Modular plasma reformer treatment system
RE050464 ยท 2025-06-24
Assignee
Inventors
Cpc classification
F01N2240/22
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F01N3/0892
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F01N2240/30
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
B01D2257/404
PERFORMING OPERATIONS; TRANSPORTING
F01N3/01
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F01N3/037
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F01N2240/28
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
International classification
F01N3/08
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
B01D53/32
PERFORMING OPERATIONS; TRANSPORTING
F01N3/01
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
Abstract
A modular plasma treatment system has interchangeable and easily accessible inner and outer electrodes that concentrically nest within an outer housing of one or more plasma reformers. The inner and outer electrodes have self-centering features that allow for blind-fitting of the interchangeable inner and outer electrodes during electrode replacement and maintenance. A plurality of reformers that generate different types of plasmas are preferably arranged serially to allow for a mixture of separate plasmas within the same reaction area and to increase utilization of short-lived radicals.
Claims
1. A modular plasma treatment system, comprising: a first outer housing .[.of a first plasma reformer.]. having .[.a first exhaust.]. .Iadd.an .Iaddend.inlet for receiving a first input gaseous stream and a first .[.exhaust.]. outlet for expelling a first output gaseous stream.[., wherein the first outer housing comprises.]..Iadd.; a first plasma reformer situated within the first outer housing, and having a first outer electrode and a first inner electrode configured to produce a rotating glide arc plasma within .Iaddend.a first housing inner receiving chamber; .[.a first outer electrode sized and dimensioned to abut first housing portions of the first housing inner receiving chamber such that the first outer electrode does not substantially move when set in place within the first housing inner receiving chamber, wherein the first outer electrode comprises a first electrode inner receiving chamber;.]. a second .[.outer electrode sized and dimensioned to abut the first housing portions of the first housing inner receiving chamber such that the second outer electrode does not substantially move when set in place within the first housing inner receiving chamber, wherein the second outer electrode comprises a second electrode inner receiving chamber.]. .Iadd.plasma reformer having a second outer electrode and a second inner electrode configured to produce a dielectric barrier discharge (DBD) plasma wherein the first and second plasma reformers are disposed serially such that the first inner and outer electrodes are configured to be coupled to the second inner and outer electrodes by a common reaction zone, and wherein at least two plasmas are present in the common reaction zone .Iaddend. .[.a first inner electrode sized and dimensioned to abut first electrode portions of the first electrode inner receiving chamber such that the first inner electrode does not substantially move when set in place within the first electrode inner receiving chamber; and a second inner electrode sized and dimensioned to abut second electrode portions of the second electrode inner receiving chamber such that the second inner electrode does not substantially move when set in place within the second electrode inner receiving chamber.]..
2. The modular plasma treatment system of claim 1, wherein the first housing inner receiving chamber and a .[.first exterior.]. portion of the first outer electrode comprise self-centering features that center the first outer electrode with respect to the first outer housing as the first outer electrode is set in place within the first housing inner receiving chamber.
3. The modular plasma treatment system of claim 2, wherein the self-centering features comprise a tapered wall of the first housing inner receiving chamber that centers the first and second outer electrodes when either is set in place within the first housing inner receiving chamber.
4. The modular plasma treatment system of claim 2, wherein the self-centering features comprise a tapered exterior cross-section of the first outer electrode that widens against .[.the first housing portions of.]. the first housing inner receiving chamber as the first outer electrode is set in place within the first housing inner receiving chamber.
5. The modular plasma treatment system of claim 1, wherein the first .[.electrode.]. .Iadd.housing .Iaddend.inner receiving chamber and a .[.first exterior.]. portion of the first inner electrode comprise self-centering features that center the first inner electrode with respect to the first .[.inner electrode.]. .Iadd.housing .Iaddend.inner receiving chamber as the first inner electrode is set in place within the first .[.inner electrode.]. .Iadd.housing .Iaddend.inner receiving chamber.
6. The modular plasma treatment system of claim 5, wherein the self-centering features comprise a tapered wall of the first .[.electrode.]. .Iadd.housing .Iaddend.inner receiving chamber that centers the first inner electrode when the first inner electrode is set in place within the first .[.electrode.]. .Iadd.housing .Iaddend.inner receiving chamber.
7. The modular plasma treatment system of claim 5, wherein the self-centering features comprise a tapered exterior cross-section of the first inner electrode that widens against .[.the first electrode portions of.]. the first .[.electrode.]. .Iadd.housing .Iaddend.inner receiving chamber as the first inner electrode is set in place within the first .[.electrode.]. .Iadd.housing .Iaddend.inner receiving chamber.
8. The modular plasma treatment system of claim 1, wherein the first outer electrode and the first inner electrode, when set in place within the first housing inner receiving chamber, are configured to provide a first plasma gap for .[.a first plasma.]. .Iadd.the rotating glide arc plasma; .Iaddend.and wherein the second outer electrode and the second inner electrode, when set in place within the first housing inner receiving chamber, are configured to provide a second plasma gap for .[.a second plasma different from the first.]. .Iadd.the DBD .Iaddend.plasma.
.[.9. The modular plasma treatment system of claim 1, wherein the first plasma reformer comprises a dielectric barrier discharge plasma reformer to generate a dielectric barrier discharge plasma..].
10. The modular plasma treatment system of claim .[.9.]. .Iadd.1.Iaddend., wherein the first outer electrode comprises interior conductive .[.formertions.]. .Iadd.projections .Iaddend.to generate electric field gradients between points of the .Iadd.interior .Iaddend.conductive projections.
11. The modular plasma treatment system of claim 10, wherein the interior conductive projections comprise conductive screw tips screwed into holes of the first outer electrode.
12. The modular plasma treatment system of claim 10, wherein at least two of the interior conductive projections comprise different dimensions from one another to provide different electric field gradients to precipitate particulate matter having different properties.
13. The modular plasma treatment system of claim .[.9.]. .Iadd.1.Iaddend., wherein the .[.first exhaust.]. inlet comprises surface features that alter air pressure within .[.an excitation chamber of the first plasma reformer.]. .Iadd.the first housing inner receiving chamber .Iaddend.to direct the first input gaseous stream in a cyclone motion to points of highest energy density inside the .[.excitation chamber.]. .Iadd.first housing inner receiving chamber.Iaddend..
.[.14. The modular plasma treatment system of claim 13, wherein the first plasma reformer comprises a rotating glide arc reformer and the second plasma reformer comprises a DBD plasma reformer, at least one of the first outer electrode and the first inner electrode rotate a textured surface to direct the first input gaseous stream in a cyclone motion to points of highest energy density inside an excitation chamber of the rotating glide arc reformer..].
15. The modular plasma treatment system of claim .[.14.]. .Iadd.1.Iaddend., further comprising coaxial electrodes that discharge into each of the .Iadd.rotating .Iaddend.glide-arc plasma and the DBD plasma.
.[.16. The modular plasma treatment system of claim 1, further comprising: a second outer housing of a second plasma reformer having a second exhaust inlet for receiving a second input gaseous stream and a second exhaust outlet for expelling a second output gaseous stream, wherein the second outer housing comprises a second housing inner receiving chamber; a third outer electrode sized and dimensioned to abut second housing portions of the second housing inner receiving chamber such that the third outer electrode does not substantially move when set in place within the second housing inner receiving chamber, wherein the third outer electrode comprises a third electrode inner receiving chamber; a fourth outer electrode sized and dimensioned to abut the second housing portions of the second housing inner receiving chamber such that the fourth outer electrode does not substantially move when set in place within the second housing inner receiving chamber, wherein the fourth outer electrode comprises a fourth electrode inner receiving chamber; a third inner electrode sized and dimensioned to abut third electrode portions of the third electrode inner receiving chamber such that the third inner electrode does not substantially move when set in place within the third electrode inner receiving chamber; and a fourth inner electrode sized and dimensioned to abut fourth electrode portions of the fourth electrode inner receiving chamber such that the fourth inner electrode does not substantially move when set in place within the fourth electrode inner receiving chamber, wherein the first output gaseous stream feeds the second input gaseous stream..].
.[.17. The modular plasma treatment system of claim 16, wherein the rotating glide arc reformer generates a glide-arc plasma and the DBD plasma reformer generates a DBD plasma..].
18. The modular plasma treatment system of claim .[.17.]. .Iadd.1.Iaddend., further comprising a magnetic field generator that generates a magnetic field around the co-axial electrodes.
19. The modular plasma treatment system of claim 18.[.,.]. wherein the first outer housing .[.of the first plasma reformer.]. is disposed above a particulate filter expelling the first output gaseous stream to transfer waste heat from the first output gaseous stream to an oxidant conduit.
20. The modular plasma treatment system of claim 19, wherein .[.the.]. .Iadd.an .Iaddend.air source comprises at least one of a blower and an on-board turbocharger.
21. The modular plasma treatment system of claim 1, wherein the plasma treatment system oxidizes particulate matter in .[.a.]. .Iadd.the common .Iaddend.reaction zone .[.between the first inner electrode and the first outer electrode.]..
22. The modular plasma treatment system of claim .[.21.]. .Iadd.1.Iaddend., wherein .[.the.]. .Iadd.an .Iaddend.air dryer uses a desiccant to remove water vapor from the intake air.
23. The modular plasma treatment system of claim 1, further comprising an air drier that receives intake air from an air source and outputs dried air, wherein the .[.first exhaust.]. inlet receives the dried air and outputs oxidants to the first output gaseous stream.
24. The modular plasma treatment system of claim 1, further comprising a voltage transformer integrated with a feedthrough of the first plasma reformer to deliver power from the voltage .[.power.]. transformer to the first outer electrode and the first inner electrode.
25. The modular plasma treatment system of claim 1, further comprising a fuel injector that injects .Iadd.a .Iaddend.fuel into the first input gaseous stream.
.[.26. The modular plasma treatment system of claim 25, wherein the first plasma reformer comprises at least one of a DBD reformer and a rotating glide-arc reformer..].
27. The modular plasma treatment system of claim 1, further comprising a microwave generator that generates microwaves directed towards the first outer housing.
.Iadd.28. A plasma system comprising: a plasma reformer having an inlet fluidly coupled to a receiving chamber; a first reformer comprising a first outer electrode arranged serially to the receiving chamber, wherein the first outer electrode comprises a first electrode receiving chamber; a second reformer comprising a second outer electrode arranged serially to the receiving chamber, wherein the second outer electrode comprises a second electrode receiving chamber; a first inner electrode at least partially within the first electrode receiving chamber, and configured to cooperate with the first outer electrode to produce a first plasma; and a second inner electrode at least partially within the second electrode receiving chamber, and configured to cooperate with the second outer electrode to produce a second plasma different from the first plasma; and the first and second reformers disposed serially to one another such that the first inner and outer electrodes are configured to be coupled to the second inner and outer electrodes by a common reaction zone, and wherein at least two plasmas are present in the common reaction zone. .Iaddend.
.Iadd.29. The plasma system of claim 28, wherein each of the receiving chamber and an exterior portion of the first outer electrode comprise self-centering features that center the first outer electrode with respect to the receiving chamber. .Iaddend.
.Iadd.30. The plasma system of claim 29, wherein the self-centering features comprise a tapered wall of the receiving chamber. .Iaddend.
.Iadd.31. The plasma system of claim 29, wherein the self-centering features comprise a tapered exterior cross-section of the first outer electrode that widens against the receiving chamber. .Iaddend.
.Iadd.32. The plasma system of claim 28, wherein each of the first electrode receiving chamber and the first inner electrode comprise self-centering features that center the first inner electrode with respect to the first electrode receiving chamber. .Iaddend.
.Iadd.33. The plasma system of claim 32, wherein the self-centering features comprise a tapered wall of the first electrode inner receiving chamber. .Iaddend.
.Iadd.34. The plasma system of claim 32, wherein the self-centering features comprise a tapered exterior cross-section of the first inner electrode that widens against the first electrode receiving chamber. .Iaddend.
.Iadd.35. The plasma system of claim 28, wherein the first outer electrode and the first inner electrode are oriented to provide a first plasma gap for the first plasma, and wherein the second outer electrode and the second inner electrode are oriented to provide a second plasma gap for the second plasma. .Iaddend.
.Iadd.36. The plasma system of claim 28, wherein the first reformer comprises a dielectric barrier discharge plasma reformer. .Iaddend.
.Iadd.37. The plasma system of claim 36, wherein the first outer electrode comprises interior conductive projections. .Iaddend.
.Iadd.38. The plasma system of claim 37, wherein the interior conductive projections comprise conductive screw tips screwed into holes of the first outer electrode. .Iaddend.
.Iadd.39. The plasma system of claim 37, wherein at least two of the interior conductive projections comprise different dimensions from one another to provide different electric field gradients. .Iaddend.
.Iadd.40. The plasma system of claim 28, wherein the inlet is configured to receive a gaseous stream, the inlet having surface features that alter air pressure within the common reaction zone to direct the gaseous stream in a cyclone motion. .Iaddend.
.Iadd.41. The plasma system of claim 28, further comprising: a third reformer arranged serially to the second reformer, having a third outer electrode and a third inner electrode at least partially within a third electrode receiving chamber; and an outlet directing an output gaseous stream from the common reaction zone to an inlet of the third reformer. .Iaddend.
.Iadd.42. The plasma system of claim 28, wherein the first reformer comprises a rotating glide arc reformer, and the second reformer comprises a DBD plasma reformer, and wherein at least one of the first outer electrode and the first inner electrode have a textured surface directing an input gaseous stream in the first reformer in a cyclone motion. .Iaddend.
.Iadd.43. The plasma system of claim 42, wherein the rotating glide arc reformer generates a glide-arc plasma and the DBD plasma reformer generates a DBD plasma. .Iaddend.
.Iadd.44. The plasma system of claim 42, wherein the first and second outer electrodes are co-axial. .Iaddend.
.Iadd.45. The plasma system of claim 44, further comprising a magnetic field generator that generates a magnetic field around the co-axial electrodes. .Iaddend.
.Iadd.46. The plasma system of claim 28, wherein the plasma system oxidizes particulate matter in the common reaction zone. .Iaddend.
.Iadd.47. The plasma system of claim 46, wherein the plasma reformer is disposed above a particulate filter. .Iaddend.
.Iadd.48. The plasma system of claim 28, further comprising an air drier that receives intake air from an air source and outputs dried air, wherein the inlet of the plasma reformer receives the dried air. .Iaddend.
.Iadd.49. The plasma system of claim 28, further comprising a voltage transformer integrated with a feedthrough of the plasma reformer to deliver power from the voltage transformer to the first outer electrode and the first inner electrode. .Iaddend.
.Iadd.50. The plasma system of claim 28, wherein the first outer electrode is grounded to the plasma reformer. .Iaddend.
.Iadd.51. The plasma system of claim 28, wherein the first inner electrode does not move with respect to the first outer electrode. .Iaddend.
.Iadd.52. The plasma system of claim 28, wherein the first outer electrode is disposed with a housing, wherein the first inner electrode is slidable with respect to the first outer electrode. .Iaddend.
.Iadd.53. A plasma system, comprising: a first reaction zone comprising first and second co-axial electrodes, wherein the second electrode is nested within the first electrode; a second reaction zone comprising third and fourth co-axial electrodes; the first and second reaction zones disposed serially to one another such that the first or second co-axial electrode is configured to be coupled to the third or fourth co-axial electrode by a common reaction zone; and a microwave guide directed toward at least a portion of one or more of the first reaction zone, the second reaction zone, and the common reaction zone. .Iaddend.
.Iadd.54. The plasma system of claim 53, wherein the first reaction zone generates a dielectric barrier discharge plasma and the second reaction zone generates a glide-arc plasma. .Iaddend.
.Iadd.55. The plasma system of claim 54, wherein the first reaction zone is upstream in a flow path from the second reaction zone. .Iaddend.
.Iadd.56. The plasma system of claim 53, wherein the first reaction zone and second reaction zone are coextensive. .Iaddend.
.Iadd.57. The plasma system of claim 53, wherein the first reaction zone is separated from the second reaction zone. .Iaddend.
.Iadd.58. The plasma system of claim 53, wherein the microwave guide is directed at a portion of the first reaction zone. .Iaddend.
.Iadd.59. The plasma system of claim 53, wherein the microwave guide is directed between the first and third electrodes. .Iaddend.
.Iadd.60. The plasma system of claim 53, wherein the microwave guide is directed at the flow path downstream of the first reaction zone. .Iaddend.
.Iadd.61. A plasma reformer, comprising: a receiving chamber; a first outer electrode arranged serially to the receiving chamber, a first inner electrode cooperatively coupled with the first outer electrode to produce a first plasma within a first electrode receiving chamber, wherein the first inner electrode is nested within the first outer electrode; a second outer electrode arranged serially to the receiving chamber, a second inner electrode cooperatively coupled with the second outer electrode to produce a second plasma within a second electrode receiving chamber, the second plasma different from the first plasma; the first and second receiving chambers disposed serially to one another such that at least one of the first outer electrode or the first inner electrode is configured to be coupled to at least one of the second outer electrode or the second inner electrode by a common reaction zone; and a microwave generator that is configured to generate microwaves directed towards the plasma reformer. .Iaddend.
.Iadd.62. The plasma reformer of claim 61, wherein, in use, the generated microwaves are directed toward an inlet of the plasma reformer. .Iaddend.
.Iadd.63. The plasma reformer of claim 61, wherein, in use, the generated microwaves are directed toward an outlet of the plasma reformer. .Iaddend.
.Iadd.64. The plasma reformer of claim 61, wherein, in use, the generated microwaves are directed toward the common reaction zone. .Iaddend.
.Iadd.65. The plasma reformer of claim 61, further comprising a waveguide coupled to the microwave generator. .Iaddend.
.Iadd.66. The plasma reformer of claim 65, wherein the waveguide is configured to direct the generated microwaves toward the plasma reformer. .Iaddend.
Description
BRIEF DESCRIPTION OF THE DRAWING
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DETAILED DESCRIPTION
(21) In some embodiments, the numbers expressing quantities of ingredients, properties such as concentration, reaction conditions, and so forth, used to describe and claim certain embodiments of the invention are to be understood as being modified in some instances by the term about. Accordingly, in some embodiments, the numerical parameters set forth in the written description and attached claims are approximations that can vary depending upon the desired properties sought to be obtained by a particular embodiment. In some embodiments, the numerical parameters should be construed in light of the number of reported significant digits and by applying ordinary rounding techniques. Notwithstanding that the numerical ranges and parameters setting forth the broad scope of some embodiments of the invention are approximations, the numerical values set forth in the specific examples are reported as precisely as practicable. The numerical values presented in some embodiments of the invention may contain certain errors necessarily resulting from the standard deviation found in their respective testing measurements.
(22) As used in the description herein and throughout the claims that follow, the meaning of a, an, and the includes plural reference unless the context clearly dictates otherwise. Also, as used in the description herein, the meaning of in includes in and on unless the context clearly dictates otherwise.
(23) As used herein, and unless the context dictates otherwise, the term coupled to is intended to include both direct coupling (in which two elements that are coupled to each other contact each other) and indirect coupling (in which at least one additional element is located between the two elements). Therefore, the terms coupled to and coupled with are used synonymously.
(24) Unless the context dictates the contrary, all ranges set forth herein should be interpreted as being inclusive of their endpoints, and open-ended ranges should be interpreted to include commercially practical values. Similarly, all lists of values should be considered as inclusive of intermediate values unless the context indicates the contrary.
(25) The recitation of ranges of values herein is merely intended to serve as a shorthand method of referring individually to each separate value falling within the range. Unless otherwise indicated herein, each individual value is incorporated into the specification as if it were individually recited herein. All methods described herein can be performed in any suitable order unless otherwise indicated herein or otherwise clearly contradicted by context. The use of any and all examples, or exemplary language (e.g. such as) provided with respect to certain embodiments herein is intended merely to better illuminate the invention and does not pose a limitation on the scope of the invention otherwise claimed. No language in the specification should be construed as indicating any non-claimed element essential to the practice of the invention.
(26) Groupings of alternative elements or embodiments of the invention disclosed herein are not to be construed as limitations. Each group member can be referred to and claimed individually or in any combination with other members of the group or other elements found herein. One or more members of a group can be included in, or deleted from, a group for reasons of convenience and/or patentability. When any such inclusion or deletion occurs, the specification is herein deemed to contain the group as modified thus fulfilling the written description of all Markush groups used in the appended claims.
(27) One should appreciate that the disclosed techniques provide many advantageous technical effects including providing a modular system for ease of maintenance, accessibility, and replacement of fundamental components of plasma treatment systems. Blind-mate connections allow for the ease of placement of inner and outer electrodes without necessitating a high degree of accuracy when putting the electrodes in place. The system architecture guides streams towards the highest energy density zones within the plasma reaction zones for optimal paths through the reaction zones. Having a plurality of plasmas within the same reaction zone increases utilization of short-lived singlet oxygen radicals, and increases the control of the amount and type of reactive nitrogen and reactive oxygen radicals that are created. By combining who different plasmas, such as glide-arc plasmas and DBD plasmas for NO.sub.2 production eliminates the need for extremely high voltages that are required with a DBD plasma reformerwhich eliminates the need for more expensive insulators and electronics. Utilizing microwave excitation techniques for the production of radicals increases the precision below the threshold of unwanted chemical production. Utilizing ambient air as a feedstock to produce the preferred oxidants with an integrated dryer removes hydrogen and sulfur sources from the air stream, which minimizes the creation of unwanted acidic chemicals as a byproduct. By placing filters/catalyst systems above heat-creating reformers and other modules of the system, the system uses heat exchange to increase the production efficiency of the radicals.
(28) The inventive subject matter provides apparatus, systems, and methods in which a modular plasma treatment system is built with interchangeable and easily accessible inner and outer electrodes that nest within an outer housing of one or more plasma reformers.
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(30) Outer electrode #1 120 and outer electrode #2 122 have substantially identical geometric features to allow for either electrode to be interchanged within outer housing 110. Similarly, inner electrode #1 and inner electrode #2 152 also have substantially identical geometric features, making them geometrically fungible. Preferably, outer electrode #2 122 comprises a different conductive material from outer electrode #2 122, and inner electrode #1 150 comprises a different conductive material from inner electrode #1 152, giving them different conductive properties from one another, and making outer electrode #1 120 and inner electrode #1 150 more appropriate for generating a first plasma and outer electrode #2 122 and inner electrode #2 152 more appropriate for generating a second plasma different from the first plasma. In other embodiments, the inner geometric features of outer electrode #2 122 may be different from the inner geometric features of outer electrode #1 120, such that the outer geometric features of inner electrode #2 152 are made to mate with the inner geometric features of outer electrode #2 122 and the outer geometric features of inner electrode #1 150 are made to mate with the inner geometric features of outer electrode #1 120.
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(32) Inner electrode 230 comprises a conductor core 231 coupled to a voltage transformer (not shown) and has a stand off 232, spark arrestor 233, outer layer 234, sleeve 235, and insulating material 236. In a preferred embodiment, stand off 232 comprises a quartz stand off, outer layer 234 comprises a quartz outer layer, and insulating material 236 comprises a thin layer of quartz wool surrounding the conductor core 231, however, any insulating material, or materials, could be used depending on the needs of the reformer. Reaction zone 252 in between inner electrode 2130 and outer electrode 240 has a plurality of conductive projections 242 that each provide electric field gradients in between one another to precipitate particulate matter. Here, the conductive projections 242 are steel screw heads screwed into holes of outer electrode 240, however conductive projections 242 could be implemented in a plurality of ways, such as 3-D printed or welded in place. Preferably, conductive projections 242 have different dimensions from one another. Here, conductive projections 242 only have a difference in height, such that screws of the same width but different length can provide different electric field gradients to precipitate particulate matter having different properties from one another.
(33) While reformer 200 shows electrodes with geometries most appropriate for a DBD plasma reformer, outer housing 250 could be utilized to generate other types of plasma by replacing the inner and outer electrodes set in place.
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(35) Inner electrode 330 has a conductive core 331 that mates with sleeve 335, and is coated with insulator 332 and 334 at its base, insulating spark arrestor 333 from external electromagnetic waves. Spark arrestor 333 allows for an overvoltage spark within a cavity, which is inside the feedthrough and not in the atmosphere or outside the reformer. Feedthrough flange 336 allows for a transformer (not shown) to provide voltage to core 331, while housing flange 337 allows for the transformer to provide voltage to outer electrode 340.
(36) While reformer 300 shows electrodes with geometries most appropriate for a rotating glide-arc plasma reformer, outer housing 350 could be utilized to generate other types of plasma by replacing the inner and outer electrodes set in place.
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(38) Inlet 410 guides the input stream in a circular vortex pattern about the outer reaction stream path into reaction zone 452 between outer electrode 440 and inner electrode 430. As the vortex pattern approaches the best of inner electrode 430, the densest portions of the stream flow along the inner wall of outer housing 250 and converge where the walls of outer electrode 440 and inner electrode 430 are the closest, and disperse in a vortex pattern within reaction zone 452 towards outlet 420. Inner electrode 430 has a core 431 surrounded by insulator 432, and feedthrough flange is conductively coupled to core 431 of inner electrode 430 while housing flange 434 is conductively coupled to outer electrode 440.
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(49) It should be apparent to those skilled in the art that many more modifications besides those already described are possible without departing from the inventive concepts herein. The inventive subject matter, therefore, is not to be restricted except in the scope of the appended claims. Moreover, in interpreting both the specification and the claims, all terms should be interpreted in the broadest possible manner consistent with the context. In particular, the terms comprises and comprising should be interpreted as referring to elements, components, or steps in a non-exclusive manner, indicating that the referenced elements, components, or steps may be present, or utilized, or combined with other elements, components, or steps that are not expressly referenced. Where the specification claims refers to at least one of something selected from the group consisting of A, B, C . . . and N, the text should be interpreted as requiring only one element from the group, not A plus N, or B plus N, etc.