Solar Glass And Method For Its Production
20210053869 ยท 2021-02-25
Inventors
Cpc classification
C03C17/3613
CHEMISTRY; METALLURGY
C03C17/3626
CHEMISTRY; METALLURGY
C03C17/3681
CHEMISTRY; METALLURGY
G02B5/208
PHYSICS
C03C17/3639
CHEMISTRY; METALLURGY
C03C17/3655
CHEMISTRY; METALLURGY
C03C17/3618
CHEMISTRY; METALLURGY
C03C17/3652
CHEMISTRY; METALLURGY
International classification
C23C14/04
CHEMISTRY; METALLURGY
C23C14/35
CHEMISTRY; METALLURGY
C23C14/54
CHEMISTRY; METALLURGY
Abstract
A solar glass is specified. In an embodiment a solar glass includes a glass substrate and a layer system arranged on the glass substrate, wherein the layer system includes a base layer comprising one or more first dielectric layers, a first silver layer arranged on the base layer, an absorber layer arranged on the first silver layer, the absorber layer comprising a metal or metal alloy, an aluminum oxynitride layer arranged on the absorber layer, an intermediate layer arranged on the aluminum oxynitride layer, the intermediate layer comprising one or more second dielectric layers, a second silver layer arranged on the intermediate layer and a cover layer arranged on the second silver layer, the cover layer comprising one or more third dielectric layers, and wherein the absorber layer has a spatially varying thickness, a spatially varying material composition and/or a spatially varying surface coverage density in at least one direction.
Claims
1-18. (canceled)
19. A solar glass comprising: a glass substrate; and a layer system arranged on the glass substrate, the layer system comprising: a base layer comprising one or more first dielectric layers; a first silver layer arranged on the base layer; an absorber layer arranged on the first silver layer, the absorber layer comprising a metal or metal alloy; an aluminum oxynitride layer arranged on the absorber layer; an intermediate layer arranged on the aluminum oxynitride layer, the intermediate layer comprising one or more second dielectric layers; a second silver layer arranged on the intermediate layer; and a cover layer arranged on the second silver layer, the cover layer comprising one or more third dielectric layers, wherein the absorber layer has a spatially varying thickness, a spatially varying material composition and/or a spatially varying surface coverage density in at least one direction.
20. The solar glass according to claim 19 wherein a g-value of the solar glass has a maximum value g.sub.max at a first position and a minimum value g.sub.min at a second position, and wherein g.sub.maxg.sub.min0.05.
21. The solar glass according to claim 20, where g.sub.maxg.sub.minis 0.2.
22. The solar glass according to claim 19, wherein a g-value of the solar glass varies in a range between 0.05 and 0.45.
23. The solar glass according to claim 19, wherein a light transmission L.sub.t of the solar glass varies in a range between 0 and 0.8.
24. The solar glass according to claim 19, wherein the absorber layer has a thickness between 0.5 nm and 50 nm.
25. The solar glass according to claim 19, wherein the absorber layer comprises NiCr.
26. The solar glass according to claim 19, wherein the solar glass is a component of a window, a facade element or a vehicle pane.
27. The solar glass according to claim 19, wherein a thickness, a surface coverage density and/or a material composition of the absorber layer is not constant over the entire surface of the solar glass.
28. A method for producing the solar glass according to claim 19, the method comprising: producing the layer system by sputtering.
29. The method according to claim 28, wherein sputtering is performed in a sputtering system in which the glass substrate is transported while sputtering, and wherein a transport speed of the glass substrate varies while sputtering to produce the spatially varying thickness of the absorber layer. 3o. (New) The method according to claim 28, wherein sputtering is performed in a sputtering system in which the glass substrate is transported while sputtering, and wherein electrical power while sputtering of the absorber layer is varied over time to produce the spatially varying thickness of the absorber layer.
31. The method according to claim 28, wherein sputtering is performed in a sputtering system which, in order to produce the spatially varying thickness of the absorber layer, has at least one aperture between a cathode provided for sputtering the absorber layer and the glass substrate.
32. The method according to claim 28, wherein sputtering is performed in a magnetron sputtering system, and wherein an inhomogeneous magnetic field is used to generate the spatially varying thickness of the absorber layer.
33. The method according to claim 28, wherein a spatially inhomogeneous process gas is used for sputtering the absorber layer.
34. The method according to claim 28, wherein a cathode whose material composition varies in one direction is used for sputtering the absorber layer.
35. The method according to claim 28, further comprising, before applying the absorber layer, applying a mask layer to the glass substrate in order to produce a spatially varying surface coverage density of the absorber layer, wherein the mask layer has a spatially varying surface coverage density.
36. The method according to claim 35, wherein the mask layer is a point mask or a line mask.
37. The method according to claim 36, wherein the mask layer is a point mask comprising mask dots having a size between 0.5 mm and 3 mm.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0039] The invention is explained in more detail in the following on the basis of exemplary embodiments in connection with
[0040] In the Figures:
[0041]
[0042]
[0043]
[0044]
[0045]
[0046]
DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS
[0047] Like or likely acting components are marked with the same reference signs in the figures. The components shown and the proportions of the components to each other are not to be regarded as true to scale.
[0048] The solar glass shown in
[0049] The layer system 10 comprises a base layer 2 applied to the substrate 1, which is formed from several dielectric layers 21, 22, 23. The first layer on the substrate 1 in the growth direction of the layer system 10 is an aluminum oxynitride layer 21, which has a thickness between 10 nm and 17 nm, for example. The aluminum oxynitride layer 21 functions advantageously as a diffusion barrier which reduces diffusion of components of the glass substrate 1, for example sodium, into the layer system 10 and diffusion of components of the layer system 10 into the glass substrate 1. This is followed by a layer 22 of SnO.sub.2, which can have a thickness between 0 nm and 15 nm. The uppermost layer of the base layer 2 is a ZnO:Al layer 23, which can have a thickness between 5 nm and 30 nm, for example.
[0050] On top of the cover layer 23 of base layer 2 a first silver layer 3 has been grown, which for example has a thickness between 7 nm and 12 nm. The silver layer 3 is a first of two optical functional layers 3, 7, which serve in particular for the reflection of heat radiation.
[0051] The first silver layer 3 is followed in the direction of growth by a metallic absorber layer 4, which consists of a metal or a metal alloy and does not contain any silver. In particular, the absorber layer may be directly adjacent to the silver layer 3. The absorber layer is preferably a NiCr layer. For example, the absorber layer may contain 80% Ni and 20% Cr.
[0052] In the layer system described herein, the absorber layer 4 is produced in such a way that it has a spatially varying thickness, a spatially varying surface coverage density and/or a spatially varying material composition in at least one direction. In this way, the g-value and the light transmission L.sub.T are advantageously varied in at least one direction of the solar glass.
[0053] The absorber layer 4 is followed in the growth direction by a layer of aluminum oxynitride, which preferably directly adjoins the absorber layer 4. The layer 5 of aluminum oxynitride preferably has an oxygen content between o and 30% and a thickness of, for example, 5 nm to 27 nm. Layer 5 of aluminum oxynitride protects the absorber layer 4 advantageously against corrosion, especially oxidation. This has the advantage that the purely metallic character of the absorber layer 4 is retained even if the layer system 10 is subjected to a temperature treatment.
[0054] Layer 5 of the aluminum oxynitride is followed by an intermediate layer 6, which is formed by several dielectric layers 61, 62, 63, 64, 65, 66.
[0055] In the exemplary embodiment, the intermediate layer 6 contains, in the growth direction, a ZnO:Al layer 61 with a thickness of 10 nm to 17 nm, a SnO.sub.2 layer 62 with a thickness of 8 nm to 13 nm, a SiO.sub.xN.sub.y layer 63 with a thickness of 7 nm to 12 nm, an AlO.sub.xN.sub.y layer 64 with a thickness of 10 nm to 17 nm, a SnO.sub.2 layer 65 with a thickness of 0 nm to 15 nm and a ZnO:Al layer 66 with a thickness of 5 nm to 29 nm. In the case of a layer with a minimum thickness specification of 0 nm, this means here and below that this layer could be optionally omitted.
[0056] On the uppermost layer 66 of the intermediate layer 6 a further silver layer 7 is arranged, which has a thickness between 10 nm and 17 nm, for example. The first silver layer 3 and the second silver layer 7 of the layer system serve in particular to reflect infrared radiation and are therefore essential optical functional layers of the solar glass.
[0057] The second silver layer 7 is followed by a cover layer 8 in the direction of growth. The cover layer 8 contains a NiCrO.sub.x layer 81, which is applied directly to the other silver layer 7 and preferably has a thickness between 0.5 nm and 4 nm. This suboxidic NiCrO.sub.x layer 81 serves in particular to protect the second silver layer 7 from oxidation.
[0058] The cover layer 8 is followed in the direction of growth by a ZnO:Al layer 82 with a thickness between 12 nm and 31 nm and a SnMayer 83 with a thickness between 0 nm and 16 nm.
[0059] The last layer of layer system 10 in the direction of growth is advantageously a SiO.sub.xN.sub.y layer 84, which preferably has a thickness between 6 nm and 10 nm. This last layer 84 of the layer system in the growth direction protects the layer system in particular against oxidation.
[0060]
[0061] The solar glass 100 can, for example, be a window pane that is intended for use as solar control glazing. The exemplary embodiment of solar glass 100 can be a room-high window pane, for example. The direction z shown is the vertical direction of the solar glass 100, which may correspond to the height above the floor, for example. The absorber layer has a high transparency in the central area of the window pane, which corresponds in particular to the visible area. In the upper and lower area of the solar glass 100, on the other hand, the absorber layer has a greater thickness, so that the g-value and light transmission in these areas are lower. In this way, it can be achieved in particular that the input of solar energy is not too great in the middle area despite the high transparency and the associated low g-value. For example, the lower transparency in the floor area can be used to achieve visual protection.
[0062] A possible course of the thickness d.sub.A of the absorber layer in the direction z is shown schematically in
[0063] As an alternative to the spatial variation of the thickness of the absorber layer, a spatial gradient of the g-value and the light transmission can be achieved by a spatial variation of the material composition of the absorber layer. For example, the absorber layer may contain NiCr, where the concentration of nickel c.sub.Ni varies in the z direction. As shown in
[0064] The variation of the thickness of the absorber layer according to
[0065] A gradient of the thickness of the absorber layer as in the example of
[0066] A gradient of the nickel concentration as in the example of
[0067] The gradients of the thickness of the absorber layer or the nickel concentration shown in
[0068]
[0069] The mask dots of mask layer 9, for example, can be formed from a water-soluble mask material, preferably applied by screen printing. The absorber layer is subsequently applied to mask layer 9 by sputtering. The areas of the absorber layer covered by the mass dots are then lifted off by a so-called lift-off process, so that the absorber layer remains only in those areas that were not previously covered by the mask dots.
[0070] In this way, a spatially varying surface coverage density A of the absorber layer is generated, as shown in
[0071] By a different choice of the mask layer, of course, other gradients of the surface coverage density as well as the g-value and light transmission can be produced.
[0072] The invention is not limited by the description based on the exemplary embodiments. Rather, the invention comprises each new feature as well as each combination of features, which in particular includes each combination of features in the claims, even if this feature or combination itself is not explicitly stated in the claims or exemplary embodiments