CHIP PACKAGING STRUCTURE AND MANUFACTURING METHOD THEREOF

Abstract

Disclosed a chip packaging structure and a manufacturing method thereof. The chip packaging structure comprises: a metal heat dissipation layer; a chip structure located on an upper surface of the heat dissipation layer and comprising a plurality of first electrical contacts on an upper surface of the chip structure; a pin layer comprising a plurality of second electrical contacts and a plurality of separate metal bumps, wherein the plurality of second electrical contacts are located lower surfaces of the plurality of metal bumps, and the plurality of second electrical contacts are coupled to the plurality of first electrical contacts of the chip structure through a plurality of conductive pillars; and an encapsulant encapsulating at least one portion of the chip structure, the metal heat dissipation layer and the pin layer, wherein at least one portion of the pin layer is exposed to an upper surface of the encapsulant, and an lower surface of the metal heat dissipation layer is exposed outside the encapsulant. The metal heat dissipation layer includes a flange on the side surface for tightly combining the metal heat dissipation layer and the encapsulant. By using a pattern plating process, a pin layer or a distribution layer is formed, and on the premise that the performance of the chip packaging structure is guaranteed, the manufacturing process can be simplified and the manufacturing cost is reduced.

Claims

1. A chip packaging structure, comprising: a metal heat dissipation layer; a chip structure located on an upper surface of said metal heat dissipation layer, comprising a plurality of first electrical contacts on an upper surface of said chip structure; a pin layer comprising a plurality of second electrical contacts and a plurality of separate metal bumps, wherein said plurality of second electrical contacts are located on lower surfaces of said plurality of metal bumps, and said plurality of second electrical contacts are coupled to said plurality of first electrical contacts of said chip structure through a plurality of conductive pillars; and an encapsulant, encapsulating at least one portion of said pin layer, said metal heat dissipation layer and said chip structure to expose said pin layer on an upper surface of said encapsulant, and to expose a lower surface of said metal heat dissipation layer outside said encapsulant.

2. The chip packaging structure according to claim 1, wherein said metal heat dissipation layer comprises at least one flange on its side surface.

3. The chip packaging structure according to claim 2, wherein said at least one flange of said metal heat dissipation layer is configured to extend in a direction perpendicular to said side surface of said metal heat dissipation layer and said at least one flange is located inside the encapsulant.

4. The chip packaging structure according to claim 2, wherein said at least one flange of said metal heat dissipation layer is configured to extend in a direction parallel to said side surface of said metal heat dissipation layer and said at least one flange is configured to surround said side surface of said metal heat dissipation layer.

5. The chip packaging structure according to claim 4, further comprising a sealing pin located on an upper surface of said flange and extending to a periphery of said upper surface of said encapsulant, wherein said metal heat dissipation layer, said flange and said sealing pin form a cavity for accommodating said encapsulant.

6. The chip packaging structure according to claim 5, wherein an upper surface of said sealing pin and an upper surface of said pin layer are at a same height.

7. The chip packaging structure according to claim 1, further comprising: a redistribution layer located between said chip structure and said pin layer, wherein said redistribution layer is configured to extend in a direction parallel to said upper surface of said chip structure, said distribution layer is configured to couple said plurality of first conductive contacts on said upper surface of said chip structure to said plurality of second electrical contacts of said pin layer through said plurality of conductive pillars, and said plurality of second electrical contacts are located above a center of said chip structure, or above an edge of said chip structure.

8. The chip packaging structure according to claim 7, wherein said plurality of conductive pillars comprising: a first conductive pillars configured to electrically couple a lower surface of said redistribution layer to said chip structure; and a second conductive pillars configured to electrically couple an upper surface of said redistribution layer to a lower surface of said pin layer.

9. The chip packaging structure according to claim 1, further comprising: an insulation layer located on said lower surface of said metal heat dissipation layer.

10. The chip packaging structure according to claim 1, wherein said upper surface of said metal heat dissipation layer is connected with said chip structure by an adhesive layer.

11. The chip packaging structure according to claim 7, wherein said encapsulant comprises a first encapsulant and a second encapsulant, said second encapsulant is located on said first encapsulant, said first encapsulant encapsulates said chip structure, and said metal heat dissipation layer, and said second encapsulant encapsulates said redistribution layer.

12. A manufacturing method for a chip packaging structure, comprising: arranging a metal heat dissipation layer on a substrate, wherein said metal heat dissipation layer comprises at least one flange on its side surface; attaching a chip structure on an upper surface of said metal heat dissipation layer by using an adhesive layer; forming an encapsulant encapsulating an upper surface of said substrate, said metal heat dissipation layer and said chip structure; performing a mechanical or chemical treatment, to make a plurality of electrode connecting structures on an upper layer of said chip structure exposed outside said first encapsulant; and arranging a pin layer for electrically coupling to and covering said electrode connection structures.

13. The manufacturing method according to claim 12, wherein said at least one flange of said metal heat dissipation layer is configured to extend in a direction perpendicular to a side surface of said metal heat dissipation layer.

14. The manufacturing method according to claim 12, wherein said step of arranging a pin layer for electrically coupling to and covering said electrode connection structures comprises: forming a first encapsulant for encapsulating said upper surface of said substrate, said metal heat dissipation layer, said chip structure, and said electrode connection structures, and exposing upper surfaces of said electrode connection structures; forming a redistribution layer by using a pattern plating process, for coupling to and covering said upper surfaces of said electrode connection structures; forming a second encapsulant for encapsulating said redistribution layer; performing perforating or etching, so that, at least one portion of an upper surface of said redistribution layer is exposed outside said second encapsulant; and arranging said pin layer for electrically coupling to and covering said exposed portion of said upper surface of said redistribution layer by using a pattern plating process.

15. The manufacturing method according to claim 12, wherein said at least one flange of said metal heat dissipation layer is configured to extend in a direction parallel to said side surface of said metal heat dissipation layer.

16. The manufacturing method according to claim 15, comprising: forming an encapsulant for encapsulating said upper surface of said substrate, said metal heat dissipation layer, said chip structure, and said electrode connection structures and exposing upper surfaces of said electrode connection structures and said at least one flange; and arranging said pin layer for electrically coupling to and covering said upper surfaces of said electrode connection structures, and arranging a sealing pin for coupling to and covering said upper surface of said at least one flange.

17. The manufacturing method according to claim 15, further comprising: forming a first encapsulant for encapsulating said upper surface of said substrate, said metal heat dissipation layer, said chip structure and said electrode connection structures, and exposing upper surfaces of said electrode connection structures and said at least one flange; forming a redistribution layer connecting to said upper surfaces of said electrode connection structures by a pattern plating process, to make said at least one flange grow; forming a second encapsulant for encapsulating said redistribution layer and said at least one flange; performing perforating or etching, so that, an upper surface of said redistribution layer and at least one portion of said upper surface of said at least one flange is exposed outside said second encapsulant; arranging said pin layer for electrically coupling to and covering said exposed portion of said redistribution layer, making said flange re-grow, and forming said sealing pin for coupling to and covering said upper surface of said flange, by using a pattern plating process.

18. The manufacturing method according to claim 17, wherein said upper surface of said flange and said upper surface of said redistribution layer are at a same height, and an upper surface of said sealing pin and an upper surface of said pin layer are at a same height.

19. The manufacturing method according to claim 12, further comprising: removing said substrate and forming an insulating layer on a lower surface of said metal heat dissipation layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The above and other objects, advantages and features of the present disclosure will become more fully understandable from the detailed description given hereinbelow in connection with the appended drawings, and wherein:

[0029] FIG. 1a shows a cross-sectional diagram of a chip packaging structure according to a first embodiment of the present disclosure;

[0030] FIGS. 1b to 1j show cross-sectional diagrams of various stages of a manufacturing method for the chip package structure according to the first embodiment of the present disclosure;

[0031] FIG. 2a shows a cross-sectional diagram of a chip package structure according to a second embodiment of the present disclosure; and

[0032] FIGS. 2b to 2i show cross-sectional diagrams of various stages of a manufacturing method for the chip package structure according to the second embodiment of the present disclosure.

DETAILED DESCRIPTION OF THE DISCLOSURE

[0033] Exemplary embodiments of the present disclosure will be described in more details below with reference to the accompanying drawings. In the drawings, like reference numerals denote like members. The figures are not drawn to scale, for the sake of clarity. In addition, some well-known parts may not be shown in the figures.

[0034] Many specific details of the present disclosure are described below, such as the structures, materials, dimensions, processes, and techniques of the parts, in order to more clearly understand the present disclosure. However, one skilled in the art will understood that the present disclosure may be practiced without these specific details.

[0035] It should be understood that when one layer or region is referred to as being above or on another layer or region in the description of device structure, it can be directly above or on the other layer or region, or other layers or regions may be intervened therebetween. Moreover, if the device in the figures is turned over, the layer or region will be under or below the other layer or region.

[0036] In contrast, when one layer is referred to as being directly on or on and adjacent to or adjoin another layer or region, there are not intervening layers or regions present. In the present application, when one region is referred to as being directly in, it can be directly in another region and adjoins another region, but not in an implantation region of another region.

[0037] In the present application, the term semiconductor structure means generally the whole semiconductor structure formed at each step of the method for manufacturing the semiconductor device, including all of the layers and regions having been formed. The term of laterally extending is referring to extending in a direction substantially perpendicular to the depth direction of the groove.

[0038] Many specific details of the present disclosure are described below, such as the structures, materials, dimensions, processes, and techniques of the parts, in order to more clearly understand the present disclosure. However, one skilled in the art will understood that the present disclosure may be practiced without these specific details.

[0039] The present disclosure may be presented in various forms, some of which will be described below.

[0040] FIG. 1a shows a cross-sectional diagram of a chip packaging structure according to a first embodiment of the present disclosure.

[0041] As shown in FIG. 1a, a chip structure 140 is located on an upper surface of a metal heat dissipation layer 120, and the chip structure 140 is attached to the upper surface of the metal heat dissipation layer 120 by using an adhesive layer 130. The chip structure 140 comprises a plurality of first electrical contacts 141 on the upper surface of the chip structure 140. A redistribution layer 170 is located over the chip structure 140 and is electrically coupled to the first electrical contacts 141 of the chip structure 140 by using a plurality of conductive pillars 180. A pin layer 150 is located on the redistribution layer 170. The pin layer 150 includes a plurality of metal bumps and a plurality of second electrical contacts 151. The plurality of second electrical contacts 151 are located below lower surfaces of the plurality of metal bumps. The plurality of second electrical contacts 151 are electrically coupled to the upper surface of the redistribution layer 170 by using the plurality of conductive pillars 180. The redistribution layer 170 extends in a direction parallel to the upper surface of the chip structure 140. The redistribution layer 170 is configured to couple the first electrical contacts 141 located at the center of the upper surface of the chip structure 140 to the second electrical contacts 151 of the pin layer 150 through the conductive pillars 180. The second conductive contacts 151 are located above the center of the chip structure 140 or above the edge of the chip structure 140. The plurality of conductive pillars 180 includes first conductive pillars 180a and second conductive pillar 180b. The first conductive pillars 180a is configured to electrically couple the lower surface of the redistribution layer 170 to the chip structure 140, and the second conductive pillars 180b is configured to electrically couple the upper surface of the redistribution layer 170 to the lower surface of the pin layer 150. An encapsulant 160 encapsulates chip structure 140, the metal heat dissipation layer 120, the redistribution layer 170 and at least one portion of pin layer 150. At least one portion of the pin layer 150 is exposed to the upper surface of the encapsulant 160, and the lower surface of the metal heat dissipation layer 120 is exposed outside the encapsulant 160. Specifically, the encapsulant 160 includes a first encapsulant 160a and a second encapsulant 160b. The second encapsulant 160b is located on the first encapsulant 160a. The first encapsulant 160a encapsulates chip structure 140 and at least one portion of metal heat dissipation layer 120. The second encapsulant 160b encapsulates the redistribution layer 170.

[0042] Extending the redistribution layer 170 in a direction parallel to the upper surface of the chip structure, the layout area of the electrodes of chip is equivalent to be increased. The electrodes of chip are led above the edge of the chip structure 140 so that the spaces between the external pins are increased. As a result, the abnormal accidents, such as contacts causing a failure on the chip packaging structure, are less likely to happen.

[0043] The redistribution layer 170 in the present embodiment is an alternative structure. If the redistribution layer 170 is not provided in the embodiment, the chip structure 140 can be directly and electrically coupled to the second electrical contacts 151 of the pin layer 150 through the plurality of conductive pillars 180.

[0044] The metal heat dissipation layer 120 includes a flange 121 on its side surface. The flange 121 extends in a direction perpendicular to the side surface of the metal heat dissipation layer 120. The flange 121 is located in the encapsulant 160 and is used for tightly combining the metal heat dissipation layer 120 and the encapsulant 160 with each other. In the embodiment, the flange 121 of the metal heat dissipation layer 120 can be two, which can be distributed up and down, and a groove is formed between the two flanges 121. The groove can be filled with the encapsulant 160 to further improve the heat dissipation of the chip packaging structure and enhance the combination between the metal heat dissipation layer 120 and the encapsulant 160.

[0045] FIGS. 1b to 1j show cross-sectional diagrams of various stages of a manufacturing method for the chip package structure according to the first embodiment of the present disclosure.

[0046] As shown in FIG. 1b, the metal heat dissipation layer 120 is attached to the upper layer of the substrate 110 by using the adhesive layer. The metal heat dissipation layer 120 includes the flange 121 on the side surface. The flange 121 extends in a direction perpendicular to the side surface of the metal heat dissipation layer 120. The extension length of the flange 121 is not beyond the side surface of the substrate 110. The metal heat dissipation layer 120 in the embodiment may be made of copper, aluminum, or other suitable materials.

[0047] Next, as shown in FIG. 1c, the chip structure 140 is attached to the upper surface of the metal heat dissipation layer 120 by using the adhesive layer 130. The upper surface of the chip structure 140 has a plurality of electrode connection structures for leading out the electrodes of chip. The structure and components of the electrode connection structures can take a variety of forms. In the present embodiment, the electrode connection structures include a plurality of first electrical contacts 141 on the upper surface and a plurality of first conductive pillars 180 arranged on the first electrical contacts 141. The adhesive layer 130 may be made of an insulating adhesive material, for example, epoxy resin. The insulating adhesive material can be added on the metal heat dissipation layer 120 by using a dispensing process to form an epoxy resin with a certain thickness to ensure the chip performance The adhesive layer 130 may also be made of a conductive adhesive material, which be electrically connected to the metal heat dissipation layer 120, and has good heat dissipation.

[0048] Next, as shown in FIG. 1d, the first encapsulant 160a is formed to encapsulate the upper surface of the substrate 110, the metal heat dissipation layer 120, the chip structure 140, and the plurality of first conductive pillars 180a. The material of the first encapsulant 160a may be polyimide, silicone or epoxy, or other suitable material. The first encapsulant 160a may be made by a compression molding process, a transfer molding process, a liquid sealing molding process, or other suitable process.

[0049] Next, as shown in FIG. 1e, the upper surfaces of the plurality of first conductive pillars 180a located on the upper surface of the chip structure 140 are exposed to the upper surface of the first encapsulant 160a by a mechanical process such as grinding or drilling, and the upper surfaces of the plurality of first conductive pillars 180a and the upper surface of the first encapsulant 160a are located in a same plane.

[0050] Next, as shown in FIG. 1f, the redistribution layer 170 is formed on the upper surfaces of the plurality of first conductive pillars 180a and the upper surface of the first encapsulant 160a by a pattern plating process or other suitable process, so that the chip structure 140 is electrically coupled to the lower surface of the redistribution layer 170 through the plurality of first conductive pillars 180a. Alternatively, the pin layer is formed on the upper surfaces of the plurality of first conductive pillars 180a and the upper surface of the first encapsulant 160a by a pattern plating process or other suitable process, so that the chip structure 140 is electrically coupled to the pin layer through the plurality of first conductive pillars 180a. The step of pattern plating process includes: firstly, a first metal layer is formed on the upper surfaces of the plurality of first conductive pillars 180a and the upper surface of the first encapsulant 160a by using a deposition process, and then a second metal layer is formed on the first metal layer by using an electroplating process.

[0051] Next, as shown in FIG. 1g, the second encapsulant 160b is formed to encapsulate the redistribution layer 170. The second encapsulant 160b is located on the first encapsulant 160a. The first encapsulant 160a and the second encapsulant 160b form the encapsulant 160. The first encapsulant 160a and the second encapsulant 160b may be made of a same material.

[0052] Next, as shown in FIG. 1h, at least one portion of the upper surface of the redistribution layer 170 is exposed outside the second encapsulant 160b by drilling or etching, and the upper surface of the second encapsulant 160b is higher than the upper surface of the redistribution layer 170.

[0053] Next, as shown in FIG. 1i, the second conductive pillars 180b and the pin layer 150 are formed at the same time by a process such as the above-mentioned pattern plating process or the like. The pin layer 150 is located on the second conductive pillars 180b. The second conductive pillars 180b are located inside a through-hole of the second encapsulant 160b and are coupled to the exposed portion of the upper surface of the redistribution layer 170 by the second encapsulant 160b, so that the chip structure 140 is electrically coupled to the pin layer 150 through the redistribution layer 170. The pin layer 150 may be made of a plurality of separate metal bumps.

[0054] Next, as shown in FIG. 1j, the substrate 110 and the adhesive layer between the substrate 110 and the metal heat dissipation layer 120 are removed, so that the lower surface of the metal heat dissipation layer 120 is exposed outside the first encapsulant 160a.

[0055] Next, as shown in FIG. 1a, insulation layer 190 is formed on the lower surface of the metal heat dissipation layer 120 by using chemical treatment or physical coating, such as vapor deposition. The insulation layer 190 is used to electrically insulate the lower surface of the metal heat dissipation layer 120, to prevent static electrons from generating and it is made of a material having a good thermal conductivity, for example, it may be made of polyimide, silicone or epoxy resin, or other suitable material.

[0056] In the first embodiment of the present disclosure, the metal heat dissipation layer 120 arranges the flange extending in a direction perpendicular to the side surface of the metal heat dissipation layer 120, so that the surface area of the metal heat dissipation layer 120 is increases, which can not only further improve the heat dissipation of the chip packaging structure, but also enhance the combination force between the metal heat dissipation layer 120 and the encapsulant 160.

[0057] FIG. 2a shows a cross-sectional diagram of a chip package structure according to a second embodiment of the present disclosure.

[0058] Referring to FIG. 2a, a chip structure 240 is located on an upper surface of a metal heat dissipation layer 220, and the chip structure 240 is attached to the upper surface of the metal heat dissipation layer 220 by using an adhesive layer 230. The chip structure 240 includes a plurality of first electrical contacts 241 on the upper surface of the chip structure 240. A redistribution layer 270 is located on the chip structure 240 and is electrically coupled to the first electrical contacts 241 of the chip structure 240 through a plurality of conductive pillars 280. A pin layer 250 is on the redistribution layer 270. The pin layer 250 includes a plurality of metal bumps and a plurality of second electrical contacts 251. The plurality of second electrical contacts 251 are located below lower surfaces of the plurality of metal bumps. The second electrical contacts 251 are electrically coupled to the upper surface of the redistribution layer 270 through the plurality of conductive pillars 280. The redistribution layer 270 extends in a direction parallel to the upper surface of the chip structure 240. The redistribution layer 270 couple the first electrical contact 241 located on the center of the upper surface of the chip structure 240 to the second electrical contacts 251 of the pin layer located at the center and/or the edge of the upper surface of the chip structure 240 through the conductive pillars 280. The plurality of conductive pillars 280 includes first conductive pillars 280a and second conductive pillars 280b. The first conductive pillars 280a is configured to electrically couple the lower surface of the redistribution layer 270 to the chip structure 240, and the second conductive pillar 280b is configured to electrically couple the upper surface of the redistribution layer 270 to the lower surface of the pin layer 250. The encapsulant 260 encaplates all of the entire chip structure 240, the upper surface of the metal heat dissipation layer 220, entire redistribution layer 270, and at least one portion of the pin layer 250. The encapsulant 260 may be located on the upper surface of the metal heat dissipation layer 220. The lower surface of the 220 is exposed outside the encapsulant 260, and at least one portion of the pin layer 250 is exposed to the upper surface of the encapsulant 260. Specifically, the encapsulant 260 includes a first encapsulant 260a and a second encapsulant 260b. Second encapsulant 260b is located on the first encapsulant 260a. The first encapsulant 260a encapsulates the chip structure 240, and the second encapsulant 260b encapsulates the redistribution layer 270.

[0059] Extending the redistribution layer 270 in a direction parallel to the upper surface of the chip structure 240 is equivalent to increasing the layout area of electrodes. The electrodes of chip are led above the edge of the chip structure 240 so that the spaces between the external pins are increased. Therefore, abnormal accidents, such as contacts causing a failure on the chip packaging structure, are less likely to happen.

[0060] The redistribution layer 270 in the present embodiment is an alternative structure. If the redistribution layer 270 is not provided in the embodiment, the chip structure 240 can be directly coupled to the second electrical contacts 251 of the pin layer 250 through the plurality of conductive pillars 280.

[0061] The metal heat dissipation layer 220 includes flanges 221 on the side surface. The flanges 221 are configured to extend in a direction parallel to the side surface of the metal heat dissipation layer 220 and surround the side surface of the encapsulant 260. Sealing pins 222 are located on the upper surface of the flanges 221 and extend to the periphery of the upper surface of the encapsulant 260. The upper surface of the sealing pins 222 and the upper surface of the pin layer 250 are at a same height. The metal heat dissipating layer 220, the flanges 221 and the sealing pins 222 form a cavity for accommodating encapsulant 260. The encapsulant 260 is located in the cavity, and the encapsulant 260 and one portion of the upper surface of the metal heat dissipation layer 220, the inner side surface of the flanges 221, and one portion of the lower surface of the sealing pins 222 are connected, thereby improving the heat dissipation performance of the chip package structure and enhancing the combination force between the metal heat dissipation layer 220 and the encapsulant 260. The sealing pins 222 and the flanges 221 of the metal heat dissipation layer 220 may be made of same material.

[0062] FIGS. 2b to 2i show cross-sectional diagrams of various stages of a manufacturing method for the chip package structure according to the second embodiment of the present disclosure.

[0063] As shown in FIG. 2b, the metal heat dissipation layer 220 is attached to the upper surface of the substrate 210 through an adhesive layer. The metal heat dissipation layer 220 includes the flanges 221 on the side surface. The flanges 221 are configured to extend in a direction parallel to the side surface of the metal heat dissipation layer 220, so that the metal heat dissipation layer 220 and the flanges 221 form a cavity. The metal heat dissipation layer 220 in the embodiment may be made of copper, aluminum, or other suitable materials.

[0064] Next, as shown in FIG. 2c, the chip structure 240 is attached to the upper surface of the metal heat dissipation layer 220 through the adhesive layer 230. The chip structure 240 includes a plurality of first electrical contacts 241 on the upper surface, and a plurality of first conductive pillars 280a are arranged on the first electrical contacts 241. The upper surface of the first conductive pillars 280a and the upper surface of the flanges 221 are at a same height. The adhesive layer 230 may be made of an insulating adhesive material, for example, epoxy resin. The insulating adhesive material may be added on the metal heat dissipation layer 220 by using a dispensing process to form an epoxy resin with a certain thickness, so that the chip performance is ensured. The adhesive layer 230 may also be made of a conductive adhesive material, which is electrically coupled to the metal heat dissipation layer 220 for achieving good heat dissipation performance

[0065] Next, as shown in FIG. 2d, the first encapsulant 260a is formed to encapsulate the upper surface of the substrate 210 and all of the metal heat dissipation layer 220, the chip structure 240, and the plurality of first conductive pillars 280a. The material of the first encapsulant 260a may be polyimide, silicone or epoxy resin, or other suitable material. The first encapsulant 260a may be made by a compression molding process, a transfer molding process, a liquid sealing molding process, or other suitable process.

[0066] Next, as shown in FIG. 2e, the upper surfaces of the plurality of first conductive pillars 280a located on the upper surface of the chip structure 240 and the upper surface of the flanges 221 are exposed to the upper surface of the first encapsulant 260a by a mechanical process such as grinding or drilling. Preferably, the upper surfaces of the plurality of first conductive pillars 280a, the upper surface of the flanges 221, and the upper surface of the first encapsulant 260a are in a same plane.

[0067] Next, as shown in FIG. 2f, the redistribution layer 270 is formed on the upper surfaces of the plurality of first conductive pillars 280a and the upper surface of the first encapsulant 260a by using a pattern plating process or other suitable process, so that the chip structure 240 is electrically coupled to the lower surface of the redistribution layer 270 through the plurality of first conductive pillars 280a. The flanges 221 are configured to grow by using the pattern plating process or other suitable process. Preferably, after growth the upper surface of the flange 221 and the upper surface of the redistribution layer 270 are at a same height. Alternatively, the pin layer is formed on the upper surfaces of the plurality of first conductive pillars 280a and the upper surface of the first encapsulant 260a by using the pattern plating process or other suitable method, so that the chip structure 240 is electrically coupled to the pin layer through the plurality of first conductive pillars 280a. The step of pattern plating process includes: firstly, a first metal layer is formed on the upper surfaces of the plurality of first conductive pillars 280a and the upper surface of the first encapsulant 260a through a deposition process; and then a second metal layer is formed on the first metal layer through an electroplating process.

[0068] Next, as shown in FIG. 2g, the second encapsulant 260b is formed to encapsulate the redistribution layer 270 and the flanges 221. The second encapsulant 260b is located on the first encapsulant 260a. The first encapsulant 260a and the second encapsulant 260b form the encapsulant 260.

[0069] Next, as shown in FIG. 2h, a through-hole is formed in the second encapsulant by drilling or etching, so that at least one portion of the upper surface of the redistribution layer 270 and the upper surface of the flanges 221 are exposed outside the second encapsulant 260b, and the upper surface of the second encapsulant 260b is higher than the upper surface of the redistribution layer 270 and the upper surface of the flanges 221.

[0070] Next, as shown in FIG. 2i, the second conductive pillars 280b and the pin layer 250 are formed at the same time by the above-mentioned processes such as the pattern plating process. The pin layer 250 is located on the second conductive pillars 280b. The second conductive pillars 280b are located in the through-hole of the second encapsulant 260b and are coupled to the exposed portion of the upper surface of the redistribution layer 270 outside the second encapsulant 260b, so that the chip structure 240 is electrically coupled to the pin layer 250 through the redistribution layer 270. The pin layer 250 may be formed of a plurality of separate metal bumps. The flanges 221 are configured to grow again by using a pattern plating process or other suitable process. Preferably, after re-growth, the upper surface of flanges 221,the upper surfaces of the second encapsulant 260b and the second conductive pillars 280b are at a same height. The sealing sealing pins 222 are formed on the upper surface of the flange 221 and extends to the periphery of the upper surface of the encapsulant 260. The upper surface of the sealing pin 222 and the upper surface of the pin layer 250 are at a same height. The metal heat dissipation layer 220, the flanges 221, and the sealing pins 222 form a cavity for accommodating the encapsulant 260. The encapsulant 260 is located in the cavity, and the encapsulant 260 is connected with one portion of the upper surface of the metal heat dissipation layer 220, the inner side surface of the flanges 221, and one portion of the lower surface of the sealing pins 222.

[0071] Next, as shown in FIG. 2a, the substrate 210, the adhesive layer between the substrate 210 and the metal heat dissipation layer 220, and the encapsulant 260 on the outer side surface of the flanges 221 are removed, so that the lower surface of the metal heat dissipation layer 220 and the outer side surface of the flanges 221 are exposed outside the encapsulant 260. A protective layer is formed on the lower surface of the metal heat dissipation layer 220 and the outer side surface of the flanges 221 by chemical treatment or physical coating, such as vapor deposition. The protective layer may be formed of an inert metal, such as Ni, Au, to prevent the exposed metal heat dissipation layer 220 and the flanges 221 from being oxidized.

[0072] In the second embodiment of the present disclosure, at the edge of the metal heat dissipation layer 220, the flanges 221 extends in a direction parallel to the side surface of the metal heat dissipation layer 220. The flanges 221 are configured to surround the side surface of the encapsulant 260. The metal heat dissipation layer 220, the flanges 221 and the sealing pins 222 form a cavity for accommodating encapsulant 260, which can further improve the heat dissipation performance, the electromagnetic shielding performance, and the airtightness of the chip package structure, and can strengthen the combination force between the metal heat dissipation layer 220 and the encapsulant 260. Therefore, the reliability of the chip product is improved, which can be widely used to replace metallic or ceramic package structures.

[0073] According to the chip packaging structure of the present disclosure, the pin layer or the distribution layer are formed by adopting the pattern plating process, and on the premise that the performance of the chip packaging structure is guaranteed, the manufacturing process can be simplified, so that the manufacturing cost is reduced. By exposing at least one portion of the metal heat dissipation layer below the chip structure outside the encapsulant, the heat dissipation performance of the entire chip packaging structure is improved. In addition, the chip packaging structure of the present embodiment is entirely sealed with a metal package, so that it has good-looking appearance and product reliability.

[0074] It should also be understood that the relational terms such as first, second, and the like are used in the context merely for distinguishing one element or operation form the other element or operation, instead of meaning or implying any real relationship or order of these elements or operations. Moreover, the terms comprise, comprising and the like are used to refer to comprise in nonexclusive sense, so that any process, approach, article or apparatus relevant to an element, if follows the terms, means that not only said element listed here, but also those elements not listed explicitly, or those elements inherently included by the process, approach, article or apparatus relevant to said element. If there is no explicit limitation, the wording comprise a/an . . . does not exclude the fact that other elements can also be included together with the process, approach, article or apparatus relevant to the element.

[0075] Although various embodiments of the present disclosure are described above, these embodiments neither present all details, nor imply that the present disclosure is limited to these embodiments. Obviously, many modifications and changes may be made in light of the teaching of the above embodiments. These embodiments are presented and some details are described herein only for explaining the principle of the disclosure and its actual use, so that one skilled person can practice the present disclosure and introduce some modifications in light of the disclosure. The disclosure is intended to cover alternatives, modifications and equivalents that may be included within the spirit and scope of the disclosure as defined by the appended claims.