A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.

A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.

Coating compositions are provided. In embodiments, a coating composition comprises a solvent system comprising water; a crosslinked organic additive in the form of particles and comprising a polymerization product of reactants comprising a multifunctional vinyl monomer comprising two or more vinyl groups; a binder; and optionally, one or more of a colorant and a wax. Methods of making and using the coating compositions are also provided.

Coating compositions are provided. In embodiments, a coating composition comprises a solvent system comprising water; a crosslinked organic additive in the form of particles and comprising a polymerization product of reactants comprising a multifunctional vinyl monomer comprising two or more vinyl groups; a binder; and optionally, one or more of a colorant and a wax. Methods of making and using the coating compositions are also provided.

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.

A method of forming persistent micelles is described. Particularly, methods disclosed herein include dissolving a block copolymer in a first solvent to form a dispersion containing unimers or dynamic micelles. Further, a method includes contacting the dispersion with a second solvent forming the persistent micelles. The persistent micelles formed by the method of the present disclosure can be used for controlled delivery of dispersions in organic electronic coatings, paint, or drug delivery applications and can also be used to control the pore size of films that include an oxide, a nitride, a carbide, a metal, or a carbon material.

A method of forming persistent micelles is described. Particularly, methods disclosed herein include dissolving a block copolymer in a first solvent to form a dispersion containing unimers or dynamic micelles. Further, a method includes contacting the dispersion with a second solvent forming the persistent micelles. The persistent micelles formed by the method of the present disclosure can be used for controlled delivery of dispersions in organic electronic coatings, paint, or drug delivery applications and can also be used to control the pore size of films that include an oxide, a nitride, a carbide, a metal, or a carbon material.

A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.