analysis, so we would expect an even higher quantity of radical gas coordinating to chlorhexidine. Through reapplication of vacuum the NO levels reduce progressively, and both samples reach a level of stored NO of ˜0.4 mmole per gram, circa 0.25 molecules per molecule of chlorhexidine. These data indicate that a significant proportion of the NO initially stored has been adsorbed by the chlorhexidine precursor.
(50) The release of NO from the sample was first triggered by passing a constant flow of humid nitrogen gas (11% RH) over it. The amount of NO released over time was detected using a Sievers NOA 280i chemiluminescence nitric oxide analyser until the emission of NO reached a level lower than 20 ppb.
(51) The initial burst of release of NO reached 512 PPM (
(52) After the NO release was completed the sample was kept on the bench at room temperature, exposed to air and humidity for over 48 hr. The sample was exposed to UV light from two Ritek Electronics UV tube lamps each containing 4×15 W bulbs with an emission of 300-400 nm and total power of 50-200 W. These parameters should not be viewed as limiting with regards to the invention. The light triggered NO release that immediately burst from 30 to 105 ppb. A maximum of around 120 ppb was reached on continuous exposure for about 5 mins.
(53) The emission immediately stopped when the source of UV light was switched off as shown in
Example 2—NO Release from Chlorhexidine NO Complex Suspended in Water
(54) A 100 mg sample of chlorhexidine diacetate was exposed to high vacuum (10.sup.−4 Torr) for 12 hours at room temperature. Using a schlenk line, 4 atmospheres of NO gas were introduced into the schlenk tube and maintained for 2 hours allowing the dehydrated chlorhexidine to adsorb the gas. The sample was then exposed to vacuum and flushed with argon for 30 minutes. The glass vials containing the sample were then sealed.
(55) The NO-loaded sample was submersed under 5 ml of deionized water in a sealed chamber connected to an NO analyser. A constant flow of nitrogen was bubbled through the suspension while measuring the concentration of NO present in the chamber atmosphere.
(56) The release of NO from the sample triggered by the water was measured in ppm and ppb over time until the level of NO dropped below 20 ppb. The initial burst release of NO reached 40 ppm. The sample released up to 0.035 mmol/g of nitric oxide in 7 hrs (
(57) Immediately after the NO release was completed the sample was exposed to UV light, which triggered further release of NO. A maximum of around 1000 ppb was recorded during continuous exposure for about 10 minutes. The emission immediately stopped when the source of UV light was switched off as shown in
Example 3—Chlorhexidine Dihydrochloride NO Loading and Release
(58) The same general process described above was followed using chlorhexidine dihydrochloride as starting material. An initial burst release of NO was obtained on exposing the sample to a constant flow of humid nitrogen gas (11% RH). The material released a small amount of gas for a couple of minutes and then stopped. After storing the sample on the bench, exposed to humid air for 2 days, an additional release of NO was triggered using UV light. Chlorhexidine dihydrochloride releases a burst of NO up to 150 ppb dropping to 75 ppb over 1 hr. This trigger mechanism can be repeated and controlled over time as shown in
Example 4—NO Loading and Release from a Silver-Chlorhexidine Complex
(59) Following the procedure of Song a sample of silver-chlorhexidine was prepared using silver nitrate and chlorhexidine diacetate. After characterisation (XRD, UV Vis, SEM and EDX) 50 mg of the sample were loaded with NO following the high pressure procedure previously reported [17].
(60) The initial burst release of NO, triggered by exposing the sample to humidity, lasted for a couple of minutes. The sample was stored exposed to humid air for over 60 hrs before an additional release of nitric oxide was triggered using UV light as shown in
(61) The silver chlorhexidine complex released a burst of NO (up to 175 ppb) that slowly dropped to 100 ppb over the course of an hour. As in the cases above, the release of NO stopped abruptly when the UV light was switched off. This trigger mechanism can be repeated and controlled over time as shown in
Example 5—NO Release from Polymer Film Containing NO-Complexed Chlorhexidine Diacetate
(62) A polyurethane polymer was chosen as a casting material as it is commonly used in medical devices. A sample of chlorhexidine diacetate (1.5 g) was dispersed in a pre-dissolved mixture of polyurethane (3 g) and THF (40 ml). The mixture was solvent cast using doctor blade techniques, to produce a ˜100 μm thick film, which was set by evaporation of the solvent.
(63) Samples of the polymer film were exposed to vacuum overnight and NO loaded using two different pressures (1 bar and 4 bar) of nitric oxide.
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(65) It has also been found that polymer-cast chlorhexidine loaded with NO at 1 bar does not release any NO under analogous conditions (as also shown
Example 6—UV Triggered NO Release from Polymer-Cast NO-Complexed Chlorhexidine Diacetate
(66) After the initial NO release was completed by exposing the samples to humid nitrogen, the samples were stored on the bench at room temperature, exposed to air and humidity for over 48 hrs. Both samples were then exposed to UV light in a flow of humid nitrogen gas (humidity controlled 11% RH).
(67) This triggered additional release of NO from the samples, including the film that had been loaded with NO at 1 bar, in direct contrast to its performance in solely humid nitrogen. A maximum of around 180 ppb was reached on continuous exposure for about 10 minutes from this sample.
(68) The emission immediately stopped when the source of UV light was switched off as shown in
(69) The chlorhexidine-containing polymer sample that had been loaded with NO at 4 bar released almost twice the amount obtained from the 1 bar counterpart as shown in
(70) (2) Formation of and NO Release from NO-Complexed Ciprofloxacin Compound
(71) It has been found that the process described above can be used on different drugs containing secondary amines in their structure, such as ciprofloxacin. Ciprofloxacin is an antibiotic useful for the treatment of different bacterial infections.
Example 7
(72) 50 mg of ciprofloxacin was NO loaded following the high pressure method reported above. A small initial burst of nitric oxide, lasting a couple of minutes, was obtained after exposure to a constant flow of humid nitrogen gas (11% RH). However, even after storing the sample on the bench exposed to humid air for 24 hrs, an additional release of NO was triggered using UV light. Ciprofloxacin released a burst of NO up to 500 ppb dropping to around 100 ppb over 1 hr. The mechanism can be repeated over time and controlled as shown in
(73) FT-Ir-Analyses
(74) Evidence for the attachment of NO to the ciprofloxacin molecule is provided by the appearance of new stretching frequencies in the FT-IR spectra for both samples after exposure to NO (
(75) There is also a small stretch above 1700 cm.sup.−1 present in each of the NO complexed compound samples. Although the origin of this stretch is not fully understood, it has been found to be present in other literature-reported spectra of NO-containing compounds (see for example J. G. Nguyen, Kristine K. Tanabe and S. M. Cohen Cryst. Eng. Comm, 2010, 12, 2335-2338). Furthermore,
(76) (3) Furosemide
(77) Furosemide is a loop diuretic used in the treatment of congestive heart failure and edema. Along with some other diuretics, furosemide is also included on the World Anti-Doping Agency's banned drug list due to its alleged use as a masking agent for other drugs. It is also on the World Health Organization's List of Essential Medicines, a list of the most important medication needed in a basic health system.
(78) Furosemide is primarily used for the treatment of hypertension and edema. It is the first-line agent for most people with edema caused by congestive heart failure. It is also used for hepatic cirrhosis, renal impairment, nephrotic syndrome, and in the management of severe hyperkalemia in combination with adequate rehydration
Example 8—Furosemide NO Loading and Release
(79) 25 mg of furosemide was exposed to high vacuum (10.sup.−4 Torr) for 1 hour at room temperature. Using a schlenk-line, 4 atmospheres of NO gas were introduced into the schlenk tube and maintained for 2 hours allowing the dehydrated furosemide to adsorb the gas. The sample was then exposed to vacuum and flushed with argon for 30 minutes. The glass vials containing the samples were then sealed.
(80) The release of NO was first triggered by passing a constant flow of humid nitrogen gas (11% RH) from the sample. The amount of NO released over time was detected in ppm and ppb until the emission of NO dropped below 20 ppb.
(81) The initial burst of release of NO reached 512 ppm (see
Example 9—UV Triggered NO Release from Furosemide NO Complex
(82) After the initial NO release by humid nitrogen was completed the sample was stored on the bench at room temperature, exposed to air and humidity for over 24 hrs. The sample was then exposed to UV light in a flow of humid nitrogen gas (humidity controlled 11% RH).
(83) A maximum of around 55 ppb was reached on continuous exposure for about 10 minutes from the furosemide NONOate sample. The emission immediately stopped when the source of UV light was switched off as shown in
(84) This on-off process can be repeated and controlled over time. Continuous exposure to UV light triggered a release of nitric oxide over 20 ppb for more than 7 hrs.
(85) (4) Light Triggered NO Release from MOFs
(86) UV light-triggered NO release from MOFs has been demonstrated for CPO-27 and HKUST-1 type structures amongst others (in particular other MOFs having coordinatively unsaturated framework metal sites). However, the technique can be applied to any MOF that shows affinity for NO.
(87) The MOFs were prepared following the method previously reported by Morris [23]. The activation and NO loading was carried out in accordance with the high temperature dehydration method previously reported by Morris [2,8]. However, NO-loading may be performed by any suitable method, for example as described by Lowe [17], in which the material is subject to a vacuum at room temperature before being exposed to a high pressure of nitric oxide.
(88) The MOF may be selected for a desired NO release profile. For example Mg and Ni-CPO-27 tend to release higher quantities of NO than HKUST-1.
(89) Release of the adsorbed NO is triggered by exposing the material to UV light. Alternatively, or in addition, NO release can also be achieved on exposure to humid air and/or heat.
(90) For example, in some case an initial NO burst can be triggered by contact with moisture and, once the release of nitric oxide dissipated, UV light can be used to selectively trigger the release of additional NO by switching the UV light source on and off.
(91) In this particular method may provide for release of a greater amount or proportion of the stored NO than has been previously possible. Although not wishing to be bound by theory, this may be a consequence of the UV light triggering the release of more strongly bonded (high energy) NO, which would not ordinarily be released by being displaced by water, or under thermal conditions conventionally applied. The UV triggered release of NO has particular use with MOFs that show poor NO release when exposed exclusively to humidity (eg. CPO-27 Mg and HKUST-1). Such materials are known to have relatively high NO storage capabilities, which it has not previously been possible to readily release.
Example 10—CPO-27 Mg
(92) A sample of 50 mg CPO-27 Mg prepared following the procedure reported by Morris [23] was exposed to high vacuum (10.sup.−4 Torr) for 1 hr at room temperature. The sample was then exposed to 4 atm of NO gas for 2 hr before being evacuated and flushed with argon for 30 minutes and sealed in glass vials.
(93) Total NO release: The sample was exposed to a constant flow of humid nitrogen gas (11% RH) and the NO released was monitored over time. The analysis was carried out until the NO gas levels detected were lower than 20 ppb. CPO-27 Mg only released up to 0.05 mmol/g over 25 hrs as shown in
Example 11—CPO-27 Ni
(94) A sample of 50 mg of CPO-27 Ni prepared following the procedure reported by Morris [23] was activated and NO loaded following the same high pressure technique described above.
(95) Total NO release—After exposing the sample to a constant flow of humid nitrogen gas (11% RH) CPO-27 Ni released a total of 2.8 mmol/g of NO over 40 hrs as shown in
Example 12—HKUST-1
(96) A sample of 50 mg of HKUST-1 prepared following the procedure reported by Morris [23] was activated and NO loaded following the same high pressure technique described above.
(97) Total NO release—An initial release of NO was obtained by exposing the sample to a constant flow of humid nitrogen gas (11% RH). The framework released up to 0.2 mmol/g over 7 hrs as shown in
(98) (5) Chlorhexidine-Loaded MOFs
(99) Chlorhexidine and NO-complexed chlorhexidine have been successfully incorporated into and released from MOFs. Moreover, the MOFs have been demonstrated to be capable of releasing NO over time with exposure to UV light and/or a combination of humidity and light.
(100) Chlorhexidine and NO loaded MOFs may be prepared in accordance with the methods of Morris [23] or Lowe [17].
(101) Where the MOF is first loaded with a precursor compound such as a chlorhexidine compound, the exposure of the MOF to nitric oxide may have a double effect; the NO gas is bonded to the MOF and also to the chlorhexidine compound, so as to form a NO and chlorhexidine-NO complex loaded MOF.
(102) NO may be released from the chlorhexidine-NO complex loaded MOF by commonly employed methods including but not limited to exposure to humid air, heat or UV light.
(103) Light triggered release of NO is analogous to that reported above for the NO complexes themselves and for the NO-loaded MOFs. The presence of two different types of NO binding sites may provide for in an increase in the total NO release.
Example 13—Loading of Chlorhexidine into CPO-27 Mg and CPO-27 Ni
(104) A sample of 100 mg of MOF (CPO-27 Mg or CPO-27 Ni) was mixed with 100 mg of chlorhexidine diacetate. The mixture was dehydrated in an oven at 110° C. overnight. The sample vial was then sealed and cooled to room temperature before anhydrous ethanol (100 ml) was introduced through a rubber septum. After 4 days, the suspension was then filtered and washed with ethanol. FT-IR and TGA analysis confirm the presence of chlorhexidine in the framework as shown in
Example 14—Release of Chlorhexidine from CPO-27 Mg and CPO-27 Ni
(105) 50 mg of drug-loaded MOF (CPO-27 Mg or CPO-27 Ni) was suspended in 50 ml of methanol. The solution was sampled over time and the concentration of chlorhexidine was detected using UV Vis.
Example 15—NO Loading and Release from Drug-Loaded CPO-27 Mg
(106) A sample of 50 mg of drug-loaded CPO-27 Mg was activated and NO loaded following the high pressure procedure reported above at room temperature. The sample was then exposed to a constant flow of humid nitrogen (11% RH). The quantity of chlorhexidine CPO-27 complex used has a burst release that peaks at 512 PPM. The drug loaded MOF achieves a total NO release of 0.15 mmol/g over 45 hrs as shown in
(107) Comparison of total NO release from the pure chlorhexidine NO complex, the pure MOF and drug-loaded MOF shows the advantage of the bifunctional material over the two separate moieties, as shown in
(108) The sample of chlorhexidine CPO-27 Mg was kept on the bench at room temperature exposed to air and humidity for over 40 hrs. An additional quantity of NO release was then triggered using UV light, as shown in
(109) (6) Incorporation of NO Complexed Materials into Matrices for Applications
(110) Each of the above materials, including drug NONOates and/or N-nitroso compounds (chlorhexidine salts and ciprofloxacin), MOFs, and drug loaded MOFs can be incorporated into different matrices. These matrices include but are not restricted to resins and binders (such as those used in paints, inks and coatings for example), creams, ointments, polymers, ceramics and glasses, particularly those employed in healthcare and medical applications (e.g. devices, dressings and topical treatments), or where antiseptic/antimicrobial performance is required (e.g. coatings on surfaces).
(111) The materials can be introduced into these matrices by any appropriate means such as, but not limited to, milling, high speed/sheer mixing, extrusion, electrospinning, casting and moulding. The materials may be employed in a coating on, for example, textiles, plastic, metal, wooden and glass surfaces. This could be achieved by any appropriate means, for example dispersing the material in a resin to be applied by painting, dip coating, spray coating, printing etc. Powder coating can also be employed where appropriate. Additional agents such as dispersion and rheology modifiers may be employed as appropriate and as necessary to aid formulation.
Example 16—Chlorhexidine Release from Polymer Containing Chlorhexidine-Loaded CPO-27 Ni
(112) A polyurethane polymer was chosen as a casting material as it is commonly used in catheters. A sample of CPO-27 Ni was drug loaded following the procedure previously reported by Morris et al [23]. The drug loaded MOF was suspended in THF using a high sheer homogeniser and dispersed in predissolved polyurethane. The mixture was solvent cast using doctor blade techniques to produce a ˜100 μm thick film.
(113) The films were suspended in an appropriated volume of methanol. The solution was sampled over time and the concentration of chlorhexidine was detected using UV spectroscopy.
Example 17—NO Release from Polyurethane Containing Chlorhexidine NO Complexloaded CPO-27 Ni
(114) MOF-loaded films (prepared as outlined above) were dehydrated and NO loaded following the previously reported procedure.
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