Wafer de-bonding device
10204813 ยท 2019-02-12
Assignee
Inventors
Cpc classification
H01L21/6838
ELECTRICITY
Y10T156/1944
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T156/1179
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T156/1939
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2221/68381
ELECTRICITY
Y10T156/1158
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L21/68714
ELECTRICITY
H01L21/67253
ELECTRICITY
H01L21/67
ELECTRICITY
Y10T156/1137
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T156/1967
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T156/1961
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
B32B38/10
PERFORMING OPERATIONS; TRANSPORTING
Y10T156/1132
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T156/1184
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
B32B43/00
PERFORMING OPERATIONS; TRANSPORTING
H01L21/687
ELECTRICITY
H01L21/67
ELECTRICITY
Abstract
A wafer de-bonding device comprises a stage (1) for holding a device wafer and a carrier wafer bonded together, and a tool (2) with a gas outlet (2.2) disposed in proximity to the stage (1) through an adjustment device for control the tool (2) to move towards or away from the stage (1), the tool (2) being provided with a bit (2.1) to cut a notch into a film or an adhesive layer at a junction of the bonded wafers, the gas outlet (2.2) being provided on the tool bit (2.1), the tool (2) being further provided with a gas inlet (2.3) in communication with the gas outlet (2.2), the gas inlet (2.3) being connected to a gas jet generator so as to direct a gas jet towards the junction of the bonded wafers on the stage (2). The wafer de-bonding device has a high degree of automation and simple operations.
Claims
1. A wafer de-bonding device, comprising: a stage for holding a device wafer and a carrier wafer bonded together; a tool with a gas outlet disposed on an adjustable device for controlling the tool to move towards or away from the stage, the tool being provided with a bit to penetrate into a film or an adhesive layer at a junction between the device wafer and the carrier wafer bonded together to form a notch, the gas outlet being disposed on the tool bit, the tool being further provided with a gas inlet in communication with the gas outlet, the gas inlet being connected to a gas jet generator to deliver a gas jet towards the junction between the device wafer and the carrier wafer bonded together on the stage; and an image acquisition device having an image acquisition end directed to the bit of the tool to acquire an image of the tool bit approaching the junction of the bonded wafers.
2. The wafer de-bonding device of claim 1, further comprising a light source providing light illumination for the image acquisition device to acquire the image.
3. The wafer de-bonding device of claim 2, wherein the light source irradiates light at an angle onto the bonded wafers on the stage, the light has a color that is sensible for the image acquisition device, and the light passes through the device wafer and the carrier wafer and is reflected by the film at the junction of the bonded wafers.
4. The wafer de-bonding device of claim 1, further comprising a robotic arm equipped with a sucker through which the robotic arm sucks on upper one of the bonded device wafer and carrier wafer on the stage and remove it when it is separated from the lower one of the bonded device wafer and carrier wafer through the gas jet.
5. The wafer de-bonding device of claim 1, further comprising a controller in communication with the image acquisition device and the adjustment device, the controller being configured to process and analyze the image captured by the image acquisition device so as to control the position of the tool through the adjustment device such that the bit of the tool is automatically aligned to the junction between the bonded wafers.
6. The wafer de-bonding device of claim 1, further comprising a gas temperature adjustment device provided between the gas jet generator and the gas inlet to adjust temperature of the gas jet output from the gas outlet.
7. The wafer de-bonding device of claim 1, wherein the gas outlet is disposed in an upper surface of the tool bit.
8. The wafer de-bonding device of claim 1, wherein the tool bit has two gas outlets provided in an upper surface thereof, and the tool has a tapered slot provided in a side surface thereof.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5) Reference signs: 1, stage; 2, tool; 2.1, tool bit; 2.2, gas outlet; 2.3, gas inlet; 2.4, tapered slot; 3, robotic arm; 3.1, sucker; 3.2, displacement mechanism; 4, light source; 5, cabinet.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
(6) The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
(7) As shown in
(8) As can be seen from embodiments, the wafer de-bonding device may further include a cabinet 5 and some other peripheral structures, which are all components that may or may not be equipped while the device is manufactured. However, they all fall within the scope of the present invention as long as they are used along with the basic configuration to realize wafer de-bonding as disclosed herein.
(9) With the above configuration, the tool may cut a notch into the junction where the wafers are bonded, and then the gas jet generator may deliver a gas jet towards the notch so as to de-bond the device wafer and the carrier wafer from each other. As the gas outlet is provided in the upper surface of the tool, it may directly face to the notch and produces a very good result when it is used. The two wafers may be separated with a modest gas pressure, the separation may be performed quickly, and the operation is very simple and convenient.
(10) In proximity to the stage are further provided an image acquisition device and a light source 4. The image acquisition device has its image acquisition end directed to the bit 2.1 of the tool 2 to capture an image of the tool bit 2.1 approaching the junction of the bonded wafers. The light source 4 provides light illumination to make the image more clear. Only the light source 4 is shown in the drawings, while the image acquisition device is blocked by the cabinet 5 and thus not shown in the drawings. The image acquisition device itself belongs to the prior arts, and here the arrangement of the image acquisition device has been described clearly even it is not shown. In the embodiment, the image acquisition device may be a camera. With such a configuration, the image captured by the image acquisition device may be referenced to determine whether the tool bit is aligned to the junction where the wafers are bonded. If not, the position of the tool bit may be adjusted through the adjustment device. Since the wafer de-bonding device often operates in an enclosed space, the light source is necessary to make the captured image more clear.
(11) The wafer de-bonding device further includes a robotic arm 3 equipped with suckers 3.1 which can suck on upper one of the bonded device wafer and carrier wafer on the stage so as to remove it when it is separated from the lower one of the bonded device wafer and carrier wafer by the gas jet. The robotic arm may be driven by an electric cylinder or a gas cylinder and move the upper one of the bonded wafers to another place after it is separated from the lower one of the bonded wafers. As a typical case, the carrier wafer may be on the upper side, and the device wafer may be on the lower side, but vice versa. The stage may be provided with a plurality of vacuum holes to suck the device wafer on the lower side with an even sucking force, and the carrier wafer on the upper side may be sucked by the suckers of the robotic arm. When the device wafer and the carrier wafer are separated from each other by the gas jet, the robotic arm may move the carrier wafer to another place to facilitate subsequent processing of the device wafer. The entire process may be implemented automatically by programming, and the wafer de-bonding device has a high degree of automation.
(12) The wafer de-bonding device further includes a controller in communication with the image acquisition device and the adjustment device. The image of the junction between the bonded wafers captured by the image acquisition device may be processed and analyzed by the controller to adjust position of the tool through the adjustment device such that the tool bit may be exactly aligned to the junction of the bonded wafers. By programming within the controller, the position of the tool bit may be automatically controlled based on the image captured by the image acquisition device, thereby ensuring the tool bit being always aligned to the junction of the bonded wafers, achieving automatic adjustment and a high degree of automation. A program to control position of an object based on its image is commonly used in the prior arts and thus it will not be discussed in detail here. However, it should be noted that the method of adjusting position of the tool bit based on the image of the tool bit at the junction of the bonded wafers as used in the wafer de-bonding device of the present invention is novel in the art.
(13) The light source irradiates light at an angle onto the bonded device wafer and carrier wafer on the stage, and the light may be of a color that can be sensed by the image acquisition device. The light can pass through the device wafer and the carrier wafer and be reflected by the film where the device wafer and the carrier wafer are bonded. With such a configuration, when the light is irradiated onto the wafers, the device wafer, the carrier wafer, and the bonding film between the device wafer and the carrier wafer have different effects on the incident light of the same wavelength. Specifically, the film reflects the light, while the device wafer and the carrier wafer transmit the light. Consequently, there is a large difference in color between the film and the wafers in the image of the junction of the bonded wafers captured by the image acquisition device, and thus the image has a high resolvability and results in an accurate operation. The light may be, for example, ultraviolet light, visible purple light, or any other light as long as it can be reflected at the film between the bonded wafers in a manner different from at the bonded wafers and can be sensed by the image acquisition device. When such a light is irradiated onto the stage, it can pass through the wafers but be reflected by the film where the wafers are bonded, producing an image in which the film has a color greatly different from the device wafer and the carrier wafer so that the film may be recognized more accurately.
(14) The wafer de-bonding device further includes a gas temperature adjustment device provided between the gas jet generator and the gas inlet for adjusting temperature of the gas jet output from the gas outlet. With such a device, the temperature of the gas jet may be adjusted while it blows, and either hot or cold gas may blows to facilitate subsequent processing.
(15) In a preferred embodiment, the gas outlet may be provided in the upper surface of the bit of the tool. With such a configuration, the gas jet may blow through the gas outlet while the tool bit cuts a notch, thereby achieving simple and convenient operations.
(16) There may be two gas outlets provided in the upper surface of the tool bit, and a tapered slot provided in a side surface of the tool. Using two gas outlets may make the gas jet more stable, and the tapered slot may be used to accommodate a gas tube connected to the gas inlet as well the image acquisition device and cables connected to the image acquisition device.