METHOD FOR FORMING AN ELECTRICAL CONNECTION BETWEEN AN ELECTRONIC CHIP AND A CARRIER SUBSTRATE AND ELECTRONIC DEVICE
20230121780 ยท 2023-04-20
Assignee
Inventors
- David Auchere (Meylan, FR)
- Asma Hajji (Voiron, FR)
- Fabien QUERCIA (Saint Marcelin, FR)
- Jerome Lopez (Saint Joseph de Riviere, FR)
Cpc classification
H01L2224/8592
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L23/3185
ELECTRICITY
H01L23/552
ELECTRICITY
H01L23/3171
ELECTRICITY
H01L2924/00014
ELECTRICITY
International classification
Abstract
An electrical connection wire connects an electrical connection pad of an electrical chip and an electrical connection pad of a carrier substrate to which the electronic chip is mounted. A dielectric layer surrounds at least the bonding wire. The dielectric layer may be a dielectric sheath or a hardened liquid dielectric material. A dielectric material may also cover at least a portion of the electrical chip and carrier substrate. A liquid electrically conductive material is deposited and hardened to form a local conductive shield surrounding the dielectric layer at the bonding wire.
Claims
1. A method, comprising: placing an electrical connection wire between an exposed electrical connection pad of an electronic chip and an exposed electrical connection pad of a carrier substrate on which the electronic chip is mounted and forming electrical junctions between ends of the electrical connection wire and the exposed electrical connection pads; producing a dielectric layer made of a dielectric material on top of a zone of the electronic chip and of the carrier substrate, including the electrical connection wire, the electrical junctions and the exposed electrical connection pads, such that the dielectric layer forms a local dielectric coating which at least partially surrounds the electrical connection wire and at least partially covers the electrical junctions and the exposed electrical connection pads; and producing a local conductive shield made of an electrically conductive material which at least partially covers the local dielectric coating.
2. The method according to claim 1, wherein producing the dielectric layer comprises distributing a determined amount of the dielectric material in a liquid state and hardening said dielectric material.
3. The method according to claim 2, wherein the dielectric material is distributed by means of sputtering.
4. The method according to claim 1, wherein producing the local conductive shield comprises distributing a determined amount of an electrically conductive material in a liquid state and hardening said electrically conductive material.
5. The method according to claim 4, where the electrically conductive material is distributed using a controlled tool.
6. The method according to claim 5, wherein the controlled tool is a dispensing syringe.
7. The method according to claim 1, wherein producing the dielectric layer comprises completely surrounding the electrical connection wire and completely covering the exposed electrical connection pads and the electrical junctions and wherein producing the local conductive shield comprises completely covering said local dielectric coating.
8. The method according to claim 1, further comprising the following steps: producing openings in the dielectric layer above additional electrical connection pads of the electronic chip and of the carrier substrate; placing an additional electrical connection wire between the additional electrical connection pads and forming additional electrical junctions between the ends of the additional electrical connection wire and the additional electrical connection pads; and wherein producing the local conductive shield comprises producing the local conductive shield to make contact with at least one of the additional electrical connection wire and at least one of the additional electrical connection pads.
9. The method according to claim 1, wherein producing a dielectric layer comprises depositing the dielectric layer with a substantially uniform thickness.
10. A method, comprising the following steps: mounting an electronic chip to a carrier substrate; connecting a bonding wire between an electrical connection pad of the electronic chip and an electrical connection pad of the carrier substrate; flowing a liquid dielectric material to coat said bonding wire and at least a portion of each of the electronic chip and the carrier substrate; hardening the liquid dielectric material to form a dielectric layer of substantially uniform thickness surrounding the bonding wire and on surfaces of said portion of each of the electronic chip and the carrier substrate; flowing a liquid electrically conductive material to coat the dielectric layer; and hardening the liquid electrically conductive material to form a conductive shield surrounding the dielectric layer on the bonding wire.
11. The method of claim 10, further comprising: forming openings in the dielectric layer to expose an additional electrical connection pad of the electronic chip and an additional electrical connection pad of the carrier substrate; connecting an additional bonding wire between the additional electrical connection pad of the electronic chip and the additional electrical connection pad of the carrier substrate; wherein flowing the liquid electrically conductive material further comprises flowing the liquid electrically conductive material to coat the additional bonding wire; and wherein hardening the liquid electrically conductive material further comprises hardening the liquid electrically conductive material to form the conductive shield surrounding the additional bonding wire.
12. A method for making an electrical connection between an electronic chip and a carrier plate on which the electronic chip is mounted, comprising: installing at least one electrical connection wire between an exposed electrical connection pad of the electronic chip and an exposed electrical connection pad of the carrier plate and making electrical junctions between ends of the at least one electrical connection wire and the exposed electrical connection pads; producing a dielectric layer made of a dielectric material over an area of the electronic chip and the carrier plate, including the at least one electrical connection wire, the electrical junctions and the exposed electrical connection pads, by dispensing a determined amount of the dielectric material in a liquid state and hardening said dielectric material, wherein the dielectric layer produces a local dielectric coating surrounding the at least one electrical connection wire and covers the electrical junctions and the exposed electrical connection pads, and producing a local conductive shield made of an electrically conductive material which at least partially covers the local dielectric coating, wherein producing the local conductive shield comprises: locally dispensing a determined amount of an electrically conductive material in a liquid state, in the form of a calibrated drop which flows by capillary or wetting effect, through use of a controlled tool comprising a controlled dispensing syringe; and hardening said conductive material to produce the local conductive shield around the at least one electrical connection wire and the electrical junctions.
13. The method according to claim 12, wherein producing the dielectric layer comprises spraying the dielectric material.
14. The method according to claim 12, further comprising: producing openings in the dielectric layer above complementary electrical connection pads of the electronic chip and of the carrier plate; installing a complementary electrical connection wire between the complementary electrical connection pads; and producing electrical junctions between ends of the complementary electrical connection wire and the complementary electrical connection pads, and wherein producing the local conductive shield comprises forming the local conductive shield in contact with one or more of the complementary electrical connection wire and at least one of the complementary electrical connection pads.
15. A method, comprising the following steps: placing an electrical connection wire between an exposed electrical connection pad of an electronic chip and an exposed electrical connection pad of a carrier substrate to which the electronic chip is mounted and forming electrical junctions between the ends of the electrical connection wire and the pads, the electrical connection wire being equipped with an insulating sheath made of a dielectric material which surrounds the electrical connection wire except at exposed ends of the electrical connection wire; producing a local dielectric coating made of a dielectric material, which at least partially covers at least one of the electrical connection pads, the electrical junction and exposed end of the electrical connection wire adjacent thereto and at least partially surrounds an end portion of the insulating sheath adjacent to the electrical junction; and producing a conductive shield made of an electrically conductive material which at least partially covers said dielectric coating and at least partially surrounds the insulating sheath.
16. The method according to claim 15, wherein producing the local dielectric coating comprises distributing a determined amount of the dielectric material in the liquid state and hardening said dielectric material.
17. The method according to claim 16, wherein distributing comprises using a controlled tool to dispense the dielectric material in the liquid state.
18. The method according to claim 17, wherein the controlled tool is a dispensing syringe.
19. The method according to claim 15, wherein producing the conductive shield comprises distributing a determined amount of an electrically conductive material in the liquid state and hardening said electrically conductive material.
20. The method according to claim 19, wherein producing the conductive shield comprises using a controlled tool to dispense the electrically conductive material in the liquid state.
21. The method according to claim 20, wherein the controlled tool is a dispensing syringe.
22. The method according to claim 15, wherein producing the local dielectric coating comprises: producing a first local dielectric coating on a first electrical connection pad, a first electrical junction and the exposed end of the electrical connection wire adjacent thereto and which at least partially surrounds a first end portion of the insulating sheath adjacent to the first electrical junction; and producing a second local dielectric coating on a second electrical connection pad, a second electrical junction and the exposed end of the electrical connection wire adjacent thereto and which at least partially surrounds a second end portion of the insulating sheath adjacent to the second electrical junction.
23. The method according to claim 22, wherein producing the conductive shield comprises providing the electrically conductive material to cover the first and second local dielectric coatings and surround the insulating sheath between the first and second local dielectric coatings.
24. The method according to claim 15, further comprising the following steps: placing an additional electrical connection wire between an exposed additional electrical connection pad of the electronic chip and an exposed additional electrical connection pad of the carrier substrate and forming additional electrical junctions between ends of the additional electrical connection wire and the exposed additional electrical connection pads; and wherein producing the conductive shield comprises producing the conductive shield to make contact with at least one of the additional electrical connection wire and at least one of the exposed additional electrical connection pads.
25. The method according to claim 15, wherein the electronic chip further includes an exposed additional electrical connection pad, and wherein producing the conductive shield comprises producing the conductive shield to make contact with said exposed additional electrical connection pad.
26. The method according to claim 15, wherein the carrier substrate further includes an exposed additional electrical connection pad, and wherein producing the conductive shield comprises producing the conductive shield to make contact with said exposed additional electrical connection pad.
27. A method, comprising the following steps: placing an electrical connection wire between an exposed electrical connection pad of an electronic chip and an exposed electrical connection pad of a carrier substrate to which the electronic chip is mounted and forming electrical junctions between the ends of the electrical connection wire and the pads; producing a dielectric coating made of a dielectric material, which completely covers the electrical connection wire and completely covers the electrical junctions and further at least partially covers each of the electrical connection pads; and producing a conductive shield made of an electrically conductive material which at least partially covers said dielectric coating at said electrical connection pads and completely covers said dielectric coating at said electrical junctions and further completely surrounds said dielectric coating at said electrical connection wire.
28. The method according to claim 27, wherein producing the dielectric coating comprises distributing a determined amount of the dielectric material in the liquid state and hardening said dielectric material.
29. The method according to claim 28 wherein distributing comprises using a controlled tool to dispense the dielectric material in the liquid state.
30. The method according to claim 29, wherein the controlled tool is a dispensing syringe.
31. The method according to claim 27, wherein producing the conductive shield comprises distributing a determined amount of an electrically conductive material in the liquid state and hardening said electrically conductive material.
32. The method according to claim 31, wherein producing the conductive shield comprises using a controlled tool to dispense the electrically conductive material in the liquid state.
33. The method according to claim 32, wherein the controlled tool is a dispensing syringe.
34. The method according to claim 27, further comprising the following steps: placing an additional electrical connection wire between an exposed additional electrical connection pad of the electronic chip and an exposed additional electrical connection pad of the carrier substrate and forming additional electrical junctions between ends of the additional electrical connection wire and the exposed additional electrical connection pads; and wherein producing the conductive shield comprises producing the conductive shield to make contact with the additional electrical connection wire and at least one of the exposed additional electrical connection pads.
35. The method according to claim 27, wherein the carrier substrate further includes an exposed additional electrical connection pad and wherein producing the conductive shield further comprises producing the conductive shield to make contact with the exposed additional electrical connection pad.
36. The method according to claim 27, wherein the electronic chip further includes an exposed additional electrical connection pad and wherein producing the conductive shield further comprises producing the conductive shield to make contact with the exposed additional electrical connection pad.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0037] An electronic device and a mode of fabrication will now be described by way of non-limiting examples, which are illustrated by the appended drawings in which:
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DETAILED DESCRIPTION
[0057] As illustrated in
[0058] The carrier substrate 2 is made of a dielectric material and includes an integrated electrical connection network 6, for connecting to one or more metal levels, which comprises front exposed electrical connection pads 7 and 8 of the front face 5 which are located laterally at a distance from a flank 9 of the electronic chip 3 and in proximity of one another.
[0059] The electronic chip 3 comprises front exposed electrical connection pads 10 and 11 of a front face 12 of this electronic chip 3, opposite its back face 4, which are located at a distance from the flank 9 of the electronic chip 3, not far from the front pads 7 and 8 of the carrier substrate 2.
[0060] Steps for the purpose of forming electrical connections between the pads 7 and 10 and, optionally, the pads 8 and 11, of the carrier substrate 2 and the electronic chip 3, respectively, will now be described.
[0061] In a step illustrated in
[0062] This operation of putting the electrical connection wires 13 and 16 into place may be carried out using a specialized wire-bonding machine.
[0063] In a later step illustrated in
[0064] This operation may be carried out, for example, using a specialized tool comprising a dispensing syringe 18 capable of delivering at least one calibrated drop of the liquid dielectric material on top of the electrical connection wire 13, this liquid dielectric material flowing ultimately to surround the electrical connection wire 12 and to cover the pads 7 and 10 and the junctions 14 and 15, in particular by means of wetting or capillary effect.
[0065] Next, the liquid dielectric material is hardened in order to form the dielectric coating 17, either by virtue of its intrinsic hardening qualities at room temperature or by hardening under the effect of a heat source or a source of light radiation. For example, the dielectric material may be a suitable epoxy resin.
[0066] In a later step illustrated in
[0067] This operation may be carried out, for example, using a specialized controlled tool comprising a dispensing syringe 20, capable of delivering at least one calibrated drop of the liquid conductive material, this liquid conductive material flowing in particular by means of wetting or capillary effect.
[0068] Next, the liquid conductive material is hardened in order to form the local conductive shield 19, by virtue of its intrinsic hardening qualities at room temperature or by hardening under the effect of a heat source or a source of light radiation. For example, the conductive material may be an epoxy resin filled with metal particles.
[0069] The finished electronic device 1 is thus obtained.
[0070] The electrical connection wire 13 is intended to convey electrical signals between the pads 7 and 10 of the carrier substrate 2 and the electronic chip 3. The conductive shield 19 provides electromagnetic protection for these electrical signals.
[0071] The pads 8 and 11, which are connected by the electrical connection wire 16, form ground pads of the electrical circuits of the electronic device 1. Thus, the conductive shield 19, which is connected to the pads 8 and 11 and to the electrical connection wire 16, is connected to the ground of the electrical circuits of the electronic device 1.
[0072] According to one variant embodiment, it would be possible for the local dielectric coating 17 to cover only one of the pads 7 and 10 and an adjacent portion of the electrical connection wire 13 and it would be possible for the local conductive shield 19 to partially cover this reduced local dielectric coating 17 without this reduced local conductive shield 19 coming into contact with the electrical connection wire 13.
[0073] According to one variant embodiment, it would be possible to do omit the electrical connection wire 16.
[0074] Of course, the electronic device 1 may comprise other electrical connection wires 13 connecting other pads 7 and 10 of the carrier substrate 2 and of the electronic chip 3, and other electrical connection wires 16 connecting other pads 8 and 11 of the carrier substrate 2 and of the electronic chip 3, which are also equipped with local dielectric coatings 17 and local conductive shields 19, the respective steps of the production of which would be the same.
[0075] According to one variant embodiment, it would be possible for one local conductive shield 19 to be shared by multiple neighboring electrical connection wires 13 and to locally cover the front face 5 of the carrier substrate and/or the front face 12 of the electronic chip 3, such that this extended local conductive shield 19 would form electromagnetic protection for some of the electronic circuits of the electronic device 1. Such an extended local conductive shield 19 could, for example, be formed by means of physical vapor deposition (PCV) of a metal material, for example copper or aluminum. In this case, it would be possible to provide a single ground electrical connection wire 16. Still in this case, and as a variant, the extended local conductive shield 19 could be connected to ground by providing at least one electrical connection pad 8 of the carrier substrate 2 that is not covered by the dielectric coating 17.
[0076] According to one variant embodiment, the carrier substrate 2 could comprise a metal frame comprising a platform upon which the electronic chip 3 would be mounted, the electrical connection wires 13 and 16 connecting the electronic chip 3 to peripheral leads of this frame.
[0077] As illustrated in
[0078] The carrier substrate 2 is made of a dielectric material and includes an integrated electrical connection network 6, for connecting to one or more metal levels, which comprises front exposed electrical connection pads 7 and 8 of the front face 5 which are located laterally at a distance from a flank 9 of the electronic chip 3 and in proximity of one another.
[0079] The electronic chip 3 comprises front exposed electrical connection pads 10 and 11 of a front face 12 of this electronic chip 3, opposite its back face 4, which are located at a distance from the flank 9 of the electronic chip 3, not far from the front pads 7 and 8 of the carrier substrate 2.
[0080] Steps for the purpose of forming electrical connections between the pads 7 and 10 and, optionally, the pads 8 and 11, of the carrier substrate 2 and the electronic chip 3, respectively, will now be described.
[0081] In a step illustrated in
[0082] This operation of putting the electrical connection wires 113 and 116 into place may be carried out using a specialized wire-bonding machine.
[0083] In a later step illustrated in
[0084] In an equivalent manner, a determined amount of an adhesive liquid dielectric material is locally distributed on top of the pad 10 and/or the junction 115 and/or the end portion of the insulating sheath 113a that is adjacent to the junction 115, such that this dielectric material completely covers the pad 7 and the junction 115 and completely surrounds the end portion of the insulating sheath 113a that is adjacent to the junction 115. After hardening, this dielectric material forms a second local dielectric coating 117b.
[0085] These operations may be carried out, for example, using a specialized controlled tool comprising a dispensing syringe 118 capable of delivering at least one calibrated drop of the liquid dielectric material, this liquid dielectric material flowing ultimately to cover the pads 7 and 10 and the junctions 114 and 115 and to surround the corresponding end portions of the insulating sheath 113a, in particular by means of wetting or capillary effect.
[0086] Next, the liquid dielectric material is hardened in order to form the dielectric coatings 117a and 117b, by virtue of its intrinsic hardening qualities at room temperature or by hardening under the effect of a heat source or a source of light radiation. For example, the dielectric material may be a suitable epoxy resin.
[0087] In a later step illustrated in
[0088] This operation may be carried out, for example, using a specialized tool comprising a dispensing syringe 120, capable of delivering at least one respective calibrated drop of the liquid conductive material, this liquid conductive material flowing in particular by means of wetting or capillary effect.
[0089] Next, the liquid conductive material is hardened in order to form the local conductive shield 119, by virtue of its intrinsic hardening qualities at room temperature or by hardening under the effect of a heat source or a source of light radiation. For example, the conductive material may be an epoxy resin filled with metal particles.
[0090] The electrical connection wire 113 is intended to convey electrical signals between the pads 7 and 10 of the carrier substrate 2 and the electronic chip 3. The conductive shield 119 provides electromagnetic protection for these electrical signals.
[0091] The pads 8 and 11, which are connected by the electrical connection wire 116, form ground pads of the electrical circuits of the electronic device 1. Thus, the conductive shield 119, which is connected to the pads 8 and 11 and to the electrical connection wire 116, is connected to the ground of the electrical circuits of the electronic device 1.
[0092] According to one variant embodiment, it would be possible to provide only one of the local dielectric coatings 117a and 117b and it would be possible for the local conductive shield 119 to partially cover this local dielectric coating and a portion of the sheath 113a without this reduced local conductive shield 119 coming into contact with the electrical connection wire 113 and the opposite pad.
[0093] According to one variant embodiment, it would be possible to do omit the electrical connection wire 116.
[0094] Of course, the electronic device 1 may comprise other electrical connection wires 113 connecting other pads 7 and 10 of the carrier substrate 2 and of the electronic chip 3, and other electrical connection wires 116 connecting other pads 8 and 11 of the carrier substrate 2 and of the electronic chip 3, which are also equipped with local dielectric coatings 117a and 117b and local conductive shields 119, the respective steps of the production of which would be the same.
[0095] According to one variant embodiment, it would be possible for one local conductive shield 119 to be shared by multiple neighboring electrical connection wires 113 and to locally cover the front face 5 of the carrier substrate and/or the front face 12 of the electronic chip 3, such that this extended local conductive shield 119 would form electromagnetic protection for some of the electronic circuits of the electronic device 1. Such an extended local conductive shield 119 could, for example, be formed by means of physical vapor deposition (PCV) of a metal material, for example copper or aluminum. In this case, it would potentially be possible to provide a single ground electrical connection wire 116. Still in this case and as a variant, the extended local conductive shield 119 could be connected to ground by providing at least one electrical connection pad 8 of the carrier substrate 2 that is not covered by the dielectric coating 117.
[0096] According to one variant embodiment, the carrier substrate 2 could comprise a metal frame comprising a platform upon which the electronic chip 3 would be mounted, the electrical connection wires 113 and 116 connecting the electronic chip 3 to peripheral leads of this frame.
[0097] As illustrated in
[0098] The carrier substrate 2 is made of a dielectric material and includes an integrated electrical connection network 6, for connecting to one or more metal levels, which comprises front exposed electrical connection pads 7 and 8 of the front face 5 which are located laterally at a distance from a flank 9 of the electronic chip 3 and in proximity of one another.
[0099] The electronic chip 3 comprises front exposed electrical connection pads 10 and 11 of a front face 12 of this electronic chip 3, opposite its back face 4, which are located at a distance from the flank 9 of the electronic chip 3, not far from the front pads 7 and 8 of the carrier substrate 2.
[0100] Steps for the purpose of forming electrical connections between the pads 7 and 10 and, optionally, the pads 8 and 11, of the carrier substrate 2 and of the electronic chip 3, respectively, will now be described.
[0101] In a step illustrated in
[0102] This operation of putting the electrical connection wire 213 into place may be carried out using a specialized wire-bonding machine.
[0103] In a later step illustrated in
[0104] After hardening, this dielectric material forms a dielectric layer 217a on top of the front faces 5 and 12 of the carrier substrate 2 and of the electronic chip 3 and forms a local dielectric coating 217b that covers the pads 7, 8, 10 and 12 and the junctions 214 and 215 and surrounds the electrical connection wire 213, the dielectric layer 217a and the local dielectric coating 217b extending one another.
[0105] This operation may be carried out, for example, using a specialized tool comprising a controlled dispensing syringe 218, capable of delivering at least one respective calibrated drop of the liquid conductive material, this liquid conductive material flowing in particular by means of wetting or capillary effect. As a variant, this operation may be carried out by immersing the entire electronic device 1 in a bath of dielectric material. The dielectric material may alternatively be distributed by means of sputtering (for example, spraying).
[0106] Next, the liquid dielectric material is hardened in order to form the dielectric coatings 217a and 217b, by virtue of its intrinsic hardening qualities at room temperature or by hardening under the effect of a heat source or a source of light radiation. For example, the dielectric material may be a suitable epoxy resin or else a poly-para-xylylene polymer, commonly referred to as parylene. In an embodiment, the dielectric coatings 217a and 217b have a substantially uniform coating thickness over the surfaces of the electrical connection wire 213, the pads 7 and 10, the chip 3 and the substrate 2.
[0107] In a later step illustrated in
[0108] This operation of putting the electrical connection wire 216 into place may be carried out using a specialized wire-bonding machine.
[0109] In a later step illustrated in
[0110] This operation may be carried out, for example, using a specialized controlled tool comprising a controlled dispensing syringe 220, capable of delivering at least one calibrated drop of the liquid conductive material, this liquid conductive material flowing in particular by means of wetting or capillary effect.
[0111] Next, the liquid conductive material is hardened in order to form the local conductive shield 219, by virtue of its intrinsic hardening qualities at room temperature or by hardening under the effect of a heat source or a source of light radiation. For example, the conductive material may be an epoxy resin filled with metal particles.
[0112] The finished electronic device 1 is then obtained.
[0113] The electrical connection wire 213 is intended to convey electrical signals between the pads 7 and 10 of the carrier substrate 2 and of the electronic chip 3. The conductive shield 219 forms electromagnetic protection for these electrical signals.
[0114] The pads 8 and 11, which are connected by the electrical connection wire 216, form ground pads of the electrical circuits of the electronic device 1. Thus, the conductive shield 219, which is connected to the pads 8 and 11 and to the electrical connection wire 216, is connected to the ground of the electrical circuits of the electronic device 1.
[0115] According to one variant embodiment, the local conductive shield 219 could partially cover the local dielectric coating 217b.
[0116] According to one variant embodiment, it would be possible to do away with the electrical connection wire 216.
[0117] Of course, the electronic device 1 may comprise other electrical connection wires 213 connected to other pads 7 and 10 of the carrier substrate 2 and of the electronic chip 3, and other electrical connection wires 216 connecting other pads 8 and 11 of the carrier substrate 2 and of the electronic chip 3, which are also equipped with local dielectric coatings 217b and local conductive shields 219, the respective steps of the production of which would be the same.
[0118] According to one variant embodiment, it would be possible for one local conductive shield 219 to be shared by multiple neighboring electrical connection wires 213 and to locally cover the front face 5 of the carrier substrate and/or the front face 12 of the electronic chip 3, such that this extended local conductive shield 219 would form electromagnetic protection for some of the electronic circuits of the electronic device 1. In this case, it would be possible to provide a single ground electrical connection wire 216.
[0119] According to one variant embodiment, the carrier substrate 2 could comprise a metal frame comprising a platform upon which the electronic chip 3 would be mounted, the electrical connection wires 213 and 216 connecting the electronic chip 3 to peripheral leads of this frame.