Semiconductor device
10748830 ยท 2020-08-18
Assignee
Inventors
- Yukimasa Hayashida (Tokyo, JP)
- Daisuke Oya (Tokyo, JP)
- Takayuki Matsumoto (Fukuoka, JP)
- Ryutaro Date (Tokyo, JP)
Cpc classification
H01L25/18
ELECTRICITY
H01L23/36
ELECTRICITY
H01L23/3142
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2924/13091
ELECTRICITY
H01L23/481
ELECTRICITY
H01L23/28
ELECTRICITY
H01L25/07
ELECTRICITY
H01L23/10
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2924/13091
ELECTRICITY
H01L2924/16152
ELECTRICITY
H01L23/24
ELECTRICITY
H01L2924/00
ELECTRICITY
H01L23/34
ELECTRICITY
H01L23/49811
ELECTRICITY
H01L23/053
ELECTRICITY
H01L24/73
ELECTRICITY
H01L2924/00
ELECTRICITY
International classification
H01L25/18
ELECTRICITY
H01L23/10
ELECTRICITY
H01L23/36
ELECTRICITY
H01L23/28
ELECTRICITY
H01L23/498
ELECTRICITY
H01L23/373
ELECTRICITY
H01L23/48
ELECTRICITY
H01L23/34
ELECTRICITY
H01L25/07
ELECTRICITY
Abstract
A wiring board (2) is provided on a heat radiation plate (1). A semiconductor chip (8) is provided on the wiring board (2). A case housing (10) is provided on the heat radiation plate (1) and surrounds the wiring board (2) and the semiconductor chip (8). Adhesive agent (11) bonds a lower surface of the case housing (10) and an upper surface peripheral portion of the heat radiation plate (1). A sealing material (13) is filled in the case housing (10) and covers the wiring board (2) and the semiconductor chip (8). A step portion (16,17) is provided to at least one of the lower surface of the case housing (10) and the upper surface peripheral portion of the heat radiation plate (1). A side surface of the heat radiation plate (1) and an outer side surface of the case housing (10) are flush with each other.
Claims
1. A semiconductor device comprising: a heat radiation plate; a wiring board provided on the heat radiation plate; a semiconductor chip provided on the wiring board; a case housing provided on the heat radiation plate and surrounding the wiring board and the semiconductor chip; adhesive agent bonding a lower surface of the case housing and an upper surface peripheral portion of the heat radiation plate; and a sealing material filled in the case housing and covering the wiring board and the semiconductor chip, wherein a step portion is provided to at least one of the lower surface of the case housing and the upper surface peripheral portion of the heat radiation plate, and a side surface of the heat radiation plate and an outer side surface of the case housing are flush with each other.
2. The semiconductor device according to claim 1, wherein as the step portion, a convex portion is provided at an outer portion of the lower surface of the case housing and a concave portion is provided at a position facing the convex portion at the upper surface peripheral portion of the heat radiation plate.
3. The semiconductor device according to claim 2, wherein as the step portion, a groove is provided in the convex portion of the case housing and a protrusion is provided at a position facing the groove on the concave portion of the heat radiation plate.
4. The semiconductor device according to claim 1, wherein as the step portion, a concave portion is provided on an outer portion of the lower surface of the case housing and a convex portion is provided at a position facing the concave portion on the upper surface peripheral portion of the heat radiation plate.
5. The semiconductor device according to claim 1, wherein as the step portion, a convex portion is provided at a center portion of the lower surface of the case housing and a concave portion is provided at a position facing the convex portion on the upper surface peripheral portion of the heat radiation plate.
6. The semiconductor device according to claim 1, wherein a convex portion is provided as the step portion on an outer portion of the lower surface of the case housing, and a chamfer is provided at an inner portion of the lower surface of the case housing.
7. The semiconductor device according to claim 6, wherein a concave portion is provided as the step portion at the upper surface peripheral portion of the heat radiation plate, and an air space is provided on the lower surface of the case housing.
8. The semiconductor device according to claim 1, wherein a convex portion is provided as the step portion at an inner portion of the lower surface of the case housing, and a chamfer is provided at an outer portion of the lower surface of the case housing.
9. The semiconductor device according to claim 8, wherein an air space is provided on the lower surface of the case housing.
10. The semiconductor device according to claim 1, wherein the semiconductor chip is made of a wide-band-gap semiconductor.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
(10)
(11)
DESCRIPTION OF EMBODIMENTS
(12) A semiconductor device according to the embodiments of the present invention will be described with reference to the drawings. The same components will be denoted by the same symbols, and the repeated description thereof may be omitted.
First Embodiment
(13)
(14) The case housing 10 is provided on the heat radiation plate 1 surrounding the wiring board 2 and the semiconductor chip 8. The case housing 10 is an engineering plastic such as PPS, PBT or PET+PBT, for example. The lower surface of the case housing 10 and an upper surface peripheral portion of the heat radiation plate 1 are adhesively bonded to each other with adhesive agent 11. The adhesive agent 11 is a silicone-based or epoxy-based material or the like.
(15) Electrode terminals 12 are connected to the upper surface electrode 6 of the wiring board 2, and led out to the outside of the case housing 10. In order to ensure insulation, the case housing 10 is filled with an insulating sealing material 13 such as a silicone gel to cover the wiring board 2, the semiconductor chip 8, and the like.
(16)
(17)
(18) When the heat radiation plate 1 is molded by melting of metal, grooves or protrusions are provided on a mold or cast, and the peripheral portion of the heat radiation plate 1 is additionally processed during casting. Furthermore, when the concave portion 17 is formed after the surface of the heat radiation plate 1 is shaped, portions other than a portion serving as the concave portion 17 are covered with a resist mask, and the concave portion 17 is formed by etching. When resist etching is not performed, the concave portion 17 may be formed by pressing.
(19) In the following, an effect of the present embodiment will be described in comparison with a comparative example.
(20) On the other hand, in the present embodiment, as a step portion, the convex portion 16 is provided to the outer portion of the lower surface of the case housing 10, and the concave portion 17 is provided at a position facing the convex portion 16 on the upper surface peripheral portion of the heat radiation plate 1. As a result, it is possible to secure a certain volume of the adhesive agent 11 for adhesively bonding the case housing 10 and the heat radiation plate 1, thereby ensuring the sealing effect. Furthermore, the side surface of the heat radiation plate 1 and the outer side surface of the case housing 10 are flush with each other. As a result, a heat radiation range can be expanded, so that a clearance range for securing the fitting hole 14 to the cooler and the case fitting screw hole 15 can be expanded. Therefore, it is possible to reduce the contact thermal resistance and improve the likelihood of cooling design. As a result, an advantageous lifetime design of the semiconductor device is provided.
Second Embodiment
(21)
(22) In addition to the same effect as the first embodiment, the groove 18 of the case housing 10 and the protrusion 19 of the heat radiation plate 1 are engaged with each other, so that leakage of the sealing material 13 and protrusion of the adhesive agent 11 can be prevented. Therefore, the productivity can be enhanced. In addition, the positioning precision of the case housing 10 is enhanced.
Third Embodiment
(23)
Fourth Embodiment
(24)
Fifth Embodiment
(25)
Sixth Embodiment
(26)
Seventh Embodiment
(27)
Eighth Embodiment
(28)
(29) The semiconductor chip 8 is an IGBT or a diode formed of silicon, but instead may be a SiC-MOSFET or a SiC-SBD formed of a wide-bandgap semiconductor. The wide-bandgap semiconductor is, for example, a silicon carbide, a gallium-nitride-based material, or diamond. A power semiconductor chip formed of such a wide-bandgap semiconductor has a high voltage resistance and a high allowable current density, and thus can be miniaturized. The use of such a miniaturized chip enables the miniaturization and high integration of the semiconductor device in which the chip is incorporated. Further, since the chip has a high heat resistance, a radiation fin of a heatsink can be miniaturized and a water-cooled part can be air-cooled, which leads to further miniaturization of the semiconductor device. Further, since the chip has a low power loss and a high efficiency, a highly efficient semiconductor device can be achieved.
REFERENCE SIGNS LIST
(30) 1 heat radiation plate; 2 wiring board; 8 semiconductor chip; 10 case housing; 11 adhesive agent; 13 sealing material; 16,21 convex portion; 17,20 concave portion; 18 groove; 19 protrusion; 22 chamfer; 23 air space