The invention relates to an apparatus for analyzing a material comprising an excitation emission device for generating at least one electromagnetic excitation beam, in particular an exciting light beam, having at least one excitation wavelength, further comprising a detection device for detecting a reaction signal, and a device for analyzing the material on the basis of the detected reaction signal.

Voltage reporter molecules and compositions, and methods for detecting voltage and voltage change in cells are provided. Also provided are methods for delivery, expression, and use of the voltage reporter molecules in cells, tissues, and subjects.

An apparatus for analyzing a material includes an excitation emission device for generating at least one electromagnetic excitation beam, in particular an exciting light beam, having at least one excitation wavelength, further comprising a detection device for detecting a reaction signal, and a device for analyzing the material on the basis of the detected reaction signal.

A method and system for determining a concentration of one or more analytes in whole blood is provided. In one aspect of the invention, the system includes a channel configured to carry whole blood. The system further includes a light source configured to emit light on the channel. Additionally, the system includes an actuation module associable with the channel, wherein the actuation module is configured to generate a cell-free plasma layer in the channel. Furthermore, the system includes an optical module associable with the channel.

Provided herein are systems for the label-free detection of target molecules in samples. The systems include a sensor probe positioned in a sensing region and configured to bind to receptors for the target molecules. The systems also include electrodes configured to expose the sensor probe to an alternating electric field, and a light source optically coupled to the sensor probe and configured to provide light along a length of the sensor probe. In addition, the systems also include a position sensitive photodetector configured to detect a position of light exiting the sensor probe, and a processor configured to assess, based at least in part on the position of the light exiting the sensor probe, an amplitude of oscillation of the sensor at a frequency of the alternating electric field and a direction of a displacement of the sensor. Additional systems and related methods are also provided.

The invention relates to an apparatus for analyzing a material comprising an excitation emission device for generating at least one electromagnetic excitation beam, in particular an exciting light beam, having at least one excitation wavelength, further comprising a detection device for detecting a reaction signal, and a device for analyzing the material on the basis of the detected reaction signal.

The invention relates, inter alia, to a device (10) for analysing a material (101), comprising an excitation emission device (100) for generating at least one electromagnetic excitation beam (SA), particularly an excitation light beam, with at least one excitation wavelength, and further comprising a detection device (106) for detecting a reaction signal (SR), and a device (107) for analysing the material on the basis of the detected reaction signal (SR).

Methods are described for obtaining digital data for determining, shaping or testing a semiconductor or anisotropic device or materials under test or manufacture. Optical interferometric techniques can sense a wide region, such as that passing through or reflected off a semiconductor material, which can then be analyzed. In this manner, various characteristics of the resultant transmitted or reflected probing beam, herein called the object wave, are recorded in the resultant interference pattern between the object wave and the reference beam. Likewise, when the semiconductor material, such as an integrated circuit, is stressed by applying a voltage therein by energizing a circuit fabricated therein, the same light will reflect or otherwise pass through the semiconductor material, while being affected by the changes imposed upon or acting within the interior structures or interior surfaces by an applied voltage or signal, or by an incident external stress, thereby resulting in a different pattern.

An interferometric holographic instrument enables the generation of digital data for testing and enabling 2-dimensional and 3-dimensional analysis of live and real-time semiconductor or anisotropic devices and materials. The digitally recorded interferometric data can be displayed, stored or connected to a live data stream for transmission to digital processing devices. A digital electric processor or analyzer connected to the recording device, or live data stream, enables the interferometric data to be utilized to test, develop, and shape semiconductor and anisotropic microelectronic processing, wireless and microwave devices.

An imaging element for analysis of a sample includes an electrode adapted to receive the sample, a light-emitting element, disposed opposite the electrode, and separated from the electrode by an insulating protective layer, a voltage-controlled current source configured to supply current to the light-emitting element and comprising a control electrode electrically connected to the electrode, so that said light-emitting element generates a light wave in response to a voltage coming from the sample.