Charged polymeric webs, such as electret webs, include a thermoplastic resin and a charge-enhancing additive. The charge-enhancing additive is a dual-function charge-enhancing additive that enhances the charge of the electret and also has anti-microbial properties. The additives are substituted-benzimidazole or substituted-benzothiazole compounds. The electret webs may be a non-woven fibrous web or a film. The electret webs are suitable for use as filter media.

Charged polymeric webs, such as electret webs, include a thermoplastic resin and a charge-enhancing additive. The charge-enhancing additive is a dual-function charge-enhancing additive that enhances the charge of the electret and also has anti-microbial properties. The additives are substituted-benzimidazole or substituted-benzothiazole compounds. The electret webs may be a non-woven fibrous web or a film. The electret webs are suitable for use as filter media.

The present invention relates to compositions for elastomeric compounds for tyres, comprising polytetrazole cross-linking compounds characterized by precise activation temperatures, tyre components and tyres for vehicle wheels which comprise them. Advantageously, the present polytetrazole cross-linking agents give lower hysteresis and retention of the modulus of the compounds even under stress.

The present invention relates to compositions for elastomeric compounds for tyres, comprising polytetrazole cross-linking compounds characterized by precise activation temperatures, tyre components and tyres for vehicle wheels which comprise them. Advantageously, the present polytetrazole cross-linking agents give lower hysteresis and retention of the modulus of the compounds even under stress.

The present invention relates to compositions for elastomeric compounds for tyres, comprising polytetrazole cross-linking compounds characterized by precise activation temperatures, tyre components and tyres for vehicle wheels which comprise them. Advantageously, the present polytetrazole cross-linking agents give lower hysteresis and retention of the modulus of the compounds even under stress.

Provided is a curable resin composition that has excellent heat resistance and low warpage and is, furthermore, capable of improving light transmittance in cured products, a dry film and its cured product of, and an electronic component containing the cured product. A curable resin composition containing (A) an amide-imide resin, (B) a thermosetting resin, (C) a thermosetting accelerator and (D) inorganic particles, wherein the amide-imide resin (A) is a reaction product of an isocyanurate-type polyisocyanate synthesized from an isocyanate having an aliphatic structure and a tricarboxylic anhydride having an aliphatic structure and has a number-average molecular weight of 500 to 1000; a dry film and its cured product; and an electronic component containing the cured product were obtained.

Provided is a curable resin composition that has excellent heat resistance and low warpage and is, furthermore, capable of improving light transmittance in cured products, a dry film and its cured product of, and an electronic component containing the cured product. A curable resin composition containing (A) an amide-imide resin, (B) a thermosetting resin, (C) a thermosetting accelerator and (D) inorganic particles, wherein the amide-imide resin (A) is a reaction product of an isocyanurate-type polyisocyanate synthesized from an isocyanate having an aliphatic structure and a tricarboxylic anhydride having an aliphatic structure and has a number-average molecular weight of 500 to 1000; a dry film and its cured product; and an electronic component containing the cured product were obtained.

A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.

A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.

A rubber composition comprising at least one member selected from the group consisting of compounds represented by the following formulas (1) to (7) and 3-methyl-5-pyrazolone, and a rubber component:

##STR00001##

wherein the R group is a hydrazide group, an N′-alkylidene hydrazide group, an N-allyl carbamoyl group, a 3-carboxyl acryloyl group, a hydrazine carboxyamino group, a thiocarboxyl group, a thiol group, or a hydrogen atom; R.sup.4 is a sulfur atom or an oxygen atom; R.sup.5 is a thiol group or a hydroxy group; R.sup.6 is a C.sub.1-4 alkylene group; R.sup.7 is an alkyl group, an aralkyl group, an aryl group, or a heterocyclic group; R.sup.8 is a hydrogen atom or an amino group; R.sup.9 is a heteroatom; and R.sup.10 is a heterocyclic group.