C08F220/1805

Aqueous dispersion of multistage polymer

An aqueous dispersion of a hydrophobically-modified alkali-soluble multistage polymer useful as a thickener affording high thickening efficiency and an aqueous coating composition comprising such aqueous dispersion showing good stability after heat aging without compromising stability upon addition of colorants.

POLYMER COMPOUND, METHOD FOR PRODUCING POLYMER COMPOUND, ADHESIVE COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING ADHESIVE COMPOSITION, AND METHOD FOR ADJUSTING ADHESION FORCE

Provided is a polymer compound having a repeating unit represented by Formula 1A below:

##STR00001##

wherein in Formula 1A, Z.sup.1 represents a hydrogen atom or a monovalent group, R.sup.1 represents a group represented by Formula 1B, L.sup.1 represents a divalent group, n represents an integer of 1 or more, and in in Formula 1B, L.sup.2 represents a single bond or a divalent group, R.sup.2 represents a group selected from the group consisting of a hydroxy group and a group represented by *—OR.sup.3, R.sup.3 represents a hydrocarbon group which may have a hetero atom, a plurality of R.sup.3's may be bonded to each other to form a ring, * represents a bonding position, m represents an integer of 1 to 5, and a plurality of L.sup.1's and a plurality of R.sup.2's may be the same as or different from each other.

POLYMER COMPOUND, METHOD FOR PRODUCING POLYMER COMPOUND, ADHESIVE COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING ADHESIVE COMPOSITION, AND METHOD FOR ADJUSTING ADHESION FORCE

Provided is a polymer compound having a repeating unit represented by Formula 1A below:

##STR00001##

wherein in Formula 1A, Z.sup.1 represents a hydrogen atom or a monovalent group, R.sup.1 represents a group represented by Formula 1B, L.sup.1 represents a divalent group, n represents an integer of 1 or more, and in in Formula 1B, L.sup.2 represents a single bond or a divalent group, R.sup.2 represents a group selected from the group consisting of a hydroxy group and a group represented by *—OR.sup.3, R.sup.3 represents a hydrocarbon group which may have a hetero atom, a plurality of R.sup.3's may be bonded to each other to form a ring, * represents a bonding position, m represents an integer of 1 to 5, and a plurality of L.sup.1's and a plurality of R.sup.2's may be the same as or different from each other.

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure.

Radiation-sensitive resin composition and resist pattern-forming method

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. ##STR00001##

3D printing with polymeric nanogel particles

A photoinitiated polymerizable composition for 3D printing, the polymerizable composition comprising a nanogel component that comprises nanogel particles, wherein the nanogel particles comprise a copolymer with polymerizable reactive groups suitable for reacting with each other or a reactive diluent monomer, a reactive oligomer, a resin, or a combination thereof that is present in the polymerizable composition upon photoinitiation, wherein the nanogel component has a glass transition temperature that is in a range of about −50 C and about 20 C and an average molecular weight that is in a range of about 10 kg/mol and about 100 kg/mol, and wherein the nanoparticles have an average hydrodynamic radius that is in a range of 1 nm to about 5 nm.

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
20230075188 · 2023-03-09 · ·

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
20230075188 · 2023-03-09 · ·

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) of which polarity increases by an action of an acid, the resin (A) having a repeating unit represented by General Formula (A1) as defined herein; and a compound (B) that generates an acid upon irradiation with actinic rays or radiation.

FLAME RETARDANT CHEMICAL COMPOSITIONS
20230072612 · 2023-03-09 ·

The present invention relates to the field of chemical compositions and flame retardants. Specifically, the invention relates to a composition for imparting flame retardancy comprising an organic salt as a fire-retardant compound, a binder and a surfactant. Also, the present invention relates to a method for manufacturing said composition and a method of imparting flame retardancy to a substrate comprising applying said composition to the substrate. And still, the invention relates to uses of said composition e.g. for imparting flame retardancy to a substrate. Furthermore, the invention relates to products comprising said composition.