Process for manufacturing a surface-mount semiconductor device having exposed solder material

Abstract

A process for manufacturing surface-mount semiconductor devices, in particular of the Quad-Flat No-Leads Multi-Row type, comprising providing a metal leadframe, in particular a copper leadframe, which includes a plurality of pads, each of which is designed to receive the body of the device, the pads being separated from adjacent pads by one or more rows of wire-bonding contacting areas, outermost rows from among the one or more rows of wire-bonding contacting areas identifying, together with outermost rows corresponding to the adjacent pads, separation regions.

Claims

1. A method comprising: depositing beads of conductive soldering material on portions of a plurality of leads and on joining regions of a leadframe so that each of the beads of conductive soldering material is on outer portions of adjacent leads and a joining region between two adjacent leads; coupling semiconductor devices to respective die pads of the leadframe; and carrying out a thermal process that sinters or reflows the beads of conductive soldering material to form soldered beads.

2. The method according to claim 1 further comprising: coupling ends of wires to the plurality of leads and ends of the wires to the semiconductor devices; etching a bottom surface of the leadframe and exposing a bottom surface of the soldered beads; forming a dielectric material on the leadframe and around the semiconductor devices and the wires; and dicing along through the soldered beads and the dielectric material to form individual packages, the dicing exposing lateral surfaces of the soldered beads on an outside surface of the individual packages.

3. The method according to claim 2, further comprising: mounting one of the individual packages on a board, the mounting including: depositing solder-paste beads on the board; and placing the individual packages on the solder-paste beads so that the soldered beads align with the solder-paste beads and bring about formation of a lateral meniscus of the solder-paste beads.

4. The method according to claim 1 wherein said conductive soldering material is sinterable Transient Liquid Phase Solder or solder paste with reflow-soldering temperature at or above 260 C.

5. The method according to claim 1 wherein the leadframe is a metal leadframe and the die pads and leads include a plated layer of one or more conductive materials.

6. The method according to claim 5 wherein the leadframe includes four rows of leads between adjacent die pads, wherein the four rows of leads includes two center rows that have first portions that are partially plated and second portions with the leadframe material exposed, and the second portions of the leads of the two center rows are proximate the joining regions.

7. The method according to claim 1 wherein the joining regions are at least 600 m in width.

8. A method, comprising: coupling a first die to a first die pad of a leadframe; forming a solder bead on an upper surface of a first lead of the leadframe; electrically coupling the first die to the solder bead using a wire, the wire having a first end on the first die and a second end on the upper surface of the first lead; forming molding material on the first die and the solder bead; and cutting through the molding material and the solder bead such that a surface of the solder bead is exposed from the molding material.

9. The method according to claim 8, further comprising: coupling a second die to a second die pad of the leadframe, the forming of the solder bead including forming the solder bead on a second lead of the leadframe.

10. The method according to claim 9, further comprising: electrically coupling the second die to the solder bead, the forming of the molding material including forming the molding material on the second die.

11. The method according to claim 8 wherein a second lead of the leadframe is physically coupled to the first lead by a coupling portion of the leadframe, the forming of the solder bead include forming the solder bead on the second lead and the coupling portion.

12. The method according to claim 11, further comprising: removing the coupling portion.

13. The method according to claim 11 wherein the coupling portion has a smaller thickness than the first lead and the second lead.

14. The method according to claim 8 wherein the first die is electrically coupled to the solder bead through a conductive layer on the first lead and the wire.

15. A method, comprising: coupling a first die to a first die pad of a leadframe, the leadframe including a first lead, the first lead including a surface having a first conductive layer on a first portion of the surface of the first lead, a second portion of the surface of the first lead remaining uncovered by the first conductive layer; forming a solder bead on the second portion of the surface of the first lead; electrically coupling the first die to the first conductive layer by a first wire; forming molding material on the first die, the first conductive layer, the solder bead, and the first wire; and cutting through the molding material and the solder bead such that a surface of the solder bead is exposed from the molding material.

16. The method of claim 15, further comprising: coupling a second die to a second die pad of the leadframe, the leadframe including a second lead, the second lead including a second conductive layer on a first portion of the surface of the second lead, a second portion of the surface of the second lead remaining uncovered by the second conductive layer; forming the solder bead on the second portion of the surface of the second lead; electrically coupling the second die to the second conductive layer by a second wire; and forming the molding material on the second die, the second conductive layer, and the second wire.

17. The method of claim 16, further comprising: removing a portion of the leadframe that physically couples the first lead to second lead such that another surface of the solder bead is exposed from the molding material.

18. The method according to claim 17 wherein the portion of the leadframe has a smaller thickness than the first lead and the second lead.

19. The method of claim 15 wherein the exposed surface of the solder bead is coplanar with a surface of the molding material.

Description

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

(1) Various embodiments will now be described, purely by way of example, with reference to the annexed drawings, wherein:

(2) FIGS. 1A, 1B, 1C, and 1D are cross-sectional views representing steps of the process described herein;

(3) FIGS. 2A, 2B, 2C, and 2D are cross-sectional views representing a variant embodiment of the process described herein;

(4) FIGS. 3A, 3B, and 3C are cross-sectional views representing further steps of the process described herein;

(5) FIG. 4 shows a cross-sectional view of a further step of the process described herein;

(6) FIG. 5 is a schematic illustration of a further step of the process described herein;

(7) FIG. 6 shows a device module obtained in the step of FIG. 5;

(8) FIG. 7 shows a cross-sectional view representing a final step of the process described herein;

(9) FIGS. 8A and 8B show a perspective view and an enlarged perspective view of a plurality of devices in a first step of the manufacturing process described herein;

(10) FIG. 9 shows a further view of the plurality of devices in a first step of the manufacturing process described herein;

(11) FIGS. 10A and 10B show a perspective view and an enlarged perspective view of a plurality of devices in a second step of the manufacturing process described herein;

(12) FIG. 12 shows a perspective view of a plurality of devices in a third step of the manufacturing process described herein;

(13) FIG. 14 shows a perspective view of a plurality of devices in a fourth step of the manufacturing process described herein;

(14) FIGS. 16A and 16B show a further perspective view and an enlarged perspective view of a plurality of devices in a second step of the manufacturing process described herein;

(15) FIG. 18 shows a further view of the plurality of devices in a fifth step of the manufacturing process described herein;

(16) FIG. 20 shows a view of a device in a sixth step of the manufacturing process described herein;

(17) FIG. 21 shows a view of a device in a seventh step of the manufacturing process described herein; and

(18) FIGS. 11, 13, 15, 17, and 19 show a detail of the device in different steps of the manufacturing process.

DETAILED DESCRIPTION

(19) In the ensuing description, numerous specific details are provided aimed at enabling maximum understanding of the embodiments provided by way of example. The embodiments may be implemented with or without specific details, or else with other processes, components, materials, etc. In other circumstances, well-known structures, materials, or operations are not illustrated or described in detail so that aspects of the embodiments will not be obscured. Reference, in the course of this description, to an embodiment or one embodiment is meant to indicate that a particular feature, structure, or characteristic described in connection with the embodiment is comprised in at least one embodiment. Hence, phrases such as in an embodiment or in one embodiment or the like that may be present in various points of the present description do not necessarily refer to one and the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any convenient way in one or more embodiments.

(20) The references are provided herein merely for convenience of the reader and do not define the scope or the meaning of the embodiments.

(21) FIG. 1A, which represents a first step 110 of the process described herein, shows a lateral cross-sectional view of a standard leadframe. The first step 110 envisages starting from a standard metal leadframe 11, specifically a copper leadframe, in particular of a PPF (Pre-Plated Frame) type. The leadframe 11 is substantially a copper plate on which, in particular by etching, reliefs or recesses are obtained with respect to a base plane of the top surface 11u. These reliefs form pads 12a, which have a wide surface designed to receive the body of a semiconductor device 20, also referred to as a die. There is a plurality of pads 12a, which are generally arranged in rows and columns on the leadframe 11 (see, in this regard, the perspective view of FIG. 8A) and are separated from adjacent pads by one or more rows, in this embodiment two rows R1, R2, of smaller contacting areas 12 or leads that are connected by joining portions, where bonding wires 13 are to be applied. The outermost rows, in this case the rows R2 of areas 12 corresponding to a pad 12a, identify, together with the outermost rows corresponding to the adjacent pads, separation regions 23. Pads 12a are placed in a central position with respect to the smaller areas 12 where the bonding wires 13 are to be applied, as well as for adhering of the device 20 on their top surface 11u.

(22) The pads 12a and the areas 12 are plated with contact layers 14 using materials such as NiPd or else NiPdAu or else Ag in order to define the areas where the bonding wires 13 are to be applied. The contact layers 14 are preferably plated before providing the leadframe 11, according to the known PPF technique (leadframe pre-plated with an electrochemical process).

(23) As has been mentioned, each pad 12a is separated from another by four areas 12. As may be noted more clearly from FIG. 8B, this corresponds to the fact that each pad 12a is surrounded by a first row R1 of areas 12 and by a second row R2 of areas 12, which, as is more clearly visible in FIG. 8B, are arranged according to a rectangular perimeter around the pad 12a. Identified between the second rows R2 corresponding to adjacent pads are separation regions 23, which, in the process described herein, have a width S of at least 60050 m.

(24) On a bottom surface 11d of the leadframe 11 there are obtained, once again by plating, solderable bottom contacts 16, in the position corresponding to the areas 12, and in a position corresponding to the top pad 12a a bottom pad 16a is provided, the bottom contacts 16 and the bottom pad 16a being plated directly on the bottom copper surface 11d of the leadframe 11, which is substantially planar and without any reliefs.

(25) Illustrated in FIG. 8A is a corresponding perspective view of the leadframe 11 of a QFN_mr type in step 110, visible on the top surface 11u of which are the pads 12a having a substantially rectangular shape. As may be appreciated more clearly from FIG. 8B, which shows an enlargement of a pad 12a, these pads 12a are surrounded by the first row R1 of areas 12, which are to undergo wire bonding, along a rectangular perimeter around the pad 12a. Arranged on the outside of this perimeter is the second row R2 of areas 12, and then the contact region 23. As may be noted from FIG. 8B, the areas 12 of the second rows R2 are partially plated, leaving a portion of the area 12, which faces the separation region 23, exposed.

(26) Basically, a device area AD may be identified that ranges from one half of the length S of the separation regions 23 and includes inside it the rows R2 and R1 and the pad 12a. As illustrated in FIG. 8B, the aforesaid area AD of the device is also substantially rectangular, and its perimeter runs along the longitudinal axis of channels identified by the separation regions 23. Along this perimeter, as illustrated in what follows, the cuts for the operations of singulation of the device are then made.

(27) FIG. 9 is a perspective view of the bottom surface 11d, once again substantially in a processing step corresponding to step 110, visible in which is the arrangement of the corresponding contacts 16 and the bottom pads 16a, which corresponds to that of the areas 12 and the pads 12a on the top surface 11U and hence comprises the bottom pads 16a surrounded by two rows of bottom contacts 16 arranged along rectangular perimeters.

(28) To return to the process illustrated in FIG. 1, in order to provide contact terminals 50 (visible, for example, in FIG. 7) in a step 120, illustrated in FIG. 1B, in the above region 23 conductive soldering material 15 is applied, in particular a bead of conductive soldering material 15. The term bead is here understood in the sense of a bead of soldering material with application of filler material, i.e., an amount of conductive material that, once sintered or re-flowed via thermal process, provides a mechanical and electrical contact between the surfaces 23 and 12 made of copper with formation of an inter-metal layer. The bead of conductive soldering material 15 preferably comprises material sinterable at low temperature (220 C.) and irreversible of the TLPS (Transient Liquid-Phase Solder) type, in particular a copper and tin composite, for example the material DAP689 produced by ORMET. The TLPS material is substantially a material with a copper and tin base sinterable at low temperature (less than 250 C.), which once sintered is stable and forms, following upon sintering, an inter-metal resistant to the process of etching of the copper leadframe.

(29) In variant embodiments, the conductive soldering material 15 may be a conductive alloy with a reflow-soldering temperature higher than 260 C., and hence higher than that of SAC (tin-silver-copper) alloys used for soldering devices on PCBs, which is also resistant to the process of etching of the copper leadframe. For instance, a silver-bismuth alloy, for example the material BiAgX produced by Indium, is here used, or else a solder paste at a reflow-soldering temperature higher than 260 C.

(30) Application, in step 120, of the conductive soldering material 15 is performed using a dispensing needle, which is moved from one contact to another to form the bead, or else by hot rolling plus application of pressure, or else by transfer with silk-screen printing technique. The TLPS material may preferably be applied by needle dispensing or with silk-screen printing techniques, whereas the paste with conductive alloy may preferably be applied just with silk-screen printing technique.

(31) The conductive soldering material 15 is applied in such a way as to cover also approximately 50% of the contiguous surface on the wire-bonding area 12, i.e., substantially the surface left without plating 14, for a length of not less than 10050 m. There is thus created a bead of conductive material 15, of oblong shape, the total length S of which, in the direction that joins two areas 12 corresponding to two adjacent pads, is greater than 80050 m, the width is 25050 m, and the thickness is greater than 20050 m.

(32) The part of the area 12 that is to receive the bonding wire 13 is plated in order to create a discontinuity with respect to the contiguous surface of the area 12 itself on which the conductive material 15 is applied, this surface being, instead, left exposed, and hence being a copper surface. In this way, the degree of overstepping of the margins by the conductive material 15 is controlled, thus preventing the material from contaminating the portion of the area 12 provided with the plating 14, where the bonding wires 13 are effectively to be applied.

(33) Where it is desired to use rough copper as surface finishing of the part of the area 12 designed for wire bonding, the contiguous surface is once again made of copper, but with a standard roughness.

(34) FIGS. 10A and 10B are perspective views of the leadframe 11, similar to the views 8A and 8B, after execution of the step 120, where there may be noted the beads made of conductive material 15, each of which extends between two areas 12 of the second rows R2, thus joining them. Also visible in FIG. 10B are corner contacts 15c that are formed by depositing material 15 on non-plated areas 12.

(35) FIG. 11 is, instead, an enlargement of a section of the cross-sectional view of FIG. 1B regarding the contact 15 made of conductive material.

(36) With reference to FIG. 1C, step 130 is then a step of mounting of the body of the semiconductor device 20, also referred to as a die. In the case where a device 20 with a metallized bottom surface is to be mounted (as in step 130), the conductive material 15 can be deposited in a layer 15g also on the pad 12a to enable adhering of the device 20, and in this way can be applied simultaneously with application of the lateral contacts.

(37) The conductive material 15 is then sintered in a step 140 (illustrated in FIG. 1D) if it is a sinterable material, or else alternatively subjected to reflow, via passage through a tunnel oven or else in a static oven. For sintering, the maximum temperature is 220 C., whereas, for reflow of the paste with high reflow-soldering temperature, temperatures of between 270 C. and 300 C. are used.

(38) The oxygen content of the oven is monitored in order to provide complete sintering or reflow. This condition is obtained by getting the ovens to work in a nitrogen atmosphere. In the embodiment of a low-temperature sinterable material (TLPS), it is possible to improve sintering further by getting the oven to work in a reducing atmosphere. This condition is obtained by getting the ovens to work with a mixture of nitrogen N.sub.2 and hydrogen H.sub.2 (with a percentage of H.sub.2 of less than 5%). As illustrated in FIG. 1D, the beads of conductive soldering material 15 undergo sintering or else reflow (in the embodiment of a paste with high reflow-soldering temperature), becoming soldered beads 15s, connected by soldering to the respective wire-bonding areas 12.

(39) FIG. 12 presents a perspective view of the leadframe 11 (after step 130) bearing the dice 20, adhering to the pads 12a, and the soldered beads 15s.

(40) FIGS. 2A-2D illustrate the same process steps as those of FIG. 1, but regarding an embodiment where it is desired to mount a device 20, with the bottom surface made of silicon oxide. In this embodiment, after the step 110 of providing the leadframe 11, a step 120 of deposition of the conductive material 15 is carried out, where there is not deposited also the layer 15g on the pad 12a but, in a step 125, an adhesion material 18 is applied thereon, which is of a standard type for devices 20 with a bottom surface made of silicon oxide, namely, for example C-DAF (Conductive Die-Attach Film) or else glues are used, following application of the conductive soldering material 15. In a step 130, the device 20 with the bottom surface made of silicon oxide is applied on the pad 16a. Polymerization of the layer of adhesion material 18 into a polymerized layer 18s is performed during the step 140 of sintering or reflow of the conductive soldering material 15.

(41) FIGS. 3A-3C illustrate the steps subsequent to the step of thermal treatment, in particular sintering, 140 or 140. The first next step is a step 150 of plasma cleaning, the purpose of which is to remove any organic contamination from the areas 12 where wire-bonding is to be carried out. It is to be borne in mind that, if a material containing tin is used as conductive material 15 for providing the contacts, this material reacts with the hydrogen that is possibly used in plasma cleaning (i.e., the forming gas) to form unstable compounds that lead to contamination of the plasma itself. It is thus preferable to carry out the step of plasma cleaning 150 using as reactive gas nitrogen in association with argon, which provides proper mechanical cleaning.

(42) A step 160 of wire bonding is then carried out, which is made using gold, copper, or silver wire 13 on the plated surfaces 14 (or else on the rough copper surfaces) of the areas 12 and pads 12a. Wires 13 are connected between each area 12 of the rows R1 and R2 and the pad 12a that the areas 12 enclose in their perimeter.

(43) FIG. 13 represents a detail of the soldered bead 15s after wire bonding 160, where the wire 13 is set in contact with the plated surface 14.

(44) The next step 170 (illustrated in FIG. 3C) is a step of molding of a layer 40 of dielectric material, in particular plastic resin, on the leadframe 11 to obtain a package 41 made of resin that protects the wires 13 and the device 20 or 20. FIG. 14 is a schematic view of the leadframe 11 coated with a dielectric layer 40, whereas FIG. 15 shows a detail of the soldered bead 15s after coating with the dielectric layer 40. In greater detail, the molding step 170 envisages forming a dielectric layer 40 via injection of a thermosetting epoxy resin, in which silicon micro-particles are dispersed. The dielectric layer 40 is formed on the die of the body of the semiconductor device 20 and coats the entire area AD of the device, and hence also the soldered bead 15s. Of course, the dielectric layer 40, namely the resin layer, also covers the other areas of the device on the leadframe 11.

(45) The molding step 170 may be followed by a thermal treatment, for example, at the curing temperature of 175 C., this treatment being known as post-molding curing (PMC).

(46) FIG. 4 illustrates, once again in lateral cross-sectional view, the leadframe 11 in a further step 180 of the process described herein.

(47) In this step, of chemical back etching, a chemical etch of the bottom surface 11d of the leadframe 11 is carried out to remove the layer of copper where it is not protected by the plating 14, namely on the contacts 16 and on the pad 16a of the bottom surface 11d. In particular, the back-etching step 180 removes the copper of the leadframe 11, but does not remove the SnCu inter-metal composite that is obtained by sintering of the TPLS and of which the sintered soldered bead 15s is made. Consequently, the soldered bead 15s, after step 180, gives out, with a bottom surface 15d of its own onto the bottom surface 11d of the leadframe 11, set in the non-masked part between the plated contacts 16, where the copper has been removed. The chemical etch 180 hence exposes also the bottom surface 15d of the soldered bead 15s for a length E of 700 m and a width of 250 m. FIGS. 16A and 16B are perspective views of the leadframe 11, similar to the views of FIGS. 10A and 10B following upon the step 120 of deposition, where there may be noted the leadframe 11 from the side the bottom surface 11d after the back-etching step 180, and hence the bottom surfaces 15d of the soldered beads 15s. Once again in the same context, FIG. 17 shows a detail of the contact 15 after the back-etching step 180.

(48) The next step, step 190, of the process is illustrated in FIG. 5 and consists of a singulation of the individual device module 30, carried out preferably by cutting using diamond blades, which produces cuts 19 having a width t of approximately 20050 m. The device area AD comprised substantially between the separation regions 23 is separated from the other corresponding device areas, thus enabling separation of the die of the device 20 from the other dice of the other devices. The dielectric layer 40 thus cut represents, integrated with the portion of leadframe 11 corresponding to the device area AD, the package 41 of the device module 30.

(49) FIG. 18 is a perspective view of the leadframe 11, which, after the singulation step 190, is divided into a plurality of device modules 30 by the cuts 19.

(50) FIG. 6 is illustrated just the individual module 30 in the package 41, and it may be noted how, given that the bottom surface of the package 41 substantially corresponds to the bottom surface 11d of the leadframe 11, the cut 19 determines a lateral surface 15a, which is exposed, i.e., not covered by the dielectric layer 40 or by any plating, of the soldered bead 15s of the module 30. From FIG. 6 it may also be appreciated that the bottom surface 15d, after cutting, remains exposed for a distance d of 20050 m.

(51) To sum up, following upon the cutting operation 190, the dielectric region 40 forms the package 41 that covers the device 20, this package 41 being delimited underneath by the portion of leadframe 11 of the area of the device 20. The cutting operation 190 causes each soldered bead 15s, after it has in turn been cut substantially in half thus forming a cut soldered bead 15m, identifies a terminal 50 of sintered material, which comprises a bottom surface 15d, which gives out onto the bottom surface 11d of the package 41, and a lateral surface 15a, which is in turn exposed outwards and hence be solderable. This lateral surface 15a is coplanar with the lateral surface of the package P, which has a substantially parallelepipedal shape with top and bottom surfaces corresponding to those of the device area AD. Extending along the edge formed by the lateral surface 411 of the package 41 and by the bottom surface 11d are at least part of the contact terminals 50. Hence, the cutting operations (step 190) bring about formation of a device with a package of a quad-flat no-leads (QFN) type.

(52) Hence, as has just been discussed, basically, after the singulation step 190, the soldered bead 15s has the lateral surface 15a and the bottom surface 15d exposed. This makes it possible, during a step 200 of soldering on the PCB 60 (illustrated in FIG. 7), to carry out soldering with formation of a lateral soldering meniscus 25. As may be noted in FIG. 7, a solder-paste bead 24 is laid on the PCB 60, in this embodiment preferably in the position in which a given terminal 50 is to be connected via soldering to the PCB 60 and the edge formed by the lateral surface 15a and the bottom surface 15d (which is aligned to the bottom edge of the package P) is rested on the aforesaid solder-paste bead 24, thus causing formation of the lateral meniscus 25.

(53) Illustrated in FIG. 19 is the detail of a cut soldered bead 15m, i.e., the soldered bead 15s divided into two by the cut 19, and also in this embodiment it may be noted how the cut 19 leads to the exposed surfaces 15a. The cut bead 15m is soldered to the area 12 and thus in electrical contact with the body of the device 20 and hence forms a contact terminal 50 on which, in particular on the lateral surface 15a, further contacts can be soldered. Consequently, a device is obtained, which comprises a body of semiconductor material 20, 20 and a leadframe element 11, which includes a plurality of contact terminals 50 electrically connected to the semiconductor device 20, the leadframe element 11 comprising a pad 12a and one or more rows R1, R2 of wire-bonding contacting areas 12, the contact terminals 50 being electrically connected to the wire-bonding contacting areas 12.

(54) FIG. 20 is a schematic perspective view of the module 30, which highlights the top surface coated with the dielectric layer 40 of epoxy resin, and, on the perimeter, the lateral surfaces 15a of the terminal 50 that emerge from the dielectric layer 40 of epoxy resin, thus providing points where soldering 200 can be carried out, as illustrated in FIG. 7.

(55) FIG. 21 is a schematic perspective view of the device module 30, which highlights its bottom surface, and consequently both the lateral surfaces 15a, connected to the contacts 16 of the second row R2, along the perimeter, and the contacts 16 of the first row R1 and the bottom pad 16a are visible. Also visible are the bottom surfaces 15d of the cut bead 15m, which are in electrical continuity with the bottom contacts 16 and the lateral surfaces of the bead 15m.

(56) Hence, the advantages of the solution disclosed emerge clearly from the foregoing description.

(57) Advantageously, the process described enables, for a QFN_mr package, a lateral meniscus to be obtained, which is visible in a PCB inspection of the outer row, this being a characteristic that is specified in systems for automatic positioning of components.

(58) Furthermore, advantageously, the process can use a simple mixed technology of etched leadframe and conductor screen printing. No plating line is necessary.

(59) The process described advantageously provides that the sinterable material is applied directly on the copper leadframe, not requiring removable insulating means, or more in general temporary substrates. For this reason, the sintered material can be replaced by a high-temperature (up to 300 C.) solder paste in so far as the process, by using a metal leadframe, can enable reflow temperatures (over 250 C.) to be reached.

(60) The device obtained via the process advantageously does not have sintered material connected to the die, i.e., to the semiconductor body, but the sintered material is applied on the contacts of the leadframe, which in turn are wire-bonded to the die.

(61) The process is advantageously compatible with ASE, STATS, and UTAC technologies.

(62) Of course, without prejudice to the principle of the solution described, the details and the embodiments may vary, even significantly, with respect to what has been described herein purely by way of example, without departing from the sphere of protection.

(63) The various embodiments described above can be combined to provide further embodiments. These and other changes can be made to the embodiments in light of the above-detailed description. In general, in the following claims, the terms used should not be construed to limit the claims to the specific embodiments disclosed in the specification and the claims, but should be construed to include all possible embodiments along with the full scope of equivalents to which such claims are entitled. Accordingly, the claims are not limited by the disclosure.