A photoresist composition including an organometallic compound, and a method for fabricating a semiconductor device using the same are provided. The photoresist composition may include an organometallic compound, a radical sensitizer including a structure of Chemical formula 2-1 or Chemical formula 2-2, and a solvent.

In Chemical formula 2-1,

##STR00001##

A.sup.1 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R.sup.1, R.sup.2 and R.sup.3 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.

In Chemical formula 2-2,

##STR00002##

A.sup.2 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R.sup.4 and R.sup.5 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.

A photoresist composition including an organometallic compound, and a method for fabricating a semiconductor device using the same are provided. The photoresist composition may include an organometallic compound, a radical sensitizer including a structure of Chemical formula 2-1 or Chemical formula 2-2, and a solvent.

In Chemical formula 2-1,

##STR00001##

A.sup.1 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R.sup.1, R.sup.2 and R.sup.3 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.

In Chemical formula 2-2,

##STR00002##

A.sup.2 is a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and R.sup.4 and R.sup.5 are each independently hydrogen, a halogen, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a hetero-functional group.

The present invention relates to formulations for use in 3-D printing using radiation from visual display screens. The formulations comprise titanocene photoinitators and co-initiators. The invention also relates to methods of forming 3-D objects using said formulations.

The present invention relates to formulations for use in 3-D printing using radiation from visual display screens. The formulations comprise titanocene photoinitators and co-initiators. The invention also relates to methods of forming 3-D objects using said formulations.

The present invention is directed to a permanent photoimageable compositions and the cured products thereof useful for making negative-tone, permanent photoresist relief patterns on low surface energy polymer substrates, comprising: (A) one or more alkali soluble, film forming resins or one or more film forming resins that become soluble in alkali solutions by action of an acid, (B) one or more cationic photoinitiators, (C) one or more film casting solvents, and (D) one or more fluorinated compounds. The present invention is also directed to methods of forming a permanent photoresist relief pattern on a low surface energy polymer substrate using the disclosed compositions.

The present invention is directed to a permanent photoimageable compositions and the cured products thereof useful for making negative-tone, permanent photoresist relief patterns on low surface energy polymer substrates, comprising: (A) one or more alkali soluble, film forming resins or one or more film forming resins that become soluble in alkali solutions by action of an acid, (B) one or more cationic photoinitiators, (C) one or more film casting solvents, and (D) one or more fluorinated compounds. The present invention is also directed to methods of forming a permanent photoresist relief pattern on a low surface energy polymer substrate using the disclosed compositions.

A quaternary ammonium salt comprising a chromophore constituent, a tertiary amine cation constituent connected to the para-position of the chromophore constituent via a methylene linkage, and a borate anion constituent, wherein chromophore constituent is a 3-ketocoumarin constituent or a benzophenone constituent. Also, a photobase-redox initiating system comprising the quaternary ammonium salt and a peroxide.

A quaternary ammonium salt comprising a chromophore constituent, a tertiary amine cation constituent connected to the para-position of the chromophore constituent via a methylene linkage, and a borate anion constituent, wherein chromophore constituent is a 3-ketocoumarin constituent or a benzophenone constituent. Also, a photobase-redox initiating system comprising the quaternary ammonium salt and a peroxide.

There is provided a highly sensitive colorant-containing photosensitive resin composition for use in the formation of organic EL element barrier ribs. In one embodiment, the photosensitive resin composition for an organic EL element barrier rib comprises: (A) a binder resin; (B) at least one low molecular weight organic compound having a molar volume of 130 cm.sup.3/mol or less and being selected from the group consisting of aromatic carboxylic acids and compounds each having a plurality of phenolic hydroxyl groups; (C) a radiation sensitive compound; and (D) a colorant selected from the group consisting of black dyes and black pigments.

There is provided a highly sensitive colorant-containing photosensitive resin composition for use in the formation of organic EL element barrier ribs. In one embodiment, the photosensitive resin composition for an organic EL element barrier rib comprises: (A) a binder resin; (B) at least one low molecular weight organic compound having a molar volume of 130 cm.sup.3/mol or less and being selected from the group consisting of aromatic carboxylic acids and compounds each having a plurality of phenolic hydroxyl groups; (C) a radiation sensitive compound; and (D) a colorant selected from the group consisting of black dyes and black pigments.