G03F7/029

Resist composition and patterning process

A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Resist composition and patterning process

A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

PHOTO-CURABLE COMPOSITION FOR 3D PRINTING, ITS PREPARATION AND USE, AND METHOD OF FORMING 3D-PRINTED OBJECTS BY USING THE SAME
20230117061 · 2023-04-20 ·

The invention relates to a photo-curable liquid resin composition for 3D printing, its preparation process and use, and also to a method of forming a 3D-printed object by using the composition. By using the inventive composition for 3D printing, the improvement of the flexibility and elasticity of the cured composition can be achieved.

DISPLAY DEVICE AND DISPLAY DEVICE PRODUCTION METHOD

A display device provided with a display region including a plurality of pixels and a frame region surrounding the display region includes a thin film transistor layer, a light-emitting element layer including a plurality of light-emitting elements, each including a first electrode, a light emitting layer, and a second electrode, and each having a different luminescent color. In the light-emitting layer, an oxetane monomer, an epoxy monomer, and a radical polymerization initiator are used.

DISPLAY DEVICE AND DISPLAY DEVICE PRODUCTION METHOD

A display device provided with a display region including a plurality of pixels and a frame region surrounding the display region includes a thin film transistor layer, a light-emitting element layer including a plurality of light-emitting elements, each including a first electrode, a light emitting layer, and a second electrode, and each having a different luminescent color. In the light-emitting layer, an oxetane monomer, an epoxy monomer, and a radical polymerization initiator are used.

ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD

Provided are an on-press development type lithographic printing plate precursor having a support and an image-recording layer on the support in which the image-recording layer contains a coloring compound capable of having a coloring reaction with a decomposition product generated by exposure of the image-recording layer, and an on-press development type lithographic printing plate precursor having a support and an image-recording layer on the support in which the image-recording layer contains a compound represented by Formula 1C or Formula 2C and an electron-donating polymerization initiator. In Formula 1C and Formula 2C, R.sup.1C to R.sup.4C each independently represent a monovalent organic group, L.sup.1C and L.sup.2C each independently represent a divalent organic group, A.sup.C represents OH or NR.sup.5CR.sup.6C, and R.sup.5C and R.sup.6C each independently represent a monovalent organic group.

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ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD

Provided are an on-press development type lithographic printing plate precursor having a support and an image-recording layer on the support in which the image-recording layer contains a coloring compound capable of having a coloring reaction with a decomposition product generated by exposure of the image-recording layer, and an on-press development type lithographic printing plate precursor having a support and an image-recording layer on the support in which the image-recording layer contains a compound represented by Formula 1C or Formula 2C and an electron-donating polymerization initiator. In Formula 1C and Formula 2C, R.sup.1C to R.sup.4C each independently represent a monovalent organic group, L.sup.1C and L.sup.2C each independently represent a divalent organic group, A.sup.C represents OH or NR.sup.5CR.sup.6C, and R.sup.5C and R.sup.6C each independently represent a monovalent organic group.

##STR00001##

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

An onium salt consisting of an anion containing an iodized aromatic group and two sulfonate groups and a sulfonium or iodonium cation is a useful photoacid generator. A chemically amplified resist composition comprising the photoacid generator forms a pattern of rectangular profile with a good balance of sensitivity, CDU, LWR, MEF, and DOF when it is processed by photolithography using high-energy radiation.

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

An onium salt consisting of an anion containing an iodized aromatic group and two sulfonate groups and a sulfonium or iodonium cation is a useful photoacid generator. A chemically amplified resist composition comprising the photoacid generator forms a pattern of rectangular profile with a good balance of sensitivity, CDU, LWR, MEF, and DOF when it is processed by photolithography using high-energy radiation.

ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
20230161247 · 2023-05-25 · ·

The present disclosure provides an on-press development type lithographic printing plate precursor having a support, an image-recording layer, and an outermost layer in this order, in which a contact angle of a water droplet on a surface of the outermost layer that is measured 2 seconds after the water droplet is landed by an airborne water droplet method is greater than 36°. The present disclosure also provides applications of the on-press development type lithographic printing plate precursor.